| Patent Number |
Title Of Patent |
Date Issued |
| 6399954 |
Charged-particle beam lithography apparatus and system capable of readily detecting abnormality |
June 4, 2002 |
| Disclosed is a charged-particle beam lithography apparatus capable of readily detecting an abnormality in controlling the on-off operation of a charged-particle beam. The charged-particle beam lithography apparatus consists of a charged-particle beam generator, a charged-particle beam |
| 6242751 |
Charged-particle-beam exposure device and charged-particle-beam exposure method |
June 5, 2001 |
| A method of exposing a wafer to a charged-particle beam by directing to the wafer the charged-particle beam deflected by a deflector includes the steps of arranging a plurality of first marks at different heights, focusing the charged-particle beam on each of the first marks by using a |
| 6072185 |
Charged-particle-beam exposure device and method capable of high-speed data reading |
June 6, 2000 |
| A device exposing a wafer to charged-particle beams in an exposure process generates a plurality of micro beams and controls deflection of each of the micro beams, relative to whether or not the micro beams reach the wafer, in accordance with control data. A data processing unit inserts |
| 5969365 |
Charged-particle-beam exposure device and charged-particle-beam exposure method |
October 19, 1999 |
| A method of exposing a wafer to a charged-particle beam by directing to the wafer the charged-particle beam deflected by a deflector includes the steps of arranging a plurality of first marks at different heights, focusing the charged-particle beam on each of the first marks by using a |
| 5965895 |
Method of providing changed particle beam exposure in which representative aligning marks on an |
October 12, 1999 |
| A method for providing charged particle beam exposure onto an object having a plurality of chip areas with a plurality of aligning marks formed in correspondence to each of said chip areas. A charged particle beam is irradiated upon an object mounted on a mobile step based upon positions |
| 5910658 |
Method and system for changed particle beam exposure |
June 8, 1999 |
| Adjusting variable delay circuit 311, receiving signal S1, is connected to the input of drive circuit 312. A time point t1, when the output potential of drive circuit 312 traverses reference potential VA between the potential Va of traveling wave V1F of the output potential and 0 V, is |
| 5808313 |
Charged particle beam exposure method and charged particle beam exposure apparatus |
September 15, 1998 |
| The object of the present invention is to ensure a correct exposure even when a single exposure apparatus is used to expose a predetermined pattern, and an exposure apparatus therefor. According to the present invention, a charged particle beam exposure method, wherein a charged part |
| 5757015 |
Charged-particle-beam exposure device and charged-particle-beam exposure method |
May 26, 1998 |
| A method of exposing a wafer to a charged-particle beam by directing to the wafer the charged-particle beam deflected by a deflector includes the steps of arranging a plurality of first marks at different heights, focusing the charged-particle beam on each of the first marks by using a |
| 5721432 |
Method of and system for charged particle beam exposure |
February 24, 1998 |
| To improve in the throughput of an exposure system, the setting time during a step change in the output of an amplifier is reduced by switching resistance between the amplifier and deflector, a glitch waveform generated during a step change in the output of a D/A converter at the pre |
| 5719402 |
Method of and system for charged particle beam exposure |
February 17, 1998 |
| To improve the throughput of an exposure system, the setting time during a step change in the output of an amplifier is reduced by switching resistance between the amplifier and a deflector. A glitch waveform generated during a step change in the output of a D/A converter at the prec |
| 5546319 |
Method of and system for charged particle beam exposure |
August 13, 1996 |
| To improve in the throughput of an exposure system, the setting time during a step change in the output of an amplifier is reduced by switching resistance between the amplifier and a deflector, a glitch waveform generated during a step change in the output or a D/A converter at the p |
| 5134398 |
Digital-to-analog converter having a circuit for compensating for variation in output dependent |
July 28, 1992 |
| A D/A converter converting a digital signal having n bits (n is an integer) into an analog signal includes constant-current output circuits, provided for the n bits of the digital signal, for selectively generating n constant currents on the basis of the n bits of the digital signals. Th |
