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Method of coating oxidized inorganic substrates with polyimide |
| T954010 |
Method of coating oxidized inorganic substrates with polyimide
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| Patent Drawings: | |
| Inventor: |
Brunner, et al. |
| Date Issued: |
January 4, 1977 |
| Application: |
05/687,965 |
| Filed: |
May 19, 1976 |
| Inventors: |
Brunner; Friedrich C. (Sindelfingen, DT)
Frasch; Peter U. (Boeblingen, DT)
Schwerdt; Friedrich W. (Boeblingen, DT)
Vogtmann; Theodor P. (Holzgerlingen, DT)
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| Assignee: |
International Business Machines Corporation (Armonk, NY) |
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| U.S. Class: |
427/335; 427/407.2; 427/409; 428/447; 428/450; 428/458; 438/780 |
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| Abstract: |
substrates with oxidized surfaces, as e.g. SiO.sub.2 layers on silicon semiconductors and aluminum surfaces, are wetted with an organic silicon compound, for example, .gamma.-aminopropyltriethoxysilane dissolved in an organic solvent such as trichlorotrifluoro ethane. The solvent is then removed in a dry atmosphere. The evaporation step can be carried out by suspending the substrate in volvent vapor over a supply of refluxing solvent while cooling the solvent vapor such that fresh, dry solvent vapor continuously passes along the substrate and absorbs traces of moisture. Subsequently, a coating is applied from a solution of a polyamido carbon acid formed of pyromellitic acid anhydride and an aromatic amino component and the polyamido carbon acid is heated to form an adherent layer of polyimide. |
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