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Patrick Schiavone Patents |
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Inventor: Schiavone; Patrick
Address: Birmingham, MI
No. of patents: 47
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| D572645 |
Automotive front end |
July 8, 2008 |
|
| D572641 |
Vehicle windshield |
July 8, 2008 |
|
| D569020 |
Vehicle headlight |
May 13, 2008 |
|
| D568213 |
Vehicle exterior |
May 6, 2008 |
|
| D566641 |
Automotive wheel |
April 15, 2008 |
|
| D562193 |
Vehicle grille |
February 19, 2008 |
|
| D559747 |
Vehicle hood |
January 15, 2008 |
|
| D559416 |
Vehicle headlight |
January 8, 2008 |
|
| D559413 |
Automobile headlight lens |
January 8, 2008 |
|
| D559412 |
Automobile headlight lens |
January 8, 2008 |
|
| D558102 |
Automobile grille |
December 25, 2007 |
|
| D556110 |
Vehicle tailgate |
November 27, 2007 |
|
| D555557 |
Vehicle fender |
November 20, 2007 |
|
| D555550 |
Vehicle grille |
November 20, 2007 |
|
| D553053 |
Automotive exterior |
October 16, 2007 |
|
| D552023 |
Automotive front end |
October 2, 2007 |
|
| D550135 |
Automotive quarter panel |
September 4, 2007 |
|
| D548147 |
Vehicle hood |
August 7, 2007 |
|
| D548146 |
Vehicle front bumper cover |
August 7, 2007 |
|
| D545740 |
Vehicle mirror |
July 3, 2007 |
|
| D541719 |
Automotive tailgate |
May 1, 2007 |
|
| D541710 |
Vehicle upper bumper |
May 1, 2007 |
|
| D541709 |
Vehicle bumper cover |
May 1, 2007 |
|
| D541708 |
Vehicle bumper |
May 1, 2007 |
|
| D540723 |
Vehicle front bumper |
April 17, 2007 |
|
| D535594 |
Vehicle front bumper |
January 23, 2007 |
|
| D535591 |
Automobile grille |
January 23, 2007 |
|
| D535589 |
Vehicle grille |
January 23, 2007 |
|
| D535221 |
Vehicle grille |
January 16, 2007 |
|
| D535045 |
Vehicle headlight lens |
January 9, 2007 |
|
| D534105 |
Vehicle lower front bumper |
December 26, 2006 |
|
| D533485 |
Vehicle grille |
December 12, 2006 |
|
| D533119 |
Vehicle grille |
December 5, 2006 |
|
| D532728 |
Vehicle hood |
November 28, 2006 |
|
| D532727 |
Vehicle grille |
November 28, 2006 |
|
| D532724 |
Vehicle grille |
November 28, 2006 |
|
| D532723 |
Vehicle grille |
November 28, 2006 |
|
| D526435 |
Headlight lens |
August 8, 2006 |
|
| D525387 |
Vehicle tail light lens |
July 18, 2006 |
|
| D517449 |
Pick up truck |
March 21, 2006 |
|
| D514492 |
Vehicle running board |
February 7, 2006 |
|
| D495626 |
Pick up truck |
September 7, 2004 |
|
| 7259112 |
Method for minimizing corner effect by densifying the insulating layer |
August 21, 2007 |
| The invention concerns a method for minimizing "corner" effects in shallow silicon oxide trenches, by densifying the silicon oxide layer after it has been deposited in the trenches. Said densification is preferably carried out by irradiating the layer under luminous radiation with weak |
| 7090285 |
Automotive door assembly |
August 15, 2006 |
| A door assembly is provided having an ergonomic egress handle. The egress handle includes a door release lever that is pivotally connected to an automotive vehicle door about an axis that is generally perpendicular to the door for unlatching the door so that the door may be opened relati |
| 6528341 |
Method of forming a sion antireflection film which is noncontaminating with respect to deep-uv p |
March 4, 2003 |
| A method of forming a silicon oxynitride antireflection film which is noncontaminating with respect to deep-ultraviolet photoresists (DUV photoresists) on each of a series of silicon semiconductor substrates successively introduced into the same reactor chamber includes a step of pla |
| 6387808 |
Method of correcting topographical effects on a micro-electronic substrate |
May 14, 2002 |
| A method of correcting topographical effects on a microelectronic substrate, the method comprising the steps consisting in depositing a layer of resin on the structure to be planarized having topography in relief surrounded by isolation zones, and subjecting said resin layer in its z |
| 6171973 |
Process for etching the gate in MOS technology using a SiON-based hard mask |
January 9, 2001 |
| A process for etching a gate conductor material in the fabrication of MOS transistors is presented. A hard mask layer composed of silicon oxynitride is formed upon a gate conductor layer. The hard mask layer is preferably patterned using a resin layer. The patterned hard mask layer is pr |
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