| Patent Number |
Title Of Patent |
Date Issued |
| 7378230 |
Photoresist composition for multi-micro nozzle head coater |
May 27, 2008 |
| The present invention relates to a photoresist composition for an MMN (multi-micro nozzle) head coater, more particularly to a photoresist composition comprising a novolak resin with a molecular weight ranging from 2000 to 12,000, a diazide photoactive compound, an organic solvent, a |
| 7371622 |
Etchant for signal wire and method of manufacturing thin film transistor array panel using etcha |
May 13, 2008 |
| Gate lines including a lower Al--Nd layer and an upper MoW layer, data lines including a MoW layer, and pixel electrodes including an IZO layer are patterned using a single etchant. The etchant contains a phosphoric acid of about 50-60%, a nitric acid of about 6-10%, an acetic acid of |
| 7236850 |
Working robot, actuator and control method thereof |
June 26, 2007 |
| A working robot, which is able to perform a required operation by locating a tool on a working position of a moving object, comprises a robot body moving with the object according to the movement of the object with more than one degree of freedom; an actuator mounted on a free end of the |
| 7224424 |
Drive IC and display device having the same |
May 29, 2007 |
| In a drive IC and a display device having the same, the drive IC includes a plurality of bumps disposed on a lower surface of the drive IC and aligned in a plurality of rows along an edge of the drive IC. The bumps aligned in different rows from each other are juxtaposed in a direction |
| 7216502 |
Refrigerator |
May 15, 2007 |
| A refrigerator includes a main body having at least one refrigerating compartment; a door to open and close an opening of the refrigerating compartment; a water dispenser provided on the door to supply drinking water; a drawer provided inside the refrigerating compartment; and a filt |
| 7179398 |
Etchant for wires, a method for manufacturing the wires using the etchant, a thin film transisto |
February 20, 2007 |
| First, a lower film of AlNd Alloy and an upper film of MoW alloy are deposited in succession, and then patterned by an etchant including HNO.sub.3 of 0.1 10%, H.sub.3PO.sub.4 of 65 55%, CH.sub.3COOH of 5 20%, a stabilizer of 0.1 5% and the other ultra pure eater, to form a gate wire |
| 7144662 |
Photoresist composition having a high heat resistance |
December 5, 2006 |
| The present invention relates to a photoresist composition having high heat resistance used in the production process of an LCD, and more particularly, to a photoresist composition having high heat resistance, capable of decreasing process tact (a way), of process simplification, and |
| 7141180 |
Etchant for wire, method of manufacturing wire using etchant, thin film transistor array panel i |
November 28, 2006 |
| A method of manufacturing a TFT array panel according to the present invention forms a gate wire on an insulating substrate. The gate wire includes a plurality of gate lines and a plurality of gate electrodes connected to the gate lines. A semiconductor layer and a gate insulating la |
| 6922016 |
Lamp assembly for liquid crystal display device |
July 26, 2005 |
| A lamp assembly for a liquid crystal display device includes a lamp tube for generating light, and electrodes each having a suitable shape for receiving end portions of the lamp tube. The lamp tube and the electrodes are combined to generate the light by applying electric power to the |
| 6893791 |
Photoresist composition and method of forming pattern using the same |
May 17, 2005 |
| Disclosed is a photoresist composition having a good sensitivity and residual layer characteristic and a method of forming a pattern using the same. The photoresist composition includes 5-30% by weight of a polymer resin, 2-10% by weight of a photosensitive compound, 0.1-10% by weight of |
| 6800564 |
Etching solution for signal wire and method of fabricating thin film transistor array panel with |
October 5, 2004 |
| In a method of fabricating a TFT array substrate, a gate wire is formed on an insulating substrate. The gate wire has gate lines, gate electrodes, and gate pads connected to the gate lines. A gate insulating layer and a semiconductor layer are formed in sequence. A data wire is formed, w |
| 6787981 |
Flat type lamp and liquid crystal display apparatus having the same |
September 7, 2004 |
| Disclosed is a flat type fluorescent lamp having a discharge space divided into a plurality of discharge areas. The flat type fluorescent lamp includes a first substrate, a second substrate separated from the first substrate in a predetermined distance to provide a discharge space co |
| 6783919 |
Stripper composition for photoresist |
August 31, 2004 |
| The invention relates to a TFT-LCD high-performance stripper composition for a photoresist, and more particularly to a stripper composition for a photoresist comprising: 20-60 wt % of monoethanolamine, 15-50 wt % of N,N-dimethylacetamide, 15-50 wt % of carbitol, and 0.1-10 wt % of gallic |
| 6782252 |
Apparatus and method for transmitting call holding message in mobile communication terminal |
August 24, 2004 |
| A call holding voice message transmitting apparatus and method in a mobile communication terminal are disclosed that transmit voice data, preferably stored in the terminal, to a caller in a situation in which the user of the terminal cannot receive an incoming call from the caller. The |
| 6686120 |
Photoresist composition and method of forming pattern using the same |
February 3, 2004 |
| Disclosed is a photoresist composition including a thermal acid generator and a method of forming a pattern using the same. The photoresist composition includes about 100 parts by weight of an alkali-soluble acryl copolymer, about 5-100 parts by weight of 1,2-quinonediazide compound, |
| 6645682 |
Thinner for rinsing photoresist and method of treating photoresist layer |
November 11, 2003 |
| A thinner for rinsing photoresist including 50 to 80 wt. % of n-butyl acetate, propylene glycol alkyl ether, and propylene glycol alkyl ether acetate, is provided. The thinner is neither toxic to humans nor ecologically undesirable and has no unpleasant odor. The waste solutions ther |
| 6461785 |
Composition for positive photoresist |
October 8, 2002 |
| A photoresist composition is provided. The photoresist composition includes a polymer resin for forming a photoresist layer, a photosensitive chemical for changing solubility of the photoresist layer when exposed to some form of radiation, and 3-methoxybutyl acetate, 2-heptanone, and 4-b |
| 6447975 |
Composition for positive type photoresist |
September 10, 2002 |
| A photoresist composition including a polymer resin for forming a photoresist layer, a photosensitive chemical that changes the solubility of the photoresist layer when exposed to some form of radiation and 3-methoxybutyl acetate and 4-butyrolactone as a solvent, is provided. The com |
| 6420440 |
Method for recycling alignment layer materials |
July 16, 2002 |
| The present invention relates to a method for recycling an alignment layer material. The recycled alignment layer material shows the same characteristics as an original alignment layer material. The waste solution of the alignment layer material produced during the liquid crystal dis |
| 6338930 |
Positive photoresist layer and a method for using the same |
January 15, 2002 |
| A method for preparing a positive photoresist layer is provided. In this method, a photoresist composition is drop-wise applied on an insulator layer or a conductive metal layer formed on a substrate. The photoresist composition includes a polymer resin, a sensitizer for changing solubil |
| 6216548 |
Method for sampling particles present in a processing chamber |
April 17, 2001 |
| An apparatus for sampling particles from a processing chamber used in the fabrication of semiconductor devices includes a sampling line sequentially having a sampling port, a sampling air valve, a particle sampler and an isolation valve. A pumping line is connected between the isolation |
| 6146898 |
Apparatus and method for on-line decomposition of hydrogen peroxide solution in fabrication of s |
November 14, 2000 |
| An apparatus and method for on-line decomposition of a hydrogen peroxide solution, for use in fabricating a semiconductor device, includes a membrane tube having a porous plug inserted in each end, with the porous plugs defining a space where a platinum catalyst is disposed. A first |
| 6119532 |
Apparatus and method for particle sampling during semiconductor device manufacturing |
September 19, 2000 |
| An apparatus for sampling particles from a processing chamber used in the fabrication of semiconductor devices includes a sampling line sequentially having a sampling port, a sampling air valve, a particle sampler and an isolation valve. A pumping line is connected between the isolation |
| 6064368 |
User interface device for PC system |
May 16, 2000 |
| A user interface device for a PC system capable of converting user interface data transmitted from an external input device to data which can be recognized by the PC system includes an interface controller which is connected between a remote controller receiver and a system having a |
| 5948690 |
Pretreatment system for analyzing impurities contained in flat sample |
September 7, 1999 |
| A pretreatment system for analyzing impurities contained in a flat sample contains a cylindrical lower case having a stepped portion on which the flat sample is seated. The stepped portion is formed in an circumferential inner surface of the cylindrical lower case. A cylindrical upper ca |
| 5939032 |
Apparatus and method for on-line decomposition of hydrogen peroxide solution in fabrication of s |
August 17, 1999 |
| An apparatus and method for on-line decomposition of a hydrogen peroxide solution, for use in fabricating a semiconductor device, includes a membrane tube having a porous plug inserted in each end, with the porous plugs defining a space where a platinum catalyst is disposed. A first |
| 5935302 |
Ion chromatography system for conducting an environmental analysis in semiconductor equipment |
August 10, 1999 |
| An ion chromatography system analyzes the environment in semiconductor equipment for foreign materials. The system includes an impinger section for preparing a sample of the atmosphere, and an ion chromatography section. The impinger section includes an absorbent solution vessel, suc |
| 5914607 |
Apparatus and methods for analyzing a sample solution, including first and second ion detectors |
June 22, 1999 |
| A sample solution contained in a sample vessel is analyzed using a positive ion detector and a negative ion detector. The positive ion detector and the negative ion detector are supplied with the sample solution from the sample vessel, while isolating the positive ion detector and the ne |
