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Semiconductor device and manufacturing method of semiconductor device
7772675 Semiconductor device and manufacturing method of semiconductor device
Patent Drawings:Drawing: 7772675-10    Drawing: 7772675-11    Drawing: 7772675-12    Drawing: 7772675-13    Drawing: 7772675-14    Drawing: 7772675-15    Drawing: 7772675-16    Drawing: 7772675-17    Drawing: 7772675-2    Drawing: 7772675-3    
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(16 images)

Inventor: Dozen, et al.
Date Issued: August 10, 2010
Application: 11/812,813
Filed: June 21, 2007
Inventors: Dozen; Yoshitaka (Tochigi, JP)
Aoki; Tomoyuki (Tochigi, JP)
Takahashi; Hidekazu (Tochigi, JP)
Yamada; Daiki (Tochigi, JP)
Sugiyama; Eiji (Tochigi, JP)
Ogita; Kaori (Tochigi, JP)
Kusumoto; Naoto (Kanagawa, JP)
Assignee: Semiconductor Energy Laboratory Co., Ltd. (Atsugi-shi, Kanagawa-ken, JP)
Primary Examiner: Mandala; Victor A
Assistant Examiner:
Attorney Or Agent: Robinson; Eric J.Robinson Intellectual Property Law Office, P.C.
U.S. Class: 257/531; 257/532; 257/679; 257/E29.009
Field Of Search: 257/531; 257/532; 257/679; 257/E29.009
International Class: H01L 29/06
U.S Patent Documents:
Foreign Patent Documents: 2001-230269; 2002-298118; 2006-019717; WO 2005/119781
Other References:









Abstract: The present invention provides a thin and bendable semiconductor device utilizing an advantage of a flexible substrate used in the semiconductor device, and a method of manufacturing the semiconductor device. The semiconductor device has at least one surface covered by an insulating layer which serves as a substrate for protection. In the semiconductor device, the insulating layer is formed over a conductive layer serving as an antenna such that the value in the thickness ratio of the insulating layer in a portion not covering the conductive layer to the conductive layer is at least 1.2, and the value in the thickness ratio of the insulating layer formed over the conductive layer to the conductive layer is at least 0.2. Further, not the conductive layer but the insulating layer is exposed in the side face of the semiconductor device, and the insulating layer covers a TFT and the conductive layer. In addition, a substrate covering an element formation layer side is a substrate having a support on its surface is used in the manufacturing process.
Claim: What is claimed is:

1. A semiconductor device comprising: an element formation layer formed over a substrate; a storage element portion formed over the element formation layer; an antennaformed over the element formation layer; and a resin layer formed over the element formation layer, the storage element portion and the antenna, wherein a value in a thickness ratio of the resin layer formed on the antenna to the antenna is at least0.2.

2. The semiconductor device according to claim 1, wherein the resin layer comprises epoxy resin.

3. The semiconductor device according to claim 1, wherein the substrate has a thickness of 2 .mu.m to 20 .mu.m.

4. The semiconductor device according to claim 1, wherein an adhesive layer is provided between the substrate and the element formation layer.

5. A semiconductor device comprising: an element formation layer formed over a substrate; a storage element portion formed over the element formation layer; an antenna formed over the element formation layer; and a protective film formedover the element formation layer, the storage element portion and the antenna, wherein a value in a thickness ratio of the protective film formed on the antenna to the antenna is at least 0.2.

6. The semiconductor device according to claim 5, wherein the protective layer comprises epoxy resin.

7. The semiconductor device according to claim 5, wherein the substrate has a thickness of 2 .mu.m to 20 .mu.m.

8. The semiconductor device according to claim 5, wherein an adhesive layer is provided between the substrate and the element formation layer.

9. A semiconductor device comprising: an element formation layer formed over a substrate; a storage element portion formed over the element formation layer; an antenna formed over the element formation layer; and a resin layer formed overthe element formation layer, the storage element portion and the antenna, wherein the element formation layer comprises a read-write circuit for writing in data to the storage element portion and reading out the data from the storage element portion, anda semiconductor layer including an n-type impurity region and a p-type impurity region which are jointed, wherein the semiconductor layer is formed on the same surface as the read-write circuit, and wherein a value in a thickness ratio of the resin layerformed on the antenna to the antenna is at least 0.2.

10. The semiconductor device according to claim 9, wherein the resin layer comprises epoxy resin.

11. The semiconductor device according to claim 9, wherein the substrate has a thickness of 2 .mu.m to 20 .mu.m.

12. The semiconductor device according to claim 9, wherein an adhesive layer is provided between the substrate and the element formation layer.

13. A semiconductor device, comprising: an element formation layer formed over a substrate; a storage element portion formed over the element formation layer; an antenna formed over the element formation layer; and a protective film formedover the element formation layer, the storage element portion and the antenna, wherein the element formation layer comprises a read-write circuit for writing in data into the storage element portion and reading out the data from the storage elementportion, and a semiconductor layer including an n-type impurity region and a p-type impurity region which are jointed, wherein the semiconductor layer is formed on the same surface as the read-write circuit, and wherein a value in a thickness ratio ofthe protective film formed on the antenna to the antenna is at least 0.2.

14. The semiconductor device according to claim 13, wherein the protective layer comprises epoxy resin.

15. The semiconductor device according to claim 13, wherein the substrate has a thickness of 2 .mu.m to 20 .mu.m.

16. The semiconductor device according to claim 13, wherein an adhesive layer is provided between the substrate and the element formation layer.
Description:
 
 
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