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Gas-separating plate for reactor for manufacturing semiconductor
D654882 Gas-separating plate for reactor for manufacturing semiconductor
Patent Drawings:Drawing: D654882-2    Drawing: D654882-3    Drawing: D654882-4    Drawing: D654882-5    
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(4 images)

Inventor: Honma, et al.
Date Issued: February 28, 2012
Application: D/389,555
Filed: April 13, 2011
Inventors: Honma; Manabu (Oshu, JP)
Hishiya; Katsuyuki (Oshu, JP)
Assignee: Tokyo Electron Limited (Minato-Ku, JP)
Primary Examiner: Sikder; Selina
Assistant Examiner:
Attorney Or Agent: Burr & Brown
U.S. Class: D13/182
Field Of Search: D13/182; D23/413; D23/414; 118/724; 118/725; 432/241; 432/253; 432/260
International Class: 1303
U.S Patent Documents:
Foreign Patent Documents:
Other References:









Abstract:
Claim: CLAIM The ornamental design for gas-separating plate for reactor for manufacturing semiconductor, as shown and described.
Description: FIG. 1 is front perspective view of a gas-separating plate for reactor for manufacturing semiconductor illustrating our new design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a top view thereof;

FIG. 7 is a bottom view thereof; and,

FIG. 8 is a sectional view taken along line 8-8 of FIG. 2.

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