| Patent Number |
Title Of Patent |
Date Issued |
| 7433015 |
Lithographic apparatus and device manufacturing method |
October 7, 2008 |
| An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the sub |
| 7411653 |
Lithographic apparatus |
August 12, 2008 |
| Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in |
| 7388648 |
Lithographic projection apparatus |
June 17, 2008 |
| A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table. The liquid confinement structure is positioned adjacent a final surface of the projection system and |
| 7379159 |
Lithographic apparatus and device manufacturing method |
May 27, 2008 |
| A lithographic apparatus and method, in an embodiment for immersion lithography, are disclosed with a single stage in which levelling and exposure are performed simultaneously. |
| 7375796 |
Lithographic apparatus and device manufacturing method |
May 20, 2008 |
| An immersion lithography apparatus is disclosed having a liquid supply system configured to at least partially fill a space between a final element of a projection system and a substrate table, with a first liquid, and a measurement system configured to measure a location of each of |
| 7372541 |
Lithographic apparatus and device manufacturing method |
May 13, 2008 |
| In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space. |
| 7368744 |
Photon sieve for optical systems in micro-lithography |
May 6, 2008 |
| The use of photon sieves may be as a pupil defining element in an illumination system; a field of defining elements in an illumination system; a pupil lens element in a projection lens; a color correction system in the projection system; or as a transmitting diffractive element for E |
| 7352435 |
Lithographic apparatus and device manufacturing method |
April 1, 2008 |
| In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus. |
| 7352434 |
Lithographic apparatus and device manufacturing method |
April 1, 2008 |
| In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with in |
| 7324185 |
Lithographic apparatus and device manufacturing method |
January 29, 2008 |
| In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under the lens. |
| 7283208 |
Lithographic apparatus, method of manufacturing a device, and device manufactured thereby |
October 16, 2007 |
| A lithographic projection apparatus is provided with a sensor for detecting one of luminescence radiation, desorbed particles, or free charges produced by an interaction of the projection beam with a material at surface of a substrate. The luminescence radiation, desorbed particles, |
| 7248334 |
Sensor shield |
July 24, 2007 |
| The lithographic apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substr |
| 7245355 |
Lithographic apparatus, device manufacturing method |
July 17, 2007 |
| To compensate for birefringence of a mask in a lithographic projection apparatus, the birefringence of a mask is measured and stored as birefringence data in a data storage device. A birefringent compensation element is disposed in the optical path of the lithographic projection appa |
| 7245353 |
Lithographic apparatus, device manufacturing method |
July 17, 2007 |
| To compensate for birefringence of a mask in a lithographic projection apparatus, the birefringence of a mask is measured and stored as birefringence data in a data storage device. A birefringent compensation element is disposed in the optical path of the lithographic projection appa |
| 7224436 |
Lithographic apparatus and device manufacturing method |
May 29, 2007 |
| In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for |
| 7224431 |
Lithographic apparatus and device manufacturing method |
May 29, 2007 |
| In, for example, an immersion lithography apparatus, a sensor that would normally be provided on the substrate table is replaced by a retro-reflector on the substrate table and a sensor at, for example, patterning device level. This may avoid the need to make the sensor compatible wi |
| 7213963 |
Lithographic apparatus and device manufacturing method |
May 8, 2007 |
| A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid. |
| 7199858 |
Lithographic apparatus and device manufacturing method |
April 3, 2007 |
| A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the |
| 7196770 |
Prewetting of substrate before immersion exposure |
March 27, 2007 |
| A lithographic projection apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold |
| 7193681 |
Lithographic apparatus and device manufacturing method |
March 20, 2007 |
| A lithographic projection apparatus is disclosed in which a liquid confinement system, which at least partly confines liquid to a space between the projection system and the substrate, is restricted in its movement in the direction of the optical axis of the apparatus by a stopper. |
| 7193232 |
Lithographic apparatus and device manufacturing method with substrate measurement not through li |
March 20, 2007 |
| A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previo |
| 7175968 |
Lithographic apparatus, device manufacturing method and a substrate |
February 13, 2007 |
| A substrate is provided with a coating of material which is substantially transparent to the wavelength of the projection beam. The coating may be thicker than the wavelength of the projection beam and have a refractive index of the coating such that the wavelength of the projection beam |
| 7161654 |
Lithographic apparatus and device manufacturing method |
January 9, 2007 |
| An immersion lithographic apparatus is disclosed which includes a liquid supply system having an inlet configured to supply a liquid to a space between a projection system of the lithographic apparatus and a substrate and an outlet configured to remove at least part of the liquid, the |
| 7110087 |
Lithographic apparatus and device manufacturing method |
September 19, 2006 |
| To improve the resolution of lithographic apparatus, a flexible member is provided between the projection system and the substrate. The flexible member may be filled with a fluid of a known refractive index. The flexible member may be in contact with both the projection system and the |
| 7110081 |
Lithographic apparatus and device manufacturing method |
September 19, 2006 |
| In a lithographic projection apparatus, there is provided a liquid supply system comprising a container at least partly defining a space between the projection system and the substrate, the container having a selectively openable and closeable aperture therein, and a closure configur |
| 7075616 |
Lithographic apparatus and device manufacturing method |
July 11, 2006 |
| In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for |
| 7057702 |
Lithographic apparatus and device manufacturing method |
June 6, 2006 |
| A lithographic projection apparatus is disclosed. The apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device serves to impart the beam of radiation with a pattern |
| 7038760 |
Lithographic apparatus and device manufacturing method |
May 2, 2006 |
| The pressure and/or height of liquid in a liquid reservoir of an immersion lithography apparatus is obtained by a measurement device. The pressure and/or height can be used to determine the height and/or tilt of the substrate. |
| 7034917 |
Lithographic apparatus, device manufacturing method and device manufactured thereby |
April 25, 2006 |
| A substrate is exposed through immersion liquid supplied by a liquid supply system. Prior to being exposed, a map of the surface of the substrate is generated at a measurement station. A liquid supply system fills the space between a measurement system and the substrate so the measur |
| 6952253 |
Lithographic apparatus and device manufacturing method |
October 4, 2005 |
| In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space. |
| 6819405 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby |
November 16, 2004 |
| A lithographic projection apparatus including a first radiation system for providing a first projection beam of radiation; a second radiation system for providing a second projection beam of radiation; a support structure for supporting a first patterning structure and a second patternin |
| 6753946 |
Lithographic apparatus and device manufacturing method |
June 22, 2004 |
| A lithographic apparatus includes a spatial light modulator and a the projection system having a beam splitter constructed and arranged to split the patterned beam into patterned beam fractions and project them onto separate target portions on the substrate. |
| 6741331 |
Lithographic apparatus with improved exposure area focus, device manufacturing method, and devic |
May 25, 2004 |
| In a lithographic apparatus the shape of the focal plane is adjusted using available manipulators in the projection lens system so that it is in closer conformity to the shape of the wafer surface in the exposure area. The control of the focal plane shape can be integrated with the level |
| 6700646 |
Lithographic apparatus, method of manufacturing a device, and device manufactured thereby |
March 2, 2004 |
| A lithographic projection apparatus is provided with a sensor for detecting luminescence radiation produced in the projection lens system by the passage of the projection beam. The luminescence radiation is indicative of the dose delivered to the substrate, and can be detected close to t |
| 6538716 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby |
March 25, 2003 |
| In a lithographic projection system using exposure radiation of 157 nm, compositions of gas, e.g. levels of oxygen and water vapor, are measured in regions traversed by the projection beam. The attenuation caused by said gases is predicted and the dose of radiation accumulated during an |
