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Toshifumi Nagaiwa Patents |
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Inventor: Nagaiwa; Toshifumi
Address: Dresden, DE
No. of patents: 1
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 6723202 |
Worktable device and plasma processing apparatus for semiconductor process |
April 20, 2004 |
| A plasma etching apparatus includes a worktable disposed in a hermetic process chamber. The worktable has a main surface for placing a wafer thereon, and a sub-surface for placing a focus ring thereon. A cooling mechanism for supplying cold to the main surface and sub-surface is disp |
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