| Patent Number |
Title Of Patent |
Date Issued |
| RE37352 |
Projection optical apparatus |
September 4, 2001 |
| A projection optical apparatus for projection an image of an object onto a workpiece, which is suitable for use, for example, as an exposure apparatus used in the manufacture of integrated circuits. The projection optical apparatus includes an image forming optical system whose optical |
| 7406140 |
Wraparound canceller, relay system, and wraparound cancelling method |
July 29, 2008 |
| A loop interference canceller that carries out an adaptive operation of responding to time variations of the phase or level of loop interference wave or key station wave at high speed and with high accuracy and reduces the size of an apparatus. The loop interference canceller of the pres |
| 7320713 |
Treatment of fiber with water containing fine powder of noble metal dispersed therein |
January 22, 2008 |
| A method of burning noble metals in high-pressure water using hydrogen and oxygen to produce noble metal micro-dispersion water in which super-fine noble metal particles are dispersed, and use the obtained noble metal micro-dispersion water to treat fiber products in order to provide |
| 7314499 |
Method and device for manufacturing advanced water containing ultra-fine gold particles |
January 1, 2008 |
| Produce high-function water useful for consumption as healthy drinking water or in the production of health supplements, cosmetic products, food preservatives, freshness-keeping agents for food, insect repellents or deodorizers, wherein such water contains micro-dispersed ultra-fine gold |
| 7300672 |
Titanium-group metal containing high-performance water, and its producing method and apparatus |
November 27, 2007 |
| Produce titanium-group metal micro-dispersion water that contains ion vapor of titanium-group metal in micro-dispersed state and that can be used as a material for health products, medical products, cosmetics, etc., by using an apparatus comprising a water tank, a high-voltage discha |
| 7300491 |
Method and apparatus for the production of metal powder |
November 27, 2007 |
| Provide a method and apparatus for producing, in an economical manner, metal powder offering high purity and comprising uniform particle shape and size. Produce metal powder of titanium metal, etc., using an apparatus that comprises a power supply for high-voltage/current discharge, |
| 7225588 |
Damping brace and structure |
June 5, 2007 |
| A damping brace having an axial force member for providing bearing forces against tensile or compressive forces, a constraining member for constraining the axial force member, and a stiffening part for supplementing the stiffness of the axial force member. An adhesion preventive coat |
| 7201945 |
Healthy fiber products |
April 10, 2007 |
| A fiber product offering health-enhancing effects is obtained by causing a fibrous substrate to contain or be bonded with finely divided titanium powder through the process of impregnation with a water solution containing finely divided titanium powder, which is obtained by dissolvin |
| 7144589 |
High functional water containing titanium and method and apparatus for producing the same |
December 5, 2006 |
| This invention provides a method and apparatus for manufacturing titanium-dissolved water with molten titanium dissolved therein, the molten titanium being titanium metal melted by the combustion gas resulting from the combustion of a mixed gas of oxygen and hydrogen in high-pressure |
| 7133481 |
Synchronization detection apparatus |
November 7, 2006 |
| An input signal DT contains a segment synchronization signal compliant with the ATSC standard. A clock multiplication section 111 multiplies a clock CK. A switchable sampling section 112 selects a sample point from among a plurality of timing points that are defined by the multiplied |
| 7118684 |
Treatment of fiber with water containing fine powder of noble metal dispersed therein |
October 10, 2006 |
| Burn noble metal in high-pressure water using hydrogen and oxygen to produce noble metal micro-dispersion water in which super-fine noble metal particles are dispersed, and use the obtained noble metal micro-dispersion water to treat fiber products in order to provide high-function f |
| 7108735 |
Method and device for manufacturing metallic particulates, and manufactured metallic particulate |
September 19, 2006 |
| Produce metal particles offering high purity and uniform granular shape and size: by forming a combustion chamber comprising an injector nozzle for mixture gas of oxygen and hydrogen, an ignition device and a material metal feeder in the upper space of a high-pressure water tank filled w |
| 6989127 |
Health ornament containing titanium powder and method for manufacturing thereof |
January 24, 2006 |
| Manufacture health ornaments such as necklaces, bracelets and wristbands that provide sufficient health-promoting function and effective therapeutic action for a long time, by burning a gaseous mixture of oxygen and hydrogen in high-pressure water, using the resultant gas to heat and |
| 6936831 |
Divided reticles for charged-particle-beam microlithography apparatus, and methods for using sam |
August 30, 2005 |
| Reticles and apparatus for performing charged-particle-beam microlithography, and associated methods, are disclosed, in which the pattern to be transferred to a sensitive substrate is divided according to any of various schemes serving to improve throughput and pattern-transfer accur |
| 6917048 |
Methods and devices for controlling blur resulting from the space-charge effect and geometrical |
July 12, 2005 |
| Methods and devices are disclosed for controlling blur resulting from the space-charge effect and geometrical aberration in a charged-particle-beam microlithography apparatus. Based on the pattern-element densities of the exposure units to be transferred to the substrate, a relationship |
| 6879258 |
IC card having a mica film for stable resonance frequency and enhanced antenna properties |
April 12, 2005 |
| An IC card 10A has a mica capacitor that comprises a mica film 1 and electrodes 6a, 6b formed on both sides thereof, where the mica film 1 serves as a mounting substrate for an antenna coil 2 and an IC chip 3, thereby reducing profile of an IC card and also reducing its cost of manuf |
| 6768124 |
Reticle-focus detector, and charged-particle-beam microlithography apparatus and methods compris |
July 27, 2004 |
| Due to its lack of appreciable thickness, the reticle used in charged-particle-beam (CPB) microlithography is prone to bending and flexing, causing instability in reticle axial height position relative to the projection-lens system, with consequent errors in image focus, rotation and |
| 6756182 |
Charged-particle-beam microlithography methods exhibiting reduced coulomb effects |
June 29, 2004 |
| Methods are disclosed for performing charged-particle-beam (CPB, e.g., electron-beam) microlithography with reduced Coulomb effects being manifest in pattern images as formed on the surface of a sensitive substrate. The pattern is defined on a segmented reticle, which can be a scatte |
| 6753032 |
Vegetable sterol-containing fat compositions and process for producing the same |
June 22, 2004 |
| The plant sterol-containing fat composition of the present invention contains a plant sterol fatty acid ester (A); and from 10 to 70% by weight of a partial glyceride (B). It can provide a cholesterol absorption inhibiting effect, and capable of ensuring no addition of an emulsifier or |
| 6739099 |
Column-and-beam join structure |
May 25, 2004 |
| The present invention provides a column-and-beam join structure which absorbs energy caused by a large earthquake or the like by split tees surely yielding at a prescribed value, does not cause other members to fracture, and thus makes it possible to replace only the split tees which |
| 6699639 |
Projection-exposure methods and apparatus exhibiting increased throughput |
March 2, 2004 |
| Projection-exposure apparatus and methods are disclosed that exhibit increased throughput by providing improved schemes by which the reticle stage and wafer stage move to accomplish exposure. Portions of a die pattern on a "pattern original" (e.g., reticle) are sequentially illuminat |
| 6657207 |
Charged-particle-beam microlithography apparatus and methods including optical corrections made |
December 2, 2003 |
| Charged-particle-beam (CPB) apparatus and methods are disclosed that achieve efficient correction of imaging conditions such as shape-astigmatic aberrations, etc., caused by differences in the distribution of pattern elements within respective subfields of the reticle. Indices based |
| 6621089 |
Reticle-focus detector, and charged-particle-beam microlithography apparatus and methods compris |
September 16, 2003 |
| The thickness of the reticle used in charged-particle-beam (CPB) microlithography is a few microns at most. Hence, the reticle bends easily and flexes when subject to vibration, causing instability in reticle axial height position relative to the projection-lens system, and errors in |
| 6618119 |
Projection exposure method and apparatus |
September 9, 2003 |
| A scanning exposure method includes relatively moving a mask and an illuminated area of an exposure beam during a scanning exposure, an image of a pattern of said mask being projected onto a substrate through a projection system; and performing, during the scanning exposure, an imagi |
| 6608665 |
Scanning exposure apparatus having adjustable illumination area and methods related thereto |
August 19, 2003 |
| In a projection exposure apparatus for transferring a pattern formed in a transfer area on a mask onto a photosensitive substrate by a scanning exposure system, provision is made of an illuminating optical system for applying illuminating light to the transfer area of the mask through a |
| 6590218 |
Projection-exposure methods and apparatus exhibiting increased throughput |
July 8, 2003 |
| Projection-exposure apparatus and methods are disclosed that exhibit increased throughput by providing improved schemes by which the reticle stage and wafer stage move to accomplish exposure. Portions of a die pattern on a "pattern original" (e.g., reticle) are sequentially illuminat |
| 6585165 |
IC card having a mica capacitor |
July 1, 2003 |
| An IC card 10A has a mica capacitor 5, an antenna coil 2 and an IC chip 3 formed on an insulating substrate 1, where the mica capacitor is composed of a mica film 6 and electrodes 7a and 7b formed on both sides of the mica film 6. terminal of the electrode 7b on one side of the mica capa |
| 6573515 |
Charged-particle-beam projection-exposure apparatus and methods exhibiting improved alignment an |
June 3, 2003 |
| Charged-particle-beam projection-exposure apparatus and methods are disclosed that achieve improved pattern-transfer accuracy, especially when using a segmented stencil reticle. To such end, the pattern field of a reticle pattern is divided into multiple exposure units that are indiv |
| 6572022 |
Information recording tag |
June 3, 2003 |
| An information recording tag contains: an IC module in which a resonance circuit and an IC chip 3 are packaged on a substrate 1 where the resonance circuit has an antenna coil 2 and a film condenser 5; and an adhesive 17 that is applied to the IC module in order to adhere said IC m |
| 6518887 |
Information recording tag |
February 11, 2003 |
| The information recording tag includes an IC module in which an IC chip and a resonance circuit which is composed of a film capacitor and of an antenna coil are packaged on a substrate, and an adhesive that is applied to the IC module in order to adhere said IC module to an adherend S. T |
| 6496247 |
Exposure apparatus and exposure method |
December 17, 2002 |
| In a slit scan type projection exposure apparatus, a predetermined number of pulsed lights are emitted from a pulsed light source to transfer a pattern on a reticle to a wafer while the reticle and the wafer are scanned at a constant speed with respect to an exposure area on the wafer. |
| 6456363 |
Exposure control apparatus and method |
September 24, 2002 |
| An apparatus has a pulse light source for emitting light pulses with varying light quantities, an illumination optical system for radiating the light pulses from the source onto a predetermined illumination region on a mask on which a transfer pattern is formed, and a projection optical |
| 6433649 |
Non-reciprocal circuit element and millimeter-wave hybrid integrated circuit board with the non- |
August 13, 2002 |
| A non-reciprocal circuit element includes a microstrip TM.sub.n10 resonator (n is a positive integer) with a metal disk and branches projecting from the metal disk in a trigonally symmetric structure, and a ferrite magnetic body spontaneously magnetized and coaxially disposed on the micr |
| 6433347 |
Charged-particle-beam projection-exposure methods and apparatus that selectively expose desired |
August 13, 2002 |
| Methods and apparatus are disclosed for performing charged-particle-beam projection exposure of selected exposure units of a pattern, defined by a reticle, without compromising throughput or transfer accuracy. An illumination beam sequentially illuminates individual exposure units (e |
| 6411364 |
Exposure apparatus |
June 25, 2002 |
| An exposure apparatus for transferring a pattern formed on a mask to a photosensitive substrate is provided with an illumination optical system for illuminating a local area on the mask with a light beam, a projection optical system for projecting the pattern of the mask to the photo |
| 6384898 |
Projection exposure apparatus |
May 7, 2002 |
| Light from an alignment illumination system having a flash lamp is bent by a beam splitter to be illuminated onto an alignment mark on a wafer through a microscope optical system. An alignment signal treatment system reads output values from wafer stage interfermoters at the same time th |
| 6350459 |
Solubilized cosmetic composition with a pharmaceutical or cosmetic agent, a methacrylate copolym |
February 26, 2002 |
| A solubilized cosmetic composition containing an ingredient which is difficult to be dissolved in water, an alkyl-modified carboxyvinyl polymer and a hydroxyalkylated cyclodextrin so as to solubilize the ingredient difficult to be dissolved in water and in particular substantially not |
| 6295119 |
Scanning type exposure apparatus with multiple field diaphragms for providing consistent exposur |
September 25, 2001 |
| A scanning exposure apparatus of the scan-and-stitch type for stitching and forming a plurality of pattern images while partially superimposing them on a photosensitive substrate along a direction perpendicular to a scanning direction. The apparatus includes a fixed field diaphragm for |
| 6292254 |
Projection exposure method and apparatus |
September 18, 2001 |
| A transfer method includes a step of disposing a mask and a substrate with a projection optical system interposed therebetween in planes substantially perpendicular to the optical axis thereof; and a step of moving the image plane of the projection optical system and the substrate re |
| 6277533 |
Scanning exposure method |
August 21, 2001 |
| In exposure by a scanning exposure system, when the pattern of a reticle is exposed onto shot areas on a wafer while reading ahead to detect the focus positions at read-ahead regions before an exposure region 16, 116 with respect to the scanning direction, (1) for each of shot areas S10, |
| 6268906 |
Exposure apparatus and exposure method |
July 31, 2001 |
| In a slit scan type projection exposure apparatus, a predetermined number of pulsed lights are emitted from a pulsed light source to transfer a pattern on a reticle to a wafer while the reticle and the wafer are scanned at a constant speed with respect to an exposure area on the wafer. |
| 6259510 |
Exposure method and apparatus |
July 10, 2001 |
| An exposure apparatus for transferring a pattern formed on a mask to a photosensitive substrate is provided with an illumination optical system for illuminating a local area on the mask with a light beam, a projection optical system for projecting the pattern of the mask to the photo |
| 6235221 |
Multilayer ceramic part |
May 22, 2001 |
| A multilayer ceramic part of the invention comprises an internal conductor layer and a ceramic layer which are formed by co-firing. The internal conductor layer is formed of an electrical conducting material containing silver as a main component, and the ceramic layer is formed of an |
| 6232051 |
Method for production of semiconductor devices |
May 15, 2001 |
| The resist to be used for the method of this invention in producing a semiconductor device is patterned by a procedure which comprises the steps of disposing in the direction of a semiconductor wafer a first mask having circuit patterns repeatedly formed at a plurality of positions, then |
| 6222615 |
Exposure control apparatus and method |
April 24, 2001 |
| An apparatus has a pulse light source for emitting light pulses with varying light quantities, an illumination optical system for radiating the light pulses from the source onto a predetermined illumination region on a mask on which a transfer pattern is formed, and a projection optical |
| 6218058 |
Charged particle beam transfer mask |
April 17, 2001 |
| A charged particle beam transfer mask (6) has a plurality of subfields (8) each of which having a different pattern density. The charged particle beam transfer mask (6) divide-irradiates a charged particle beam (5) for each of the subfields (8) and reduce-transfers a pattern onto a sensi |
| 6198708 |
Disk driving device capable of formatting a finalized rewritable disk |
March 6, 2001 |
| A disk driving device having a disk drive which records data on and retrieves data from a rewritable disk, including a finalizing means which executes a finalizing operation which inhibits writing to the disk, a judgment means which judges whether a rewritable disk has already been f |
| 6120884 |
Conductor paste and multilayer ceramic part using the same |
September 19, 2000 |
| An object is to provide a conductor paste of quality which uses a silver base internal conductor, suppresses the generation of voids and the concomitant occurrence of cracks even when co-fired with ceramic material by the conductor melting method, and has improved productivity, reduced |
| 6118515 |
Scanning exposure method |
September 12, 2000 |
| In exposure by a scanning exposure system, when the pattern of a reticle is exposed onto shot areas on a wafer while reading ahead to detect the focus positions at read-ahead regions before an exposure region 16, 116 with respect to the scanning direction, (1) for each of shot areas S10, |
| 6104474 |
Apparatus and method for controlling scanning exposure of photosensitive substrate |
August 15, 2000 |
| An exposure amount control device for controlling an integrated exposure amount of pulsed light to a photosensitive substrate within a predetermined range in which a pattern of a mask is successively exposed on the substrate by synchronously scanning the mask forming the pattern to b |
