| Patent Number |
Title Of Patent |
Date Issued |
| H2114 |
Inspection tool for testing and adjusting a projection unit of a lithography system |
February 1, 2005 |
| An inspection system and method are disclosed. The inspection system is configured to inspect a projection unit having multiple optical subsystems. The optical subsystems are configured to project an image during a lithography step. The inspection system provides self calibration by |
| 7365513 |
Positioning device having dynamically isolated frame, and lithographic device provided with such |
April 29, 2008 |
| A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means |
| 7333179 |
Moving mechanism with high bandwidth response and low force transmissibility |
February 19, 2008 |
| Methods and apparatus for providing a stage with a relatively high positioning bandwidth and low transmissibility are disclosed. According to one aspect of the present invention, a method for positioning a stage including providing a first force of a first magnitude to the stage using |
| 6989647 |
Positioning device having dynamically isolated frame, and lithographic device provided with such |
January 24, 2006 |
| A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means |
| 6927840 |
Positioning device having dynamically isolated frame, and lithographic device provided with such |
August 9, 2005 |
| A mask having a mask pattern is provided on a mask table. A substrate is provided on a substrate table. The mask is irradiated to project an image of at least a portion of the mask pattern onto a radiation-sensitive layer of the substrate using a projection system. At least one of the ma |
| 6888620 |
System and method for holding a device with minimal deformation |
May 3, 2005 |
| A stage assembly (10) for moving and positioning a device (26) includes a device table (20), a device holder (24) that retains the device (26), and a stage mover assembly (14). The stage assembly (10) includes one or more features that can isolate the device holder 24 and the device (26) |
| 6882126 |
Holder mover for a stage assembly |
April 19, 2005 |
| A stage assembly (10) for moving and positioning a device (26) includes a device table (20), a device holder (24) that retains the device (26), and a stage mover assembly (14). The stage assembly (10) includes one or more features that can isolate the device holder 24 and the device (26) |
| 6872958 |
Platform positioning system |
March 29, 2005 |
| A system for precisely positioning and moving a platform relative to a support structure is disclosed herein. The platform is particularly suitable for carrying wafers. Charged particle optics can be attached to the support structure. The platform positioning system comprises a stage, |
| 6841965 |
Guideless stage with isolated reaction stage |
January 11, 2005 |
| A guideless stage for aligning a wafer in a microlithography system is disclosed, and a reaction frame is disclosed which isolates both external vibrations as well as vibrations caused by reaction forces from an object stage. In the guideless stage an object stage is disclosed for moveme |
| 6747732 |
Method of making exposure apparatus with dynamically isolated reaction frame |
June 8, 2004 |
| A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means |
| 6683433 |
Exposure apparatus and method utilizing isolated reaction frame |
January 27, 2004 |
| A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means |
| 6646719 |
Support assembly for an exposure apparatus |
November 11, 2003 |
| A support assembly (12) for an exposure apparatus (10) is provided herein. The support assembly (12) supports the components of the exposure apparatus (10) above a mounting base (32). The exposure apparatus (10) includes noisy components (42) and quiet components (44). The support as |
| 6471435 |
Flexural joint |
October 29, 2002 |
| A flexural joint, in particular a flexural thrust joint suitable for precision stages and application requiring vacuum is disclosed herein. A two degree of freedom joint comprises: two joint elements, each with a load bearing surface; two flexures attached between the elements, such |
| 6355994 |
Precision stage |
March 12, 2002 |
| An ultra-high precision stage incorporating a novel, legged design suitable for applications requiring high voltage and vacuum is disclosed herein. The stage comprises: a base; a frame attached to the base; a platform with a bottom platform surface; at least three adjustable limbs couple |
| 6323494 |
Vertical direction force transducer |
November 27, 2001 |
| A transducer includes a pneumatic actuator in combination with a stepper motor lifter mechanism to which is opposed an attractive E-I core actuator for precise vertical positioning of a load with minimal transmission of vibration. A typical application is for vertical positioning of a st |
| 6316901 |
Exposure apparatus and method utilizing isolated reaction frame |
November 13, 2001 |
| A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means |
| 6302585 |
Two Axis stage with arcuate surface bearings |
October 16, 2001 |
| A two-axis stage assembly includes a generally planar horizontally mounted base plate; a stage plate generally parallel to the base plate, the stage plate having a first axis and second orthogonal axis; a set of spaced bearings depending from a bottom surface of said stage plate, the bea |
| 6281654 |
Method for making apparatus with dynamic support structure isolation and exposure method |
August 28, 2001 |
| A guideless stage for aligning a wafer in a microlithography system is disclosed, and a reaction frame is disclosed which isolates both external vibrations as well as vibrations caused by reaction forces from an object stage. In the guideless stage an object stage is disclosed for moveme |
| 6271640 |
Exposure apparatus having reaction frame |
August 7, 2001 |
| A guideless stage for aligning a wafer in a microlithography system is disclosed, and a reaction frame is disclosed which isolates both external vibrations as well as vibrations caused by reaction forces from an object stage. In the guideless stage an object stage is disclosed for moveme |
| 6246202 |
Method of making exposure apparatus with dynamically isolated reaction frame |
June 12, 2001 |
| A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means |
| 6188195 |
Exposure method, and method of making exposure apparatus having dynamically isolated support str |
February 13, 2001 |
| A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means |
| 6175404 |
Exposure apparatus having dynamically isolated reaction frame |
January 16, 2001 |
| An exposure apparatus includes an exposure device disposed between a mask and an object. The exposure device exposes a pattern of the mask onto the object. The apparatus also includes a movable mask stage to hold the mask and a movable object stage to hold the object. The apparatus also |
| 6151105 |
Exposure apparatus having dynamically isolated support structure |
November 21, 2000 |
| An exposure apparatus includes an exposure device disposed between a mask and an object. The exposure device exposes a pattern of the mask onto the object. The apparatus also includes a mask stage associated with the exposure device to hold the mask, and a drive to move the mask stage. A |
| 6150787 |
Exposure apparatus having dynamically isolated reaction frame |
November 21, 2000 |
| A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means |
| 6132091 |
X-Y stage with arcuate surface bearings |
October 17, 2000 |
| A two-axis stage assembly includes a generally planar horizontally mounted base plate; a stage plate generally parallel to the base plate, the stage plate having a first axis and second orthogonal axis; a set of spaced bearings depending from a bottom surface of said stage plate, the bea |
| 6130490 |
X-Y stage with movable magnet plate |
October 10, 2000 |
| A stage assembly for precision movement in the x and y-directions, especially adapted for use in electron beam lithography for holding a reticle. The stage assembly includes a vacuum enclosure in which a magnet plate structure moves in the y-direction under the influence of a linear |
| 6087797 |
Exposure method, and method of making exposure apparatus having dynamically isolated reaction fr |
July 11, 2000 |
| A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means |
| 6049186 |
Method for making and operating an exposure apparatus having a reaction frame |
April 11, 2000 |
| A guideless stage for aligning a wafer in a microlithography system is disclosed, and a reaction frame is disclosed which isolates both external vibrations as well as vibrations caused by reaction forces from an object stage. In the guideless stage an object stage is disclosed for moveme |
| 6020710 |
Exposure method, and method of making exposure apparatus having dynamically isolated reaction fr |
February 1, 2000 |
| A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means |
| 6008500 |
Exposure apparatus having dynamically isolated reaction frame |
December 28, 1999 |
| A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means |
| 5982128 |
Lithography apparatus with movable stage and mechanical isolation of stage drive |
November 9, 1999 |
| A guideless stage for aligning a wafer in a microlithography system is disclosed, and a reaction frame is disclosed which isolates both external vibrations as well as vibrations caused by reaction forces from an object stage. In the guideless stage an object stage is disclosed for moveme |
| 5942871 |
Double flexure support for stage drive coil |
August 24, 1999 |
| In a stage for supporting an article, e.g. for a microlithographic system, the stage rides on a base and is driven in two orthogonal directions on the base along magnetic drive tracks by several drive coils riding in the drive tracks. Each drive coil, rather than being rigidly mounted to |
| 5874820 |
Window frame-guided stage mechanism |
February 23, 1999 |
| A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means |
| 5838450 |
Direct reticle to wafer alignment using fluorescence for integrated circuit lithography |
November 17, 1998 |
| A mask alignment system for integrated circuit lithography achieves reticle to wafer referencing. A detection system located below the main projection lens detects the image of reticle alignment marks while also detecting wafer alignment marks. The reticle marks are imaged in light at th |
| 5744924 |
Guideless stage with isolated reaction frame |
April 28, 1998 |
| A guideless stage for aligning a wafer in a microlithography system is disclosed, and a reaction frame is disclosed which isolates both external vibrations as well as vibrations caused by reaction forces from an object stage. In the guideless stage an object stage is disclosed for moveme |
| 5552888 |
Apparatus for measuring position of an X-Y stage |
September 3, 1996 |
| An interferometer used to measure distance to an object is provided with a laser sheath. The sheath encloses a substantial part of the measurement beam's path to provide a controlled environment which reduces environmental influences on the measured distance. The sheath is of variabl |
| 5528118 |
Guideless stage with isolated reaction stage |
June 18, 1996 |
| A guideless stage for aligning a wafer in a microlithography system is disclosed, and a reaction frame is disclosed which isolates both external vibrations as well as vibrations caused by reaction forces from an object stage. In the guideless stage an object stage is disclosed for moveme |
| 4444492 |
Apparatus for projecting a series of images onto dies of a semiconductor wafer |
April 24, 1984 |
| The apparatus forms one-to-one reticle images on a wafer. The apparatus includes means for holding a reticle containing an image pattern corresponding to the size of the desired wafer pattern. An illumination system substantially uniformly illuminates the reticle pattern. A one-to-on |
| 4425037 |
Apparatus for projecting a series of images onto dies of a semiconductor wafer |
January 10, 1984 |
| The apparatus forms one-to-one reticle images on a wafer. The apparatus includes means for holding a reticle containing an image pattern corresponding to the size of the desired wafer pattern. An illumination system substantially uniformly illuminates the reticle pattern. A one-to-on |
