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Polishing pad |
| D592030 |
Polishing pad
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| Patent Drawings: | |
| Inventor: |
Tano, et al. |
| Date Issued: |
May 12, 2009 |
| Application: |
D/295,294 |
| Filed: |
September 25, 2007 |
| Inventors: |
Tano; Hiroyuki (Chuo-ku, JP)
Shiho; Hiroshi (Chuo-ku, JP)
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| Assignee: |
JSR Corporation (Tokyo, JP) |
| Primary Examiner: |
Davis; Antoine D |
| Assistant Examiner: |
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| Attorney Or Agent: |
Oblon, Spivak, McClelland, Maier & Neustadt, P.C. |
| U.S. Class: |
D8/70 |
| Field Of Search: |
D8/70; D15/138; D15/139; D15/140; 15/230; 83/835; 451/6; 451/60; 451/287; 451/288; 451/359; 451/526; 451/527; 451/533; 451/541; 451/548; 451/446; 451/550 |
| International Class: |
0805 |
| U.S Patent Documents: |
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| Foreign Patent Documents: |
115633; 1156872 |
| Other References: |
US. Appl. No. 29/295,291, filed Sep. 25, 2007, Tano, et al. cited by other.
U.S. Appl. No. 29/295,292, filed Sep. 25, 2007, Tano, et al. cited by other.
U.S. Appl. No. 29/295,294, filed Sep. 25, 2007, Tano, et al. cited by other.
U.S. Appl. No. 29/295,290, filed Sep. 25, 2007, Tano, et al. cited by other. |
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| Abstract: |
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| Claim: |
CLAIM The ornamental design for a polishing pad, as shown and described. |
| Description: |
FIG. 1 is a top plan view of a polishing pad showing our new design;
FIG. 2 is a front elevational view thereof, the rear elevational view, left side and front side elevational views thereof being mirror images of the views shown;
FIG. 3 is a bottom plan view thereof;
FIG. 4 is a partially enlarged view of portion 4--4 in FIG. 1;
FIG. 5 is a partially enlarged sectional view taken substantially along line 5--5 in FIG. 4;
FIG. 6 is a partially enlarged sectional view taken substantially along line 6--6 in FIG. 4;
FIG. 7 is a partially enlarged drawing of portion 7--7 in FIG. 3;
FIG. 8 is a partially enlarged sectional view of portion 8 in FIG. 5; and,
FIG. 9 is a partially enlarged view of section 9--9 in FIG. 1.
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