| Patent Number |
Title Of Patent |
Date Issued |
| 7368832 |
Circuit and fault tolerant assembly including such circuit |
May 6, 2008 |
| A circuit is provided that provides for the same power characteristics to an assembly of electrical resistive elements wired in parallel as to the assembly as wired in series. An input power source provides electrical resistive power to a plurality of load elements, wherein the plurality |
| 7335864 |
Magnetic field reduction resistive heating elements |
February 26, 2008 |
| Heating element assemblies, heating furnaces incorporating heating element assemblies, methods to form heating element assemblies, methods to form heating furnaces and methods to reduce a magnetic field in a bifilar coil are disclosed. The heating element assembly includes two components |
| 7012538 |
Heating element condition monitor |
March 14, 2006 |
| A method for monitoring the condition of a heating element involving installing the heating element in a location and setting the initial composition C.sub.i of the material as a reference baseline at an initial time T.sub.i corresponding to said installation of the heating element. |
| 6956489 |
Heating element condition monitor |
October 18, 2005 |
| A method for monitoring the condition of an electric current-carrying heating element involving installing the heating element in a location and setting the initial composition C.sub.i of the material as a reference baseline at an initial time T.sub.i corresponding to said installation o |
| 4984902 |
Apparatus and method for compensating for errors in temperature measurement of semiconductor waf |
January 15, 1991 |
| The present invention is an apparatus for calibrating a temperature feedback value in a water processing chamber to automatically compensate for variations in infrared emissions from a heated semiconductor wafer due to variations in composition and coatings from wafer to wafer. A cal |
| 4969748 |
Apparatus and method for compensating for errors in temperature measurement of semiconductor waf |
November 13, 1990 |
| The present invention is a method and apparatus for calibrating a temperature feedback value in a wafer processing chamber to automatically compensate for variations in infrared emissions from a heated semiconductor wafer due to variations in composition and coatings from wafer to wa |
| 4728869 |
Pulsewidth modulated pressure control system for chemical vapor deposition apparatus |
March 1, 1988 |
| A low pressure control system for chemical vapor deposition (CVD) apparatus, including a vacuum pressure chamber and an exhaust pump, is provided by a vacuum pump DC motor which is supplied power from a DC motor speed controller coupled to a DC control input signal from a pulsewidth |
