| Patent Number |
Title Of Patent |
Date Issued |
| 7365830 |
Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluatio |
April 29, 2008 |
| There is disclosed a wafer flatness evaluation method includes measuring front and rear surface shapes of a wafer. The wafer front surface measured is divided into sites. Then, a flatness calculating method is selected according to a position of the site to be evaluated and flatness |
| 7351504 |
Photomask blank substrate, photomask blank and photomask |
April 1, 2008 |
| In a quadrangular photomask blank substrate with a length on each side of at least 6 inches, which has a pair of strip-like regions that extend from 2 to 10 mm inside each of a pair of opposing sides along an outer periphery of a substrate top surface, with a 2 mm edge portion excluded |
| 7344808 |
Method of making photomask blank substrates |
March 18, 2008 |
| A photomask blank substrate is made by polishing a starting substrate to a specific flatness in a principal surface region on a top surface of the substrate so as to form a polished intermediate product, then additionally polishing the intermediate product. Substrates made in this wa |
| 7329475 |
Method of selecting photomask blank substrates |
February 12, 2008 |
| Provided that a pair of strip-like regions extend from 2 mm to 10 mm inside each of a pair of opposing sides along an outer periphery of a top surface of a substrate on which a mask pattern is to be formed, with a 2 mm edge portion excluded at each end in a lengthwise direction thereof, |
| 7230680 |
Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluatio |
June 12, 2007 |
| There is disclosed a wafer flatness evaluation method includes measuring front and rear surface shapes of a wafer. The wafer front surface measured is divided into sites. Then, a flatness calculating method is selected according to a position of the site to be evaluated and flatness |
| 7081946 |
Holding apparatus, holding method, exposure apparatus and device manufacturing method |
July 25, 2006 |
| A reticle holder 18 has; a first suction section 63 facing a precision warrantable area AR1 having a predetermined surface precision, of a lower face Ra of a reticle R; a second suction section 64 facing a precision unwarrantable area AR2 outside of the precision warrantable area AR1; a |
| 7070888 |
Method of selecting photomask blank substrates |
July 4, 2006 |
| A photomask blank substrate is selected for use in a process where at least a masking film or a phase shift film is deposited on a top surface of a photomask blank substrate to form a photomask blank, the deposited film is patterned to form a photomask, and the photomask is mounted in an |
| 6992751 |
Scanning exposure apparatus |
January 31, 2006 |
| A scanning exposure apparatus which promptly analyzes a cause for a variation in exposure line width. The scanning exposure apparatus includes a mask stage on which a mask is placed, a wafer stage on which a wafer is placed, a focusing mechanism which detects surface position informa |
| 6727980 |
Apparatus and method for pattern exposure and method for adjusting the apparatus |
April 27, 2004 |
| A method for performing optical adjustments of an exposure apparatus is based on an exposure apparatus having a light source for generating illumination light for exposure, and illumination optics for irradiating a mask with the illumination light generated from the exposure light source |
| 6538721 |
Scanning exposure apparatus |
March 25, 2003 |
| A scanning exposure apparatus which promptly analyzes a cause for a variation in exposure line width. The scanning exposure apparatus includes a mask stage on which a mask is placed, a wafer stage on which a wafer is placed, a focusing mechanism which detects surface position information |
| 6381004 |
Exposure apparatus and device manufacturing method |
April 30, 2002 |
| In the case the first selection criteria is set, a plurality of detection points are selected to control the pitching and rolling of the wafer, whereas in the case the second selection criteria is set, priority is put to control the rolling on the wafer. The exposure apparatus has a |
| 5907396 |
Optical detection system for detecting defects and/or particles on a substrate |
May 25, 1999 |
| An optical detection system capable of detecting even small particles or defects on a specimen such as a mask with high sensitivity and being unaffected by diffracted light from the edges of the pattern even when inspecting a thick specimen. The optical detection system includes a light |
| 5838433 |
Apparatus for detecting defects on a mask |
November 17, 1998 |
| The present invention discloses a mask defect inspection apparatus for optically detecting a defect on a mask having a circuit pattern, which comprises an illumination system for illuminating the mask with inspection light; a first light receiving optical system for receiving the inspect |
| 5798831 |
Defect inspecting apparatus and defect inspecting method |
August 25, 1998 |
| A defect inspecting apparatus and a defect inspecting method are provided to conduct discriminating detection of minute circuit patterns and foreign particles as well as to detect defectives on the surface of a substrate with a high precision. The beams from a laser light source are conv |
| 5790251 |
Defect inspecting apparatus |
August 4, 1998 |
| A defect inspecting apparatus for detecting a defect on a mask formed with a predetermined pattern comprises a first illumination system for transmission-illuminating the mask with light beams, a second illumination system for vertically illuminating the mask with the light beams, a firs |
| 5764363 |
Apparatus for observing a surface using polarized light |
June 9, 1998 |
| An observation apparatus of the present comprises (i) a light source for generating light; (ii) a separating optical system which splits the light from the light source into two different polarized light beams; (iii) a condenser optical system which converges the two polarized light beam |
| 5736735 |
Optical scanning device and foreign matter inspection apparatus |
April 7, 1998 |
| An optical scanning device includes a light deflection unit for deflecting a light beam emitted by a light source to be incident on an object to be irradiated, a polarization state adjusting unit for adjusting the polarization state of the light beam, so that the light beam to be inc |
| 5695268 |
Light source apparatus |
December 9, 1997 |
| A light source apparatus for emitting rectilinear polarized light beams includes a light source unit, a polarizing filter unit for transmitting a first rectilinear polarized component among the light beams emitted from the light source unit but reflecting a second rectilinear polarized |
| 5680207 |
Defect inspecting apparatus and defect inspecting method |
October 21, 1997 |
| A defect inspecting apparatus and a defect inspecting method are provided to conduct discriminating detection of minute circuit patterns and foreign particles as well as to detect defectives on the surface of a substrate with a high precision. The beams from a laser light source are conv |
| 5646725 |
Foreign matter inspection apparatus for large-scale substrate |
July 8, 1997 |
| An apparatus for optically inspecting foreign matter attached to a surface of a substrate on which a pattern is formed, includes an optical scan device for forming an arcuated optical scan line by scanning illumination light on the surface of the substrate, a moving device for moving the |
| 5629768 |
Defect inspecting apparatus |
May 13, 1997 |
| The defect inspecting apparatus of this invention is provided with a light source for applying illuminating light, illuminating means for applying the illuminating light from the light source onto the surface of a substrate to be inspected, a lens system for condensing the beam of light |
| 5623340 |
Foreign particle inspection apparatus |
April 22, 1997 |
| A foreign particle inspection apparatus, for detecting a foreign particle on a reticle or the like includes an illumination system for irradiating an inspection area on a specimen with inspecting light, and plural light-receiving systems adapted to condense the scattered light from a |
| 5471066 |
Defect inspection apparatus of rotary type |
November 28, 1995 |
| A simple signal processing system is utilized to detect defects on the surface of a substrate formed with a circuit pattern at high speed. Light flux from a light source illuminates an inspection point P on the wafer. The light flux from the inspection point P passes a Fourier transform |
| 5442189 |
Apparatus for inspecting defects and foreign substances having a spot illuminated focusing syste |
August 15, 1995 |
| An apparatus for inspecting defects and foreign substances on an object to be inspected comprises: an illumination optical system for illuminating a spot of illuminated area on a semiconductor wafer; a lens for executing Fourier transform of the patterns of said illuminated area; a spati |
| 5436464 |
Foreign particle inspecting method and apparatus with correction for pellicle transmittance |
July 25, 1995 |
| In a foreign particle inspecting method and apparatus in which a polarized beam is applied to a surface to be inspected through a light transmitting member mounted thereon, in which scattered light from a foreign particle on the surface to be inspected is received by a light receiving de |
| 5365330 |
Foreign particle inspection apparatus |
November 15, 1994 |
| An apparatus for inspecting a foreign particle on an object to be inspected comprises a radiating device for radiating a light beam toward a surface to be inspected, which is at least one of a surface of a protection film supported by a frame member and a surface of a substrate provided |
| 5363187 |
Light scanning apparatus for detecting foreign particles on surface having circuit pattern |
November 8, 1994 |
| A foreign particle detecting apparatus comprises a light source for radiating coherent light onto an object to be detected on a surface of which a circuit pattern is formed, a focusing device for focusing the light emitted from the light source onto the object to be detected at a pre |
| 5149982 |
Foreign particle inspection apparatus |
September 22, 1992 |
| In a foreign particle inspection apparatus for detecting foreign particles present on a transparent object, a light beam is applied obliquely to one surface of the object, and the object and the light beam are moved relatively to scan an area of the surface. A photoelectric converter has |
