| Patent Number |
Title Of Patent |
Date Issued |
| 7368173 |
Siloxane resin-based anti-reflective coating composition having high wet etch rate |
May 6, 2008 |
| Herein we disclose a composition, comprising a siloxane resin having the formula (HSiO.sub.3/2).sub.a. (SiO.sub.4/2).sub.b(HSiX.sub.3/2).sub.c(SiX.sub.4/2).sub.d, wherein each X is independently --O--, --OH, or --O--(CH.sub.2).sub.m--Z.sub.n, wherein each m is independently an intege |
| 6727038 |
Photodefineable compositions |
April 27, 2004 |
| A photodefineable mixture comprising oligomeric divinyltetramethyldisiloxane bisbenzocyclobutene as its major resin component dissolved in mesitylene and at least 2,6-bis(4-azidobenzylidene)-4-ethylcyclohexanone as a photosensitive agent in an amount sufficient to convert the mixture |
| 6558755 |
Plasma curing process for porous silica thin film |
May 6, 2003 |
| Low dielectric constant films with improved elastic modulus. The method of making such coatings involves providing a porous network coating produced from a resin containing at least 2 Si--H groups and plasma curing the coating to convert the coating into porous silica. Plasma curing of t |
| 6083661 |
Photodefineable cyclobutarene compositions |
July 4, 2000 |
| Photodefineable cyclobutarene compositions are disclosed. These polymer compositions are useful in composites, laminates, membranes, films, adhesives, coatings, and electronic applications such as multichip modules and printed circuit boards. An example of such photodefineable cyclobutar |
| 5882836 |
Photocurable formulation containing a partially polymerized divinylsiloxane linked bisbenzocyclo |
March 16, 1999 |
| A photocurable formulation containing a partially polymerized DVS resin formed by heating DVS monomer (1,3-bis(2-bicyclo[4.2.0]octa-1,3,5-trien-3-ylethenyl)-1,1,3,3-tetramethyl disiloxane) in a solvent at an initial concentration of DVS monomer in the solvent of from about 12 to about |
| 5854302 |
Partially polymerized divinylsiloxane linked bisbenzocyclobutene resins and methods for making s |
December 29, 1998 |
| A process for forming a partially polymerized DVS resin comprising heating DVS monomer (1,3-bis(2-bicyclo[4.2.0]octa-1,3,5-trien-3-ylethenyl)-1,1,3,3-tetramethyl disiloxane) in a solvent at a concentration of DVS monomer in the solvent such that:(a) the DVS resin, when applied and pol |
| 5585450 |
Oligomerized cyclobutarene resins |
December 17, 1996 |
| An oligomerized cyclobutarene containing 80 weight percent or more of oligomers of a degree of polymerization of three or more. |
| 5489623 |
Photodefinable polymers containing perfluorocyclobutane groups |
February 6, 1996 |
| A polymer has at least one photoactive site and more than one perfluorocyclobutane group. New monomers containing photoactive sites or photoactive precursors and at least one perfluorovinyl group are useful for making such polymers. Processes of making such polymers and the monomers |
| 5464925 |
Benzocyclobutene-terminated polymides |
November 7, 1995 |
| The present invention is an oligomer represented by the formula: ##STR1## wherein X is a moiety selected from the group consisting of: ##STR2## where each Y is independently S, O, CH.sub.2, C.dbd.O, CH.sub.3 --C--CH.sub.3, O.dbd.S.dbd.O, or CF.sub.3 --C--CF.sub.3.In another aspec |
| 5426164 |
Photodefinable polymers containing perfluorocyclobutane groups |
June 20, 1995 |
| A polymer has at least one photoactive site and more than one perfluorocyclobutane group. New monomers containing photoactive sites or photoactive precursors and at least one perfluorovinyl group are useful for making such polymers. Processes of making such polymers and the monomers |
