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Harry R. Kirk Patents |
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Inventor: Kirk; Harry R.
Address: Campbell, CA
No. of patents: 2
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 7391047 |
System for forming a strained layer of semiconductor material |
June 24, 2008 |
| A method for forming a strained layer of semiconductor material, e.g., silicon, germanium, Group III/V, silicon germanium alloy. The method includes providing a non-deformable surface region having a first predetermined radius of curvature, which is defined by R(1) and is defined nor |
| 7094666 |
Method and system for fabricating strained layers for the manufacture of integrated circuits |
August 22, 2006 |
| A method for forming a strained layer of semiconductor material, e.g., silicon, germanium, Group III/V, silicon germanium alloy. The method includes providing a non-deformable surface region having a first predetermined radius of curvature, which is defined by R(1) and is defined nor |
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