Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Hair dryer
D260561 Hair dryer

Patent Drawings:
Inventor: Andis
Date Issued: September 1, 1981
Application: 06/096,785
Filed: November 23, 1979
Inventors: Andis; Matthew L. (Racine, WI)
Assignee: Andis Clipper Company (Racine, WI)
Primary Examiner: Zarfas; Louis S.
Assistant Examiner:
Attorney Or Agent: Michael, Best & Friedrich
U.S. Class: D28/13
Field Of Search: D28/9; D28/10; D28/12; D28/13; D28/14; D28/15; D28/16; D28/17; D28/18; 219/222; 132/7; 132/9; 34/96; 34/97; 34/98
International Class:
U.S Patent Documents: D196341; D223975
Foreign Patent Documents:
Other References: Merchandising Week, 7/15/1974, p. 69-Blow-out C. 1001, at center left..
Home Furnishings Daily, Monday, 7/14/1975, section 2, p. 18, Pearlduck Dryer at top right..

Abstract:
Claim: The ornamental design for a hair dryer, substantially as shown.
Description: FIG. 1 is a left side elevational view of a hair dryer showing my new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a top plan view thereof; and

FIG. 5 is a bottom plan view thereof.

* * * * *
 
 
  Recently Added Patents
Selecting transport addresses to route streams between endpoints
Composite diffuser plates and direct-lit liquid crystal displays using same
Two-group zoom lens and an electronic imaging apparatus having it
Parameter calibrating apparatus and method for a controller
Window frame component
Fiber optic cable
Current pulsing for unloading
  Randomly Featured Patents
Gas/liquid separator with controllable variable liquid level
Photo acid generator, chemical amplification resist material
Process for making molybdenum phosphosulfurized hydrocarbon composition
Oil tank for a motorcycle
Isoquinoline derivatives, analgesic compounds thereof and method of treating pain
Grease fitting cover and locator
Treatment of hypertension
Photosensitive polymer and photosensitive material for photomechanical process
Acoustic microbalance for in-situ deposition process monitoring and control
Clean-enclosure window to protect photolithographic mask