| Patent Number |
Title Of Patent |
Date Issued |
| 7337228 |
Information processing method and apparatus and recording medium for controlling and simplifying |
February 26, 2008 |
| An information processing method and apparatus for enabling more prompt sign-up. A network management server at step S62 received am equipment serial number from an information processing apparatus and, at step s63, references a database to retrieve a received equipment serial number. If |
| 7162240 |
Method of controlling a communication terminal having a plurality of functions, communication te |
January 9, 2007 |
| When a radio communication is made between a predetermined base station and a communication terminal, the communication terminal is allowed to make a communication if a predetermined registration processing is made. If the above registration processing is not executed, then predetermined |
| 7139572 |
Method of controlling a communication terminal having a plurality of functions, communication te |
November 21, 2006 |
| When a radio communication is made between a predetermined base station and a communication terminal, the communication terminal is allowed to make a communication if a predetermined registration processing is made. If the above registration processing is not executed, then predetermined |
| 7130631 |
Method of controlling a communication terminal having a plurality of functions, communication te |
October 31, 2006 |
| When a radio communication is made between a predetermined base station and a communication terminal, the communication terminal is allowed to make a communication if a predetermined registration processing is made. If the above registration processing is not executed, then predetermined |
| 7050573 |
Method of generating ring tones using melody and communication terminal apparatus |
May 23, 2006 |
| In a communication terminal apparatus such as a portable telephone, it is made possible to sound ring tones of good tone quality simply by using arbitrary music or the like. In a communication terminal that conducts radio communication with a predetermined station and incorporates a musi |
| 6987970 |
Method of controlling a communication terminal having a plurality of functions, communication te |
January 17, 2006 |
| When a radio communication is made between a predetermined base station and a communication terminal, the communication terminal is allowed to make a communication if a predetermined registration processing is made. If the above registration processing is not executed, then predetermined |
| 6889043 |
Method of controlling a communication terminal having a plurality of functions, communication te |
May 3, 2005 |
| A method of controlling a communication terminal and a communication terminal that communicates with a base station. The communication terminal having one or more functions different from a communication function, and the execution of the different functions being limited based on a |
| 6525336 |
Superfine electronic device and method for making same |
February 25, 2003 |
| A superfine electronic device is disclosed, which is constructed by atomic fine lines having a structure in which a plurality of atoms are arranged on one or a plurality of straight lines, in a ring shape or on curves with a size of atomic level, and which includes elements for doping el |
| 6463652 |
Apparatus and methods for manufacturing hot rolled steel sheets |
October 15, 2002 |
| A high-quality hot rolled steel sheet is manufactured with a high production efficiency and a low cost, from a long, hot slab, using a combination of continuous casting facilities and a plate reduction press machine. |
| 6028079 |
Condensed-indan derivatives and pharmaceutically acceptable salts thereof |
February 22, 2000 |
| A condensed-indan derivative represented by formula (1) and a pharmaceutically acceptable salt thereof: wherein ring A represents an optionally substituted benzene ring or naphthalene ring, or a benzene ring having a lower alkylenedioxy group, ring B represents an optionally substitu |
| 6020109 |
Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices |
February 1, 2000 |
| To prevent positional shifts of the image forming plane during the exposure process using the two-layer phase shift mask, the height position of the semiconductor wafer 14 is moved in the optical axis direction according to the mask substrate thickness of the second component mask 12b, p |
| 5932395 |
Exposure method, aligner, and method manufacturing semiconductor integrated circuit devices |
August 3, 1999 |
| To prevent positional shifts of the image forming plane during the exposure process using the two-layer phase shift mask, the height position of the semiconductor wafer 14 is moved in the optical axis direction according to the mask substrate thickness of the second component mask 12b, p |
| 5902705 |
Exposure method, aligner, and method manufacturing semiconductor integrated circuit devices |
May 11, 1999 |
| To prevent positional shifts of the image forming plane during the exposure process using the two-layer phase shift mask, the height position of the semiconductor wafer 14 is moved in the optical axis direction according to the mask substrate thickness of the second component mask 12b, p |
| 5895741 |
Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, |
April 20, 1999 |
| A photomask used for printing a mask pattern by projection optics, in which a main pattern formed of a transparent area is provided in a semitransparent area formed of a semitransparent film and a phase shifter, and the phase angles of light beams passing through respective areas are |
| 5763453 |
Condensed indan derivatives and salts thereof |
June 9, 1998 |
| A condensed indan derivative represented by the formula (1) ##STR1## wherein the ring A is an optionally substituted benzene ring or a benzene ring which has lower alkylenedioxy group(s), the ring B is an optionally substituted benzene ring or a benzene ring which has lower alkylene |
| 5757409 |
Exposure method and pattern data preparation system therefor, pattern data preparation method an |
May 26, 1998 |
| Selective pattern exposure with high reliability is made possible by a desired pattern of repeated pattern and a non-repeated pattern. Exposure technology is obtained to enable improvement of preparation efficiency of pattern data and to secure inspection of an aperture pattern. With the |
| 5733918 |
Condensed-Indan derivatives and pharmaceutically acceptable salts thereof |
March 31, 1998 |
| A condensed-indan derivative represented by formula (1) and a pharmaceutically acceptable salt thereof: ##STR1## wherein ring A represents an optionally substituted benzene ring or naphthalene ring, or a benzene ring having a lower alkylenedioxy group, ring B represents an option |
| 5710162 |
Condensed-indan derivatives and pharmaceutically acceptable salts thereof |
January 20, 1998 |
| A condensed-indan derivative represented by formula (1) and a pharmaceutically acceptable salt thereof: ##STR1## wherein ring A represents an optionally substituted naphthalene ring, ring B represents an optionally substituted benzene ring or a benzene ring having a lower alkylen |
| 5700601 |
Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, |
December 23, 1997 |
| A photomask used for printing a mask pattern by projection optics, in which a main pattern formed of a transparent area is provided in a semitransparent area formed of a semitransparent film and a phase shifter, and the phase angles of light beams passing through respective areas are |
| 5691115 |
Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices |
November 25, 1997 |
| To prevent positional shifts of the image forming plane during the exposure process using the two-layer phase shift mask, the height position of the semiconductor wafer 14 is moved in the optical axis direction according to the mask substrate thickness of the second component mask 12b, p |
| 5680330 |
Method of and apparatus for calculating diameter of bundle of electric leads |
October 21, 1997 |
| An object of this invention is to provide a method of previously calculating the thickness of each of portions of a wiring harness to be produced prior to actually producing the wiring harness. A wiring harness constructed by bundling electric wires of a plurality of types which diff |
| 5621497 |
Pattern forming method and projection exposure tool therefor |
April 15, 1997 |
| Disclosed is a pattern forming method including the steps of preparing second grating stripes disposed near a reticle having a mask pattern to be projected, modulating the mask pattern by emission of a light, and demodulating the modulated mask pattern by first grating stripes formed |
| 5557314 |
Exposure method and pattern data preparation system therefor, pattern data preparation method an |
September 17, 1996 |
| Selective pattern exposure with high reliability is made possible by a desired pattern of repeated pattern and a non-repeated pattern. Exposure technology is obtained to enable improvement of preparation efficiency of pattern data and to secure inspection of an aperture pattern. With the |
| 5512328 |
Method for forming a pattern and forming a thin film used in pattern formation |
April 30, 1996 |
| In forming a thin film pattern, first a seed material film is formed on a substrate and then exposed using electron beam lithography, for example, in the shape of the pattern. The latent image is then removed and an oriented material is deposited on one of the seed material and the s |
| 5424173 |
Electron beam lithography system and method |
June 13, 1995 |
| A system and method are provided for compensating for proximity effects between selected adjacent portions of pattern elements on an integrated circuit wafer where it is determined by simulation that undesirable resist patterns will result. The subject lithography system includes project |
| 5402410 |
High density storage of information on a substrate with multiple depth and height |
March 28, 1995 |
| A high density storage medium which stores predetermined information by matching it on one-to-one basis with multiple levels of depth or height formed in predetermined plural areas of substrate surface, a storing method, a reading method and various systems using them have been discl |
| 5334845 |
Charged beam exposure method and apparatus as well as aperture stop and production method thereo |
August 2, 1994 |
| In an electron beam exposure method for production very high-integration semiconductor devices and its related apparatus in a conventional method, the exposure is divided into fine divisions and carried out by performing a number of shots. However, by utilizing an aperture stop produced |
| 5334282 |
Electron beam lithography system and method |
August 2, 1994 |
| An electron beam lithography system and method which provide an in-plane current density distribution of an electron beam focussed onto a specimen so as to prevent a proximity effect and space charge effect. |
| 5305364 |
Projection type X-ray lithography apparatus |
April 19, 1994 |
| Reduction projection type X-ray lithography with an exposing beam wavelength of 40-150A, longer than in conventional 1:1 proximity exposure, has a high-vacuum space. This would reduce wafer replacement work efficiency and contaminate optical mirrors with substances released by a resi |
| 5283440 |
Electron beam writing system used in a cell projection method |
February 1, 1994 |
| An electron beam writing system is used in variable shaping and cell projection methods to produce LSI and reticles. In the cell projection method, the beam is deflected to define a writing position. In the time it takes to define the writing position, an operation of forming the beam is |
| 5250812 |
Electron beam lithography using an aperture having an array of repeated unit patterns |
October 5, 1993 |
| An electron beam lithography apparatus is disclosed which has an aperture plate provided with an aperture including an array of repeated unit patterns and an ordinary aperture of a rectangular shape. A region free of the influence of a proximity effect is delineated using the former |
| 5097138 |
Electron beam lithography system and method |
March 17, 1992 |
| A system and method are provided for compensating for proximity effects between selected adjacent portions of pattern elements on an integrated circuit wafer where it is determined by simulation that undesirable resist patterns will result. The subject lithography system includes project |
| 5061599 |
Radiation sensitive materials |
October 29, 1991 |
| A radiation-sensitive material comprising a polyacid composed of tungsten and niobium, titanium and/or tantalum. A uniform film can be formed by an easy spin coating method. The polyacid has a radiation sensitivity higher than that of a polyacid comprising only tungsten. |
| 4983864 |
Electronic beam drawing apparatus |
January 8, 1991 |
| An electron beam drawing apparatus having a grounded conductor for a screening operation in the neighborhood of a detection surface of a detector to detect a reflected electrons obtained by irradiating an electron onto a specimen and a secondary electron generated through the electro |
| 4798470 |
Pattern printing method and apparatus |
January 17, 1989 |
| A pattern printing method includes a step of printing a pattern on a wafer on the basis of a target mark provided on the surface of the wafer which is opposite to the surface thereof on which the pattern is to be printed. Also disclosed is a pattern printing apparatus which comprises det |
| 4740693 |
Electron beam pattern line width measurement system |
April 26, 1988 |
| Disclosed is an electron beam pattern line width measurement system wherein an electron beam is converged to a fine spot, the electron beam is scanned on a sample formed with a pattern to-be-measured, secondary electrons generated from a surface of the sample by the projection of the ele |
| 4729965 |
Method of forming extrinsic base by diffusion from polysilicon/silicide source and emitter by li |
March 8, 1988 |
| This invention relates to a method of producing a semiconductor device which is suitable for forming a bipolar transistor having less fluctuation of characteristics at a high production yield.In accordance with the present invention, a graft base (or an extrinsic base) 20 is formed by do |
| 4723903 |
Stamper for replicating high-density data recording disks |
February 9, 1988 |
| Herein disclosed are a stamper for replicating a high-density data recording disk, wherein there is formed on a substrate a multi-layered metal film, in which a plurality of metals of different kinds are laminated and which has a thickness equal to the depth of a pit, by an etching t |
| 4514556 |
4,4'-Methylene-bis-(2-ethyl-5-methyl imidazole) and methods of producing and using the same |
April 30, 1985 |
| The disclosure relates to a novel compound 4,4'-methylene-bis-(2-ethyl-5-methyl imidazole) represented by the structural formula ##STR1## A method is provided for producing the novel compound subjecting formaldehyde or a methylenizing agent to thermal reaction with 2-ethyl-4- |
| 4403151 |
Method of forming patterns |
September 6, 1983 |
| Desired portions of the positive-type photoresist film are irradiated with an electron beam, and regions including at least the regions irradiated with the electron beam are further irradiated with ultraviolet light, followed by developing.The photosensitive radicals are destroyed in the |
| 4315984 |
Method of producing a semiconductor device |
February 16, 1982 |
| That region of a resist film in which a contact is to be formed and that region thereof in which an interconnection is to be formed are respectively irradiated with an electron beam in a dose substantially equal to an optimum dose of the resist film and in a dose less than the optimu |
| 4307176 |
Method of forming a pattern |
December 22, 1981 |
| A method of forming a pattern comprising heat-treating a resist film subjected to irradiation with light and thereafter removing an unhardened area of the resist film.Since the heat treatment reduces the film thickness of the unhardened area and hardens a hardened area still more, a patt |
