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Jung-Hwan Hah Patents |
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Inventor: Hah; Jung-Hwan
Address: Gyeonggi-do, KR
No. of patents: 3
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 7384730 |
Top coating composition for photoresist and method of forming photoresist pattern using same |
June 10, 2008 |
| Top coating compositions capable of being used in immersion lithography, and methods of forming photoresist patterns using the same, are provided. The top coating composition includes: a polymer, a base; and a solvent, wherein the polymer may be represented by Formula I: ##STR00001## |
| 7361609 |
Mask patterns for semiconductor device fabrication and related methods |
April 22, 2008 |
| Methods of forming an integrated circuit device may include forming a resist pattern on a layer of an integrated circuit device with portions of the layer being exposed through openings of the resist pattern. An organic-inorganic hybrid siloxane network film may be formed on the resi |
| 7314691 |
Mask pattern for semiconductor device fabrication, method of forming the same, method for prepar |
January 1, 2008 |
| A mask pattern for semiconductor device fabrication comprises a resist pattern formed on a semiconductor substrate, and an interpolymer complex film formd on the resist pattern, wherein the interpolymer complex film includes a network formed by a hydrogen bond between a proton donor |
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