| Patent Number |
Title Of Patent |
Date Issued |
| 7036980 |
Apparatus and method for forming pattern |
May 2, 2006 |
| A pattern forming apparatus includes a drawing chamber having a drawing substrate on which an original pattern is drawn, a first temperature control unit having a first temperature regulator to make the temperature of the drawing chamber constant, and a constant-temperature member ar |
| 6676289 |
Temperature measuring method in pattern drawing apparatus |
January 13, 2004 |
| According to one embodiment of the present invention, the present invention may provide a temperature measuring method in a pattern drawing apparatus having a drawing chamber for drawing a pattern on a substrate to be transferred inside, a stage installed inside the drawing chamber, a |
| 6411023 |
Vacuum processing apparatus and ion pump capable of suppressing leakage of ions and electrons fr |
June 25, 2002 |
| A vacuum processing apparatus performs processing such-as a pattern depiction with a charged beam within a process chamber evacuated to a high vacuum by an ion pump. The vacuum processing apparatus, which makes it possible to prevent the accuracy of the charged beam pattern depiction |
| 6281510 |
Sample transferring method and sample transfer supporting apparatus |
August 28, 2001 |
| A method of transferring a sample to and from a treating chamber kept in a vacuum atmosphere through a pressure regulatively preparatory chamber. The sample is contained in the sample transfer container, which is kept air-permeable by a dust filtering filter, in a cleaned atmosphere befo |
| 6239443 |
Apparatus for emitting a beam to a sample used for manufacturing a semiconducor device |
May 29, 2001 |
| An apparatus for emitting a beam to a sample used for manufacturing a semiconductor device in order to process the sample, includes a chamber having an opening, a moving mechanism provided in the chamber, for moving the sample in X-, Y- and Z-axis directions, and a beam emitting system |
| 6182369 |
Pattern forming apparatus |
February 6, 2001 |
| A pattern forming apparatus comprising a sample base for positioning a sample on the base and moving a drawing position of the sample, a position measuring unit for measuring a position of the sample base, a correcting unit for mutually independently correcting drawing positions at those |
| 6090176 |
Sample transferring method and sample transfer supporting apparatus |
July 18, 2000 |
| A method of transferring a sample to and from a treating chamber kept in a vacuum atmosphere through a pressure regulative preparatory chamber. The sample is contained in the sample transfer container, which is kept air-permeable by a dust filtering filter, in a cleaned atmosphere before |
| 6080990 |
Position measuring apparatus |
June 27, 2000 |
| A position measuring apparatus includes a light source 1, an illumination optical system 100, a light-reception optical system 400 and a light-receiving unit 500. Illuminating beam emitted from the light source 1 is diffracted by a two-dimensional pattern on an object 10, and then en |
| 5912468 |
Charged particle beam exposure system |
June 15, 1999 |
| An object of the present invention is to provide a charged particle exposure system which can prevent the shift of an orbit of an electron beam in the vicinity of a periphery of a substrate when drawing a pattern onto the substrate, thereby making it possible to draw the pattern with |
| 5642373 |
Monolithic semiconductor laser array of radially disposed lasers |
June 24, 1997 |
| A monolithic semiconductor laser array includes an insulating substrate, a plurality of semiconductor layers epitaxially grown on the substrate and forming a laser structure, and at least one groove transverse to the substrate extending through the semiconductor layers into the substrate |
| 5519720 |
Semiconductor light emitting device |
May 21, 1996 |
| A semiconductor light emitting device includes a semiconductor light emitting element mounted on a package stem via a radiating heatsink block, the light emitting point of the light emitting element being positioned on the central axis of the stem and at or near the center of mass of the |
| 5442445 |
Registration method and apparatus therefor |
August 15, 1995 |
| A registration system for registering a target registration object with respect to a predetermined reference position by using a registration mark formed on the target registration object includes the intensity measurement step of receiving a mark image for a predetermined period of |
| 5151754 |
Method and an apparatus for measuring a displacement between two objects and a method and an app |
September 29, 1992 |
| A method and an apparatus for measuring a displacement between two objects. Corresponding pairs of regions of the two objects each have at least one diffraction grating which generate two-dimensionally distributed diffracted light beams. These light beams are diffracted and caused to |
| 5100234 |
Method and apparatus for aligning two objects, and method and apparatus for providing a desired |
March 31, 1992 |
| A first diffraction grating is formed on a mask, and a second diffraction grating is formed on a wafer. Two light beams having slightly different frequencies interfere with each other and are diffracted as they travel through the first diffraction grating, are reflected by the second |
| 4988197 |
Method and apparatus for aligning two objects, and method and apparatus for providing a desired |
January 29, 1991 |
| A first diffraction grating is formed on a mask, and a second diffraction grating is formed on a wafer. Two light beams having slightly different frequencies interfere with each other and are diffracted as they travel through the first diffraction grating, are reflected by the second |
| 4838693 |
Method and apparatus for setting a gap between first and second objects to a predetermined dista |
June 13, 1989 |
| According to this invention, a method and apparatus for setting a gap to a predetermined distance between a mask and a wafer facing each other, are arranged as follows. First and second diffraction grating are formed on a mask and a wafer. The first diffraction grating is one-dimensional |
| 4637845 |
Method of manufacturing semiconductor light emitting device |
January 20, 1987 |
| A method of manufacturing a semiconductor light emitting device comprises the steps of: forming a p-InP first semiconductor layer (11) on a p-type semiconductor substrate (10) by a first growth or diffusion; forming a groove (15) shaped like a stripe in the substrate and the first se |
| 4561096 |
Buried semiconductor laser avoiding thyristor action |
December 24, 1985 |
| In order to prevent the output characteristic of a semiconductor laser from being saturated at higher temperatures due to the thyristor effect of a combination of the semiconductor layers thereof, an intermediate layer of a conductivity type the same as that of the substrate and opposite |
| 4504328 |
Liquid phase epitaxial growth technique |
March 12, 1985 |
| A first growth melting solution which has been used for the growth of a first layer is first replaced with a third melting solution and then with a second growth melting solution for the growth of a second layer. Using the third melting solution of a composition intermediate the first an |
