| Patent Number |
Title Of Patent |
Date Issued |
| 5679983 |
Highly purified metal material and sputtering target using the same |
October 21, 1997 |
| This is a highly purified metal comprising one metal selected from the group consisted of titanium, zirconium and hafnium. The highly purified metal has an Al content of not more than 10 ppm. It also has an oxygen content of more than 250 ppm, each of Fe, Ni and Cr contents not more than |
| 5470527 |
Ti-W sputtering target and method for manufacturing same |
November 28, 1995 |
| A sputtering target that consists essentially of a continuous matrix of Ti-W phase, Ti phase having a particle diameter of 50 .mu.m or less distributed in the matrix, and a W phase having a particle diameter of 20 .mu.m or less also distributed in the matrix. Preferably the target co |
| 5466691 |
Thiophene compound |
November 14, 1995 |
| Thiophene compounds of the formula ##STR1## wherein each symbol is as defined in the specification, their pharmaceutically acceptable salts, pharmaceutical compositions containing said compound and additives for pharmaceuticals, and antipsychotics containing said compound as an a |
| 5466691 |
Thiophene compound |
November 14, 1995 |
| Thiophene compounds of the formula ##STR1## wherein each symbol is as defined in the specification, their pharmaceutically acceptable salts, pharmaceutical compositions containing said compound and additives for pharmaceuticals, and antipsychotics containing said compound as an a |
| 5458697 |
Highly purified metal material and sputtering target using the same |
October 17, 1995 |
| This is a highly purified metal comprising one metal selected from the group consisted of titanium, zirconium and hafnium. The highly purified metal has an Al content of not more than 10 ppm. It also has an oxygen content of more than 250 ppm, each of Fe, Ni and Cr contents not more than |
| 5418071 |
Sputtering target and method of manufacturing the same |
May 23, 1995 |
| In the present invention, metal silicide grains form an interlinked structure of a metal silicide phase, and Si grains which form a Si phase are discontinuously dispersed between the metal silicide phase to provide a sputtering target having a high density two-phased structure and having |
| 5196916 |
Highly purified metal material and sputtering target using the same |
March 23, 1993 |
| This is a highly purified metal comprising one metal selected from the group consisted of titanium, zirconium and hafnium. The highly purified metal has an Al content of not more than 10 ppm. It also has an oxygen content of not more than 250 ppm, each of Fe, Ni and Cr contents not more |
| 5184888 |
Illuminating portion of vanity mirror |
February 9, 1993 |
| An illuminating portion of a vanity mirror device disposed in a recessed portion in a body of the vanity mirror device and at one side of a mirror. A light conducting plate formed of a transparent material is fitted in the recessed portion and the front surface of the light conducting pl |
| 4931443 |
Piperazine compound and pharmaceutical use thereof |
June 5, 1990 |
| A piperazine compound represented by the general formula: ##STR1## (wherein each of the symbols is as defined above) or a pharmaceutically acceptable acid addition salt thereof, and pharmaceutical uses thereof as well as intermediates thereof are disclosed. The above piperazine c |
| 4918074 |
Polyazaheterocycle compounds |
April 17, 1990 |
| A polyazaheterocycle compound of the formula: ##STR1## or a pharmaceutically acceptable salt thereof, wherein each symbol is as defined in the specification.Said compounds exhibit calcium antagonistic and/or calcium agonistic activities. |
| 4849421 |
Anti-anxiety benzothiepino(5,4-c]pyridazines |
July 18, 1989 |
| A benzothiepino 5,4-c]pyridazine compound of the formula: ##STR1## wherein R.sup.1 and R.sup.2 are the same or different and each is hydrogen, halogen, trifluoromethyl, hydroxy, amino, nitro, cyano, C.sub.1-4 alkyl, C.sub.1-4 alkoxy, or C.sub.2-5 alkanoylamino, R.sup.3 is hydroge |
| 4713381 |
Oxodiazine compounds and pharmaceutical compositions thereof |
December 15, 1987 |
| An oxodiazine compound of the formula: ##STR1## or a pharamceutically acceptable acid addition salt thereof, wherein each of R.sup.1 and R.sup.2 is hydrogen, halogen, C.sub.1-4 alkyl, C.sub.1-4 alkoxy, C.sub.1-4 alkoxy-C.sub.1-4 alkoxy, phenyl-C.sub.1-4 alkyl-oxy which may be opt |
| 4678785 |
Thiadiazine compounds |
July 7, 1987 |
| A thiadiazine compound of the formula: ##STR1## a method for preparing said compound and a pharmaceutical composition containing said compound, wherein X is methylene which may be optionally substituted by an alkyl of up to 3 carbon atoms; R is hydrogen atom or methyl group; and |
