Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Garden shovel
D475904 Garden shovel

Patent Drawings:
Inventor: Lin
Date Issued: June 17, 2003
Application: D/171,957
Filed: December 2, 2002
Inventors: Lin; Chi-Sui (Tai-chung Hsien, TW)
Assignee: Pao Shin Garden Tools Co., Ltd. (Lungjing Shian, TW)
Primary Examiner: Burgess; Pamela
Assistant Examiner:
Attorney Or Agent: Baxley; Charles E.
U.S. Class: D8/10
Field Of Search: D8/10; 294/49; 294/54.5; 294/55; 294/51
International Class:
U.S Patent Documents: D375027; D375881; D384251; 5765648
Foreign Patent Documents:
Other References:

Abstract:
Claim: The ornamental design for garden shovel, as shown and described.
Description: FIG. 1 is a perspective view of a garden shovel showing our new design thereof;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

* * * * *
 
 
  Recently Added Patents
API for building semantically rich diagramming tools
Image forming apparatus
Method for handling faxes by a fax machine
Image processing system and method
Fine bubble airlift device
Thick superconductor films with improved performance
Forming of a single-crystal semiconductor layer portion separated from a substrate
  Randomly Featured Patents
Device for the prestressing of concentric cylinders
Cordless drill
System for identifying memory requests as noncacheable or reduce cache coherence directory lookups and bus snoops
Transmission assembly for working vehicles
Method for fabricating flash memory device and flash memory device fabricated thereby
Single acting endoscopic instruments
Disposal bird feeder
Laser scoring of packaging substrates
Process for the manufacture of polyamides from diamine and diamide utilizing urea as catalyst
Method for inspecting a polishing pad in a semiconductor manufacturing process, an apparatus for performing the method, and a polishing device adopting the apparatus