| Patent Number |
Title Of Patent |
Date Issued |
| 5786127 |
Photosensitive element having an overcoat which increases photo-speed and is substantially imper |
July 28, 1998 |
| This invention relates to a novel photosensitive element comprising: a support having a surface; a photosensitive layer on the surface; and a transparent, protective coating on the photosensitive layer. The photosensitive layer comprises a composition of an ethylenically unsaturated |
| 4752283 |
Waste water cleaning system for use with apparatus for processing exposed lithographic plates |
June 21, 1988 |
| A waste water cleaning system for use with apparatus for processing exposed lithographic plates, the processing apparatus receiving wash water for use in the processing. The cleaning system includes a centrifuge for removing contaminants from waste water from the processing apparatus, th |
| 4334755 |
Apparatus and method for processing lithographic plates |
June 15, 1982 |
| Apparatus for processing lithographic plates after they have been exposed and developed having a system for feeding plates forward one after another in a predetermined path with the exposed and developed face of the plate facing up, a heating system for heating each plate as it travels a |
| 4292396 |
Method for improving the press life of a lithographic image having an outer layer comprising an |
September 29, 1981 |
| A method of increasing the strength, abrasion resistance, solvent resistance, and press life of a lithographic image comprising a layer of light-reacted light sensitive material and an outer layer comprising an epoxy resin overlying the light-reacted layer. In the method, the surface |
| 4272605 |
Base plate and lithographic plate prepared by sensitization thereof |
June 9, 1981 |
| A base plate adapted to be coated with a light-sensitive diazo resin, and a lithographic plate which may be prepared therefrom. The base plate includes a substrate comprising a metal support and having a water-wettable, hydrophilic surface. Over the substrate and in direct contact wi |
| 4272604 |
Base plate and lithographic plate prepared by sensitization thereof |
June 9, 1981 |
| A base plate adapted to be coated with a light-sensitive diazo resin, and a lithographic plate which may be prepared therefrom. The base plate includes a substrate comprising a metal support and having a water-wettable, hydrophilic surface. Over the substrate and in direct contact wi |
| 4198470 |
Base plate and lithographic plate prepared by sensitization thereof |
April 15, 1980 |
| A base plate adapted to be coated with a light-sensitive diazo resin, and a lithographic plate which may be prepared therefrom. The base plate includes a substrate comprising a metal support and having a water-wettable, hydrophilic surface. Over the substrate and in direct contact wi |
| 3993684 |
Monomeric compounds |
November 23, 1976 |
| Photosensitive homopolymers and substantially non-crosslinked copolymers containing the recurring unit: ##EQU1## R.sub.1 may be substituted or unsubstituted alkylene, aralkylene, alkoxyalkylene or aryloxyalkylene. R.sub.2 is a substituted or unsubstituted aryl group or heterocycl |
