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Method for removing layers of organic material |
| T973008 |
Method for removing layers of organic material
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| Patent Drawings: | |
| Inventor: |
Kaplan, et al. |
| Date Issued: |
August 1, 1978 |
| Application: |
05/858,985 |
| Filed: |
December 9, 1977 |
| Inventors: |
Kaplan; Leon H. (Yorktown Heights, NY)
Viswanathan; Nungavaram S. (Lancaster, CA)
Zimmerman; Steven M. (Wappingers Falls, NY)
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| Assignee: |
International Business Machines Corporation (Armonk, NY) |
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| U.S. Class: |
134/3; 134/38 |
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| International Class: |
G03F 7/42 |
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| Abstract: |
organic materials, such as organic polymer resist layers, are removed from substrates by contacting the materials with a mixture consisting essentially of an alkali metal persulfate and concentrated (96%) sulfuric acid wherein the mixture contains from above about 13 to about 50 grams of alkali metal persulfate per 100 milliliters of sulfuric acid. |
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