| Patent Number |
Title Of Patent |
Date Issued |
| 7414700 |
Method for the removal of deposition on an optical element, method for the protection of an opti |
August 19, 2008 |
| A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H.sub.2 containing gas in at least part of the apparatus includes producing hydrogen radicals from H.sub.2 from the H.sub.2 containing gas; and bringing |
| 7405417 |
Lithographic apparatus having a monitoring device for detecting contamination |
July 29, 2008 |
| A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a first radiation beam onto a target portion of a substrate, and at least one monitoring device for detecting contamination in a interior space. The monitoring device includes at l |
| 7372623 |
Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filt |
May 13, 2008 |
| A multi-layered spectral purity filter improves the spectral purity of extreme ultra-violet (EUV) radiation and also collects debris emitted from a radiation source. |
| 7369216 |
Lithographic system, method for adapting transmission characteristics of an optical pathway with |
May 6, 2008 |
| A lithographic system includes a radiation system configured to provide a beam of radiation; an illumination system configured to condition the beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the projection beam with a |
| 7361911 |
Lithographic apparatus and device manufacturing method |
April 22, 2008 |
| A device manufacturing method includes projecting a patterned beam of radiation through an optics compartment and a channel that provides an open connection between the optics compartment and a substrate compartment onto a substrate, maintaining an ionized flush gas at a higher press |
| 7355672 |
Method for the removal of deposition on an optical element, method for the protection of an opti |
April 8, 2008 |
| A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H.sub.2 containing gas in at least part of the apparatus includes producing hydrogen radicals from H.sub.2 from the H.sub.2 containing gas; and bringing |
| 7279690 |
Lithographic apparatus and device manufacturing method |
October 9, 2007 |
| A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric |
| 7262423 |
Radiation system and lithographic apparatus |
August 28, 2007 |
| A radiation system for generating a beam of radiation is disclosed. The radiation system includes a pulsed EUV source for generating EUV radiation, and a spectral filter mounted in front of the EUV source for selectively passing a spectral range of a beam of EUV radiation from the EU |
| 7251012 |
Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation h |
July 31, 2007 |
| A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-sec |
| 7248340 |
Lithographic apparatus and patterning device transport |
July 24, 2007 |
| A transport box for transporting a lithographic patterning device and a lithographic apparatus adapted to cooperate with the transport box are presented. The transport box is provided with a container part having an inner space with a storing position for storing the patterning device an |
| 7245357 |
Lithographic apparatus and device manufacturing method |
July 17, 2007 |
| A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system for providing a beam of radiation on a flat article to be placed in a beam path of the beam of radiation, and an article handler for handling the article during placement or removal of t |
| 7202934 |
Lithographic apparatus and device manufacturing method |
April 10, 2007 |
| A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed. The apparatus includes an optics compartment that contains a patterned surface of the patterning device and an optical element, and a substrate compartment connected to the |
| 7193229 |
Lithographic apparatus, illumination system and method for mitigating debris particles |
March 20, 2007 |
| A lithographic apparatus includes a source for generating radiation, an illumination system for conditioning the radiation, a patterning device for patterning the conditioned radiation, and a projection system for projecting the patterned radiation onto a target portion of a substrate. |
| 7167232 |
Lithographic apparatus and radiation source comprising a debris-mitigation system and method for |
January 23, 2007 |
| A lithographic apparatus is disclosed. The lithographic apparatus includes a radiation source that produces EUV radiation, an illumination system that provides a beam of the EUV radiation produced by the radiation source, and a support structure that supports a patterning structure. The |
| 7151589 |
Lithographic apparatus and patterning device transport |
December 19, 2006 |
| According to an embodiment, a box for transporting a lithographic patterning device is arranged to cooperate with a lithographic apparatus. The transport box may be provided with a container part having an inner space with a storing position for storing the patterning device and an o |
| 7098994 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby |
August 29, 2006 |
| A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the beam with a pattern in its cross-section. The apparatus further includes a substrate table f |
| 7095479 |
Lithographic apparatus, device manufacturing method and device manufactured thereby |
August 22, 2006 |
| A lithographic projection apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired |
| 7092072 |
Calibration apparatus and method of calibrating a radiation sensor in a lithographic apparatus |
August 15, 2006 |
| A calibration apparatus is provided for calibrating a radiation sensor in a lithographic apparatus. The calibration apparatus includes a window formed of substantially radiation-transparent material for allowing radiation to pass therethrough to reach the radiation sensor. A first re |
| 7088431 |
Lithographic apparatus and device manufacturing method |
August 8, 2006 |
| A lithographic apparatus includes an illumination system for providing a beam of radiation, an article support for supporting a flat article to be placed in a beam path of the beam of radiation on the article support, an electrostatic clamp for clamping the article against the article su |
| 7075620 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby |
July 11, 2006 |
| A lithographic projection apparatus includes a radiation system for providing a projection beam of radiation having a wavelength .lamda..sub.1 smaller than 50 nm; a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam |
| 7041989 |
Lithographic apparatus and device manufacturing method |
May 9, 2006 |
| A lithographic apparatus is disclosed. The apparatus includes an illumination system arranged to provide a radiation beam, an article support configured to support an article to be placed in a beam path of the radiation beam, a multipolar clamp configured to provide a clamping pressu |
| 6980281 |
Lithographic apparatus and device manufacturing method |
December 27, 2005 |
| In a lithographic apparatus, a beam of radiation passes along a beam path to a substrate, for applying patterned illumination to the substrate. An exchangeable aperture screen is inserted in the beam path to partially block out the beam from a remainder of the path onto the substrate. A |
| 6940587 |
Lithographic apparatus and a measurement system |
September 6, 2005 |
| A measurement system configured to measure wave front aberrations of a projection system, as well as a lithographic apparatus including such a measurement system, is provided wherein the measurement system includes a diffractive element and structure configured to increase the pupil fill |
| 6879374 |
Device manufacturing method, device manufactured thereby and a mask for use in the method |
April 12, 2005 |
| A device manufacturing method according to one embodiment of the invention includes positioning a reflective patterning structure to reflect at least a portion of a beam of radiation as a patterned beam of radiation having a pattern in its cross-section. The method also includes using a |
| 6781673 |
Mask handling apparatus, lithographic projection apparatus, device manufacturing method and devi |
August 24, 2004 |
| In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask |
| 6750949 |
Lithographic apparatus and device manufacturing method |
June 15, 2004 |
| A lithographic projection apparatus according to one embodiment of the invention includes a projection system having a plurality of optical elements or sensors mounted on a frame. The frame includes support portions made of a material (e.g. a glass ceramic) having a coefficient of th |
| 6741329 |
Lithographic apparatus and device manufacturing method |
May 25, 2004 |
| An illumination intensity adjustment device includes a plurality of blades disposed in the projection beam so as to cast half-shadows extending across the illumination field. The blades can be selectively rotated to increase their width perpendicular to the projection beam to control |
| 6597431 |
Lithographic projection apparatus and device manufacturing method |
July 22, 2003 |
| A lithographic projection apparatus includes a radiation system for supplying a projection beam of radiation having a propagation direction, a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired |
