| Patent Number |
Title Of Patent |
Date Issued |
| 7390609 |
Polymers and photoresists comprising same |
June 24, 2008 |
| New polymers are provided that have non-carbon tetravalent species (Si, Ti, Ge, Zr, Sn) and photoimageable compositions that contain such polymers. Preferred polymers are organic, e.g. one or more polymer repeat units comprise carbon atom(s). Particularly preferred are polymers that |
| 6907432 |
Method and system for recycling materials |
June 14, 2005 |
| A system and method is provided for recycling raw materials from a plurality waste streams generated by waste stream providers and includes a waste stream monitoring module for monitoring the plurality of waste streams and determining an amount of reusable raw materials contained in |
| 6858379 |
Photoresist compositions for short wavelength imaging |
February 22, 2005 |
| New photoresists are provided that are suitable for short wavelength imaging, including sub-200 nm such as 157 nm. In one aspect, resists of the invention comprise a fluorine-containing polymer, a photoactive component, and one or more additional components of an amine or other basic |
| 6844270 |
Polymers and photoresist compositions for short wavelength imaging |
January 18, 2005 |
| The present invention includes polyacetal polymers and photoresist compositions that include the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-30 |
| 6787286 |
Solvents and photoresist compositions for short wavelength imaging |
September 7, 2004 |
| New photoresists are provides that are suitable for short wavelength imaging, particularly sub-170 nm such as 157 nm. Resists of the invention comprise a fluorine-containing polymer, a photoactive component, and a solvent component. Preferred solvents for use on the resists of the in |
| 6645695 |
Photoresist composition |
November 11, 2003 |
| Disclosed are new photoresist compositions including polymeric particles as binders and a photoactive component. Also disclosed are methods of forming relief images using these photoresist compositions. |
| 6599951 |
Antireflective porogens |
July 29, 2003 |
| Disclosed are organo polysilica dielectric materials having low dielectric constants useful in electronic component manufacture are disclosed along with methods of preparing the porous organo polysilica dielectric materials. Also disclosed are methods of forming electronic devices co |
| 6596405 |
Antireflective porogens |
July 22, 2003 |
| Disclosed are organo polysilica dielectric materials having low dielectric constants useful in electronic component manufacture are disclosed along with methods of preparing the porous organo polysilica dielectric materials. Also disclosed are methods of forming electronic devices co |
| 6576681 |
Antireflective porogens |
June 10, 2003 |
| Disclosed are organo polysilica dielectric materials having low dielectric constants useful in electronic component manufacture are disclosed along with methods of preparing the porous organo polysilica dielectric materials. Also disclosed are methods of forming electronic devices co |
| 6503689 |
Antireflective composition |
January 7, 2003 |
| Disclosed are new antireflective compositions including cross-linked polymeric particles including one or more chromophores. Also disclosed are methods of forming relief images using these antireflective compositions. |
| 6492086 |
Phenolic/alicyclic copolymers and photoresists |
December 10, 2002 |
| The present invention relates to new polymers that contain repeat units of phenol and photoacid-labile esters that contain an alicyclic group, preferably a bulky group that suitably may contain 7 to about 20 carbons, such as an alkyladamantyl, ethylfencyl, tricyclo decanyl, or pinanyl |
| 6200479 |
Phenolic resin purification |
March 13, 2001 |
| The invention is for a process of removing acid salt contaminants from a resin solution. The process comprises providing an organic solution of a phenolic resin having a portion of its phenolic hydroxyl groups condensed with an acid halide in the presence of a base catalyst. The organic |
| 6051358 |
Photoresist with novel photoactive compound |
April 18, 2000 |
| An unsymetrical photoactive compound having the formula ##STR1## where Z is hydrogen, a hydrocarbon having from 1 to 8 carbon atoms, or halogen; D is hydrogen or diazo-oxo-naphthalene-sulfonyl; n is equal to 1 to 4; R.sub.1, R.sub.5 and R.sub.6 are independently a hydrocarbon or |
| 5945516 |
Thermodynamically stable photoactive compound |
August 31, 1999 |
| A method for converting a kinetically stable multiester of a naphthoquinone and an o-quinone diazide sulfonyl halide to a thermodynamically stable compound. The method comprises the steps of dissolving a phenol having at least two free phenolic hydroxyl groups and an o-naphthoquinone dia |
| 5939511 |
Resin purification process |
August 17, 1999 |
| The invention is directed to purification of phenolic resins and to a process for preparing an organic photoresist coating composition. The process comprises reacting one or more phenols to form a crude phenolic resin. The crude phenolic resin formed is then separated from its reaction |
| 5932389 |
Controlled alternating and block copolymer resins |
August 3, 1999 |
| This invention relates to alternating and block copolymer resins of uniform and controlled chain length and methods for preparing the same. The alternating copolymer resins are formed from the reaction of a bisoxymethylphenol, a reactive phenolic compound and a monooxymethylphenol. T |
| 5821345 |
Thermodynamically stable photoactive compound |
October 13, 1998 |
| A method for converting a kinetically stable multiester of a naphthoquinone and an o-quinone diazide sulfonyl halide to a thermodynamically stable compound. The method comprises the steps of dissolving a phenol having at least two free phenolic hydroxyl groups and an o-naphthoquinone dia |
| 5789522 |
Resin purification process |
August 4, 1998 |
| The invention is directed to purification of phenolic resins and to a process for preparing an organic photoresist coating composition. The process comprises reacting one or more phenols to form a crude phenolic resin. The crude phenolic resin formed is then separated from its reaction |
| 5723254 |
Photoresist with photoactive compound mixtures |
March 3, 1998 |
| The invention relates to a positive-acting photoresist composition containing a mixture of photoactive compounds. One component of the mixture is the esterification product of an o-quinonediazide sulfonyl compound with a phenolic resin. Another component of the mixture is the esterif |
| 5679766 |
Purification process of novolar resins using acid treated chelating cation exchange resin |
October 21, 1997 |
| The invention is for a process of removal of dissolved cation contaminants from a resin solution. The process of the invention involves providing a chelating ion exchange resin modified by treatment with an acid and contact of said solution with said modified exchange resin for a time |
| 5618932 |
Photoactive compounds and compositions |
April 8, 1997 |
| A new photoactive compound for use in the formulation of a photoresist comprises a bisphenol compound having an alkyl linkage substituted with a heterocyclic group. The new photoactive compound may be admixed with an alkali soluble resin to formulate a photoresist composition. The new |
| 5589553 |
Esterification product of aromatic novolak resin with quinone diazide sulfonyl group |
December 31, 1996 |
| A resin suitable for use as a photoresist that is the esterification product of an o-quinonediazide compound and an aromatic novolak resin. The aromatic novolak resin may be the condensation product of a reactive phenol with a bis(hydroxymethyl)phenol or an aromatic aldehyde. The aro |
| 5571886 |
Aromatic novolak resins |
November 5, 1996 |
| An essentially aromatic alkali soluble novolak resin comprising the product resulting from the acid condensation of an aromatic aldehyde and a phenol where the resin has a molecular weight in excess of 1500 and a glass transition temperature in excess of 125.degree. C. If desired, the |
| 5529880 |
Photoresist with a mixture of a photosensitive esterified resin and an o-naphthoquinone diazide |
June 25, 1996 |
| A photoresist that is a mixture of the esterification product of an o-quinonediazide compound and a novolak resin and a high molecular weight phenol having from 2 to 5 phenolic groups and at least 4 diazo naphthoquinone groups. The extent of esterification of the novolak resin is up |
| 5514515 |
Photoactive compounds having a heterocyclic group used in photoresist compositions |
May 7, 1996 |
| A new photoactive compound for use in the formulation of a photoresist comprises a bisphenol compound having an alkyl linkage substituted with a heterocyclic group. The new photoactive compound may be admixed with an alkali soluble resin to formulate a photoresist composition. The new |
| 5419995 |
Photoresist composition with alternating or block copolymer resins and positive-working o-quinon |
May 30, 1995 |
| A photoresist comprising a light sensitive component and an alternating copolymer resin formed by condensing a preformed bishydroxymethylated compound and a reactive phenol, in the absence of an aldehyde. Additional useful resins may be formed by further reacting the alternating copolyme |
| 5266440 |
Photoresist composition with aromatic novolak binder having a weight-average molecular weight in |
November 30, 1993 |
| A photoresist comprising a light sensitive component and an essentially aromatic alkali soluble novolak resin comprising the product resulting from the acid condensation of an aromatic aldehyde and a phenol where the resin has a molecular weight in excess of 1,500 and a glass transition |
| 5238776 |
Photoresist composition containing block copolymer resin and positive-working o-quinone diazide |
August 24, 1993 |
| A photoresist comprising a light sensitive component and an alternating copolymer resin formed by condensing a preformed bishydroxymethylated compound and a reactive phenol, in the absence of an aldehyde. Additional useful resins may be formed by further reacting the alternating copolyme |
| 5216111 |
Aromatic novolak resins and blends |
June 1, 1993 |
| An essentially aromatic alkali soluble novolak resin comprising the product resulting from the acid condensation of an aromatic aldehyde and a phenol where the resin has a molecular weight in excess of 1500 and a glass transition temperature in excess of 125.degree. C. If desired, the |
| 5178986 |
Positive photoresist composition with naphthoquinonediazidesulfonate of oligomeric phenol |
January 12, 1993 |
| A radiation sensitive oligomeric compound is described as the photoactive component with a base soluble phenolic matrix resin to provide improved photo-resist composition having high light-sensitivity, high resolution, excellent developer resistance and excellent resistance to thermal fl |
| 5164279 |
Positive dye photoresist compositions with 4,6-bis(azophenyl)resorcinol |
November 17, 1992 |
| This invention provides improved positive photoresist compositions containing a bis(azophenyl)resorcinol as a dye. |
| 5130410 |
Alternating and block copolymer resins |
July 14, 1992 |
| This invention relates to alternating and block copolymer resins and methods for preparing the same. The alternating copolymer resins are formed from the reaction of a preformed bishydroxymethyl phenol and a reactive phenolic compound. The alternating copolymer may then be further re |
| 5128230 |
Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, ani |
July 7, 1992 |
| This invention is directed to novel photoresist processes and compositions having high resolution novalac resins, high resolution photoactive components with several diazoquinone groups per molecule, and solvents having a high solvency power, better safety, improved photospeed, higher |
| 4983492 |
Positive dye photoresist compositions with 2,4-bis(phenylazo)resorcinol |
January 8, 1991 |
| This invention provides improved positive photoresist compositions containing a bis(azophenyl)resorcinol as a dye. |
| 4701186 |
Polymeric membranes with ammonium salts |
October 20, 1987 |
| Asymmetric polymeric gas separation membranes have ammonium salts bonded to the polymer to provide a membrane with enhanced separation factor. |
| 4654055 |
Asymmetric gas separation membranes |
March 31, 1987 |
| Asymmetric gas separation membranes of materials having selective permeation of at least one gas of a gaseous mixture over that of one or more remaining gases of the gaseous mixture, exhibit significantly improved permeation selectivities for the at least one gas when the asymmetric |
| 4652283 |
Polyphenylene oxide membrane having chemically bonded coating |
March 24, 1987 |
| A coated membrane for gas separations wherein the membrane is made up of an amine cross-linked poly(phenylene oxide) substrate membrane having about 1 to about 7 weight percent nitrogen and a coating on the substrate membrane. The coating is a polymer containing groups capable of reactin |
| 4647297 |
Benzyl substituted phenylene oxide membrane |
March 3, 1987 |
| A gas separation membrane made from a benzyl-substituted polymer of 2,6-dimethyl-1,3-phenylene oxide having the structure ##STR1## wherein the benzyl substituent, X, is selected from the group consisting of ##STR2## where R.sub.1 and R.sub.2 are hydrogen, an alkyl, phenyl or |
| 4575385 |
Permeation modified gas separation membranes |
March 11, 1986 |
| Asymmetric gas separation membranes of polymeric materials having selective permeation of at least one gas of a gaseous mixture over that of one or more remaining gases of the gaseous mixture, exhibit improved permeation selectivities for the at least one gas when the asymmetric membrane |
| 4530703 |
Cross-linked polyarylene oxide membranes |
July 23, 1985 |
| Covalently-bonded, cross-linked polymeric gas separation membranes of a polyarylene oxide precursor and a chemical cross-linking agent. Apparatus and processes utilizing such membranes for selectively separating at least one gas from a gaseous mixture by permeation.Membranes include subs |
| 4488886 |
Amorphous aryl substituted polyarylene oxide membranes |
December 18, 1984 |
| Asymmetric polymeric gas separation membranes comprise amorphous aryl substituted arylene oxide polymer. Such amorphous polymer is capable of forming hollow fiber membranes by wet spinning procedures utilizing coagulation baths and bore injection fluids comprising water. Desirable ar |
| 4486202 |
Asymmetric gas separation membranes |
December 4, 1984 |
| Asymmetric gas separation membranes of materials having selective permeation of at least one gas of a gaseous mixture over that of one or more remaining gases of the gaseous mixture, exhibit significantly improved permeation selectivities for the at least one gas when the asymmetric |
| 4484935 |
Permeation modified membrane |
November 27, 1984 |
| A multicomponent membrane having improved permeation characteristics for separation of one gas from a mixture of gases by permeation of the one gas through the membrane. The membrane is in the form of a porous, anisotropic substrate membrane and a coating in contact with the substrate me |
| 4472175 |
Asymmetric gas separation membranes |
September 18, 1984 |
| Asymmetric gas separation membranes of materials having selective permeation of at least one gas of a gaseous mixture over that of one or more remaining gases of the gaseous mixture, exhibit significantly improved permeation selectivities for the at least one gas when the asymmetric |
| 4468503 |
Amino ketone cross-linked polyphenylene oxide |
August 28, 1984 |
| Cross-linked polyphenylene oxide compositions comprise the reaction product of haloacylated polyphenylene oxide and ammonia. The polyphenylene oxide chains are cross-linked by amino ketone bonding. Such cross-linked polymers are useful as membranes, for instance gas separation membranes. |
| 4468502 |
Cross-linked polyphenylene oxide |
August 28, 1984 |
| Cross-linked polyphenylene oxides comprise the reaction product of alkyl halogenated phenylene oxide polymer and primary monoamines, such as methylamine, ethylamine, propylamine, butylamine and aniline. Such cross-linked polyphenylene oxide compositions are useful as membranes. |
| 4468501 |
Cross-linked polyphenylene oxide |
August 28, 1984 |
| Cross-linked polyphenylene oxide compositions comprise the reaction product of an alkyl halogenated phenylene oxide polymer and ammonia. The cross-linkage between phenylene groups is benzyl amine linkage represented by the structural formula --CH.sub.2 NHCH.sub.2 --. The cross-linked |
| 4468500 |
Amino ketone cross-linked polyphenylene oxide |
August 28, 1984 |
| Cross-linked polyphenylene oxide compositions comprise the reaction product of haloacylated polyphenylene oxide and a primary monoamine. The polyphenylene oxide chains are cross-linked by amino ketone bonding. Such cross-linked polymers are useful as membranes, for instance gas separatio |
| 4323453 |
Tube sheets for permeators |
April 6, 1982 |
| Tube sheets having a plurality of hollow fiber membranes suitable for fluid separations which are adapted to be provided in a fluid tight relationship within a permeator comprise a cured epoxy resin comprising polyglycidyl resin and imidazole curing agent. Methods are provided for making |
