| Patent Number |
Title Of Patent |
Date Issued |
| 7403266 |
Maskless lithography systems and methods utilizing spatial light modulator arrays |
July 22, 2008 |
| A maskless lithography system that writes patterns on an object. The system can include an illumination system, the object, spatial light modulators (SLMs), and a controller. The SLMs can pattern light from the illumination system before the object receives the light. The SLMs can in |
| 7105836 |
Method and apparatus for cooling a reticle during lithographic exposure |
September 12, 2006 |
| Systems and methods eliminate vibrations produced by coolant fluid flowing through a short stroke stage and prevent change in thermally-induced distortion of the short stroke stage by maintaining the temperature and temperature distribution within the short stroke stage constant rega |
| 7092070 |
Illumination system with spatially controllable partial coherence compensating for line width va |
August 15, 2006 |
| An illumination system having an array optical element with different illumination regions corresponding or matched to different line width variations printed on a photosensitive material. The array optical element may be a filter, diffractive optical element, or micro lens array hav |
| 7029804 |
Non absorbing reticle and method of making same |
April 18, 2006 |
| A reticle or mask for use in projecting a circuit pattern, having a transparent substrate with a reflective or dielectric layer thereon. An opaque or blocking layer is placed over the reflective layer. The opaque layer then has a predetermined circuit pattern etched therein. In one e |
| 7014963 |
Non absorbing reticle and method of making same |
March 21, 2006 |
| A reticle or mask for use in projecting a circuit pattern, having a transparent substrate with a reflective or dielectric layer thereon. An opaque or blocking layer is placed over the reflective layer. The opaque layer then has a predetermined circuit pattern etched therein. In one e |
| 6967713 |
Use of multiple reticles in lithographic printing tools |
November 22, 2005 |
| A reticle stage having a range of motion sufficient to scan at least two distinct reticles. In a photolithographic process, a reticle stage having an extended range of motion and containing at least two reticles, preferably a phase shift reticle and a trim reticle, is used. The reticle |
| 6822728 |
Illumination system with spatially controllable partial coherence compensation for line width va |
November 23, 2004 |
| An illumination system used in photolithography for the manufacture of semiconductors having an array optical element with different illumination regions corresponding or matched to different line width variations printed on a photosensitive substrate. The array optical element may be a |
| 6800408 |
Use of multiple reticles in lithographic printing tools |
October 5, 2004 |
| A reticle stage having a range of motion sufficient to scan at least two distinct reticles. In a photolithographic process, a reticle stage having an extended range of motion and containing at least two reticles, preferably a phase shift reticle and a trim reticle, is used. The reticle |
| 6686101 |
Non absorbing reticle and method of making same |
February 3, 2004 |
| A reticle or mask for use in projecting a circuit pattern on a photosensitive resist covered wafer having a transparent substrate with a reflective or dielectric layer thereon. An opaque or blocking layer, for example chrome or chromium, is placed over the reflective layer. The opaqu |
| 6628372 |
Use of multiple reticles in lithographic printing tools |
September 30, 2003 |
| A reticle stage having a range of motion sufficient to scan at least two distinct reticles. In a photolithographic process, a reticle stage having an extended range of motion and containing at least two reticles, preferably a phase shift reticle and a trim reticle, is used. The reticle |
| 6628370 |
Illumination system with spatially controllable partial coherence compensating for line width va |
September 30, 2003 |
| An illumination system used in photolithography for the manufacture of semiconductors having an array optical element with different illumination regions corresponding or matched to different line width variations printed on a photosensitive substrate. The array optical element may be a |
| 6445439 |
EUV reticle thermal management |
September 3, 2002 |
| A thermal management device for use with a photolithographic apparatus or tool substantially reducing thermal distortion in a reticle. Planar cooling elements are placed adjacent a reticle being illuminated with extreme ultraviolet, EUV, electromagnetic radiation. A heating element p |
| 6444372 |
Non absorbing reticle and method of making same |
September 3, 2002 |
| A reticle or mask for use in projecting a circuit pattern on a photosensitive resist covered wafer having a transparent substrate with a reflective or dielectric layer thereon. An opaque or blocking layer, for example chrome or chromium, is placed over the reflective layer. The opaqu |
| 6292255 |
Dose correction for along scan linewidth variation |
September 18, 2001 |
| In a scanning photolithographic device used in the manufacture of semiconductors, a method and apparatus for varying the exposure dose as a function of distance in the scan direction compensating for the signature of the photolithographic device for reducing linewidth variation in the |
| 6259513 |
Illumination system with spatially controllable partial coherence |
July 10, 2001 |
| An illumination system used in photolithography for the manufacture of semiconductors having an array optical element with different illumination regions matched to different geometric pattern regions on a reticle. The array optical element may be a filter, diffractive optical element, o |
| 6097474 |
Dynamically adjustable high resolution adjustable slit |
August 1, 2000 |
| Blades pivotally attached together linked to push rods and inserted into an illumination field, energy or flux. The blades extend longitudinally along the length of a rectangular illumination field or slit used to image a reticle onto a photosensitive substrate. The blades controllably a |
| 6013401 |
Method of controlling illumination field to reduce line width variation |
January 11, 2000 |
| Blades pivotally attached together linked to push rods and inserted into an illumination field, energy or flux. The blades extend longitudinally along the length of a rectangular illumination field or slit used to image a reticle onto a photosensitive substrate. The blades controllably a |
| 5973764 |
Vacuum assisted debris removal system |
October 26, 1999 |
| A vacuum manifold having a rectangular opening with vacuum access bores connected into the rectangular opening for an illumination field to be projected there through. A vacuum manifold is placed between a photosensitive resist covered wafer and a lens element in a photolithographic |
| 5966202 |
Adjustable slit |
October 12, 1999 |
| Blades pivotally attached together linked to push rods and inserted into an illumination energy or flux. The blades extend longitudinally along the length of a rectangular illumination field or slit used to image a reticle onto a photosensitive substrate. The push rods are coupled to a f |
| 5896188 |
Reduction of pattern noise in scanning lithographic system illuminators |
April 20, 1999 |
| An illumination system for a scanning lithography system used in the manufacture of semiconductor devices having a multiplex array or multi-image array resulting in pattern noise that is reduced by a spatially frequency modulated multiplex array or frequency modulating the pulse rate |
| 5895737 |
Method for adjusting an illumination field based on selected reticle feature |
April 20, 1999 |
| Blades pivotally attached together linked to push rods and inserted into an illumination energy or flux. The blades extend longitudinally along the length of a rectangular illumination field or slit used to image a reticle onto a photosensitive substrate. The push rods are coupled to a f |
| 5767523 |
Multiple detector alignment system for photolithography |
June 16, 1998 |
| A positioning, alignment, and image quality system comprising a detector having a photosensitive surface covered with an opaque layer having predetermined openings therein, a matched reticle having predetermined apertures therein is used to project the image of the apertures onto the |
| 5079131 |
Method of forming positive images through organometallic treatment of negative acid hardening cr |
January 7, 1992 |
| The present invention is directed to negative cross-linking photoresist formulations containing nonphotoactive cross-linking agents, such as, but not limited to, the CYMEL 300 series, and to the use of these formulations specifically for the dry development of the so-treated resists as p |
