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Mask
D558403 Mask
Patent Drawings:Drawing: D558403-2    Drawing: D558403-3    Drawing: D558403-4    Drawing: D558403-5    Drawing: D558403-6    Drawing: D558403-7    Drawing: D558403-8    
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(7 images)

Inventor: Lee, et al.
Date Issued: December 25, 2007
Application: D/272,735
Filed: February 12, 2007
Inventors: Lee; Chi Keung, N/A (New Territories, Hong Kong, CN)
Assignee:
Primary Examiner: McInroy; Ruth
Assistant Examiner:
Attorney Or Agent: Alix, Yale & Ristas, LLP
U.S. Class: D29/108
Field Of Search: D29/102; D29/103; D29/104; D29/105; D29/106; D29/107; D29/108; D29/109; D29/110; D29/111; D29/122; 2/9; 2/6.3; 2/6.7; 2/15; 2/10; 2/452; 2/410; 2/422; 2/423; 2/424; 2/425; 2/427; 2/431; 2/436; 2/206; 128/207.11; 128/857; 128/858; 128/201.17; 128/201.19; 128/201.23; 128/201.24; 128/206.21; 128/206.12; 128/206.28; D24/110.2; D24/110.3; D16/300; D16/301; D16/309; D16/310; D16/312
International Class: 2902
U.S Patent Documents:
Foreign Patent Documents:
Other References:









Abstract:
Claim: CLAIM The ornamental design for a mask, as shown and described.
Description: FIG. 1 is a front perspective view of a mask showing my new design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a left side view thereof;

FIG. 5 is a right side view thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

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