| Patent Number |
Title Of Patent |
Date Issued |
| 7301159 |
Charged particle beam apparatus and method of forming electrodes having narrow gap therebetween |
November 27, 2007 |
| A focused ion beam apparatus having two pieces of probers brought into contact with two points of a surface of a sample, a voltage source for applying a constant voltage between the two points with which the probers are brought into contact, and an ammeter for measuring a current flowing |
| 7298729 |
Radio communication system and destination portable terminal time identification method |
November 20, 2007 |
| The present invention relates to a radio communication system and destination portable terminal time identification method capable of identifying the time of a destination portable telephone terminal in advance by an originating portable telephone terminal. |
| 7276691 |
Ion beam device and ion beam processing method |
October 2, 2007 |
| There is provided a liquid metal ion beam irradiation device for irradiating a specific portion of a sample 6 with a prescribed liquid metal ion beam so as to form a cross section, and a gaseous ion beam irradiation device 7 for scanning a prescribed region (observation region) of th |
| 7095024 |
TEM sample equipped with an identifying function, focused ion beam device for processing TEM sam |
August 22, 2006 |
| The problem of the present invention is to provide a TEM sample equipped with an identifying function for easily specifying a detailed TEM sample and to provide a system for handling the management of information relating to the TEM sample using the TEM when making observations that is |
| 7029518 |
Method and apparatus for the preparation of clean gases |
April 18, 2006 |
| A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as an in the prod |
| 7020152 |
Network system for controlling independent access to stored data among local area networks |
March 28, 2006 |
| A network system has a first LAN, a second LAN, and a storage device for storing data accessible from the first LAN and the second LAN. A control apparatus controls accessibility of the data stored in the storage device from the first LAN and the second LAN. The control apparatus include |
| 6939859 |
Skin preparations for external use |
September 6, 2005 |
| An dermatological agent for external use is disclosed which contains a chromanol glycoside represented by the following general formula (1) ##STR1##(wherein R.sup.1, R.sup.2, R.sup.3, and R.sup.4 which may be the same or different, each represent a hydrogen atom or a lower alkyl group, R |
| 6934920 |
Specimen analyzing method |
August 23, 2005 |
| In a sample analysis method, positional coordinates of reference points on a surface of the sample are measured using a first device. Positional coordinates of an object on the surface of the sample to be analyzed are also measured using the first device. A sample piece containing on a |
| 6911064 |
Method and apparatus for the preparation of clean gases |
June 28, 2005 |
| A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as an in the producti |
| 6870161 |
Apparatus for processing and observing a sample |
March 22, 2005 |
| An apparatus for processing and observing a sample has a sample stage for supporting a sample at a preselected location thereof, a focused ion beam irradiation system for irradiating the sample with a focused ion beam along an optical axis to cut out a portion from the sample, and a side |
| 6838685 |
Ion beam apparatus, ion beam processing method and sample holder member |
January 4, 2005 |
| An ion beam processing device has a sample holder for fixing a sample on which a section has been formed by irradiation of a specified focused ion beam from a surface side, and gas ion beam irradiation device for irradiating a gas ion beam to a region of the sample fixing using the h |
| 6736354 |
Airplane fuel supply system and airplane wing pipeline assembly method |
May 18, 2004 |
| An airplane fuel supply system includes a wing fuel tank that is formed from a wing tip fuel tank having a wing tip fuel pump; a central fuel tank having a central fuel pump; and a wing root fuel tank having a wing root fuel pump. Fuel movement from the wing tip fuel tank to the central |
| 6733570 |
Method and apparatus for the preparation of clean gases |
May 11, 2004 |
| A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as in the production |
| 6620385 |
Method and apparatus for purifying a gas containing contaminants |
September 16, 2003 |
| A method and an apparatus for purifying a gas containing contaminants are disclosed. The gas is irradiated with an ultraviolet ray and/or a radiation ray so as to produce microparticles of the contaminants. The resultant microparticles of the contaminants are contacted with a photoca |
| 6489612 |
Method of measuring film thickness |
December 3, 2002 |
| A thin film is etched by irradiating charged particles to a surface of the thin film. An etching time of the thin film is measured by observing a change in intensity of secondary charged particles emitted by etched portions of the thin film. A thickness of the thin film is calculated in |
| 6461692 |
Chemical vapor deposition method and chemical vapor deposition apparatus |
October 8, 2002 |
| A method an apparatus for chemical vapor deposition for producing a thin film. The method includes the steps of: introducing a reactive gas into a reaction chamber wherein a substrate is supported in the reaction chamber; combining charged particles with a component of the reactive gas f |
| 6395240 |
Carrier box for semiconductor substrate |
May 28, 2002 |
| A carrier box 21 for a semiconductor substrate, including an opening and closing mechanism for taking the semiconductor in or out of the box 21. The box 21 is provided with a gas cleaning device A-2 which uses a photo-electron or the photo-catalyst actuated by light irradiation for c |
| 6391118 |
Method for removing particles from surface of article |
May 21, 2002 |
| A method and an apparatus for removing particles from a surface of an article, such as a semiconductor wafer in a clean room. The particles are supplied with an electric charge. Subsequently, an ultrasonic wave or a gas stream is applied onto the surface of the article while an electric |
| 6384418 |
Sample transfer apparatus and sample stage |
May 7, 2002 |
| A sample transfer apparatus has a transfer arm for supporting a sample and is mounted for undergoing movement to transfer the sample from a first station to a second station. The transfer arm has a holding portion for holding the sample by hydrogen bonding. |
| 6340381 |
Method and apparatus for the preparation of clean gases |
January 22, 2002 |
| A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as in the production |
| 6331712 |
Section formation observing method |
December 18, 2001 |
| A focused ion beam apparatus having an ion source, a focusing optical system and a scanning electrode scans the focused ion beam across a desired region of a sample surface to form a cross-section in which stacked conductors separated by an insulating film are exposed. To prevent cha |
| 6300628 |
Focused ion beam machining method and device thereof |
October 9, 2001 |
| A focused ion beam machining method for etching the surface of a sample to obtain a desired profile formation portion by recurrently irradiating a focused ion beam to a desired region of the sample, wherein the recurrently scanned region is enlarged with the elapse of time during the |
| 6240931 |
Method for removing particles from a surface of an article |
June 5, 2001 |
| A method for removing particles from a surface of an article, such as a semiconductor wafer in a clean room. The particles are supplied with an electric charge. Subsequently, an ultrasonic wave or a gas stream is applied onto the surface of the article while an electric field is applied |
| 6205676 |
Method and apparatus for removing particles from surface of article |
March 27, 2001 |
| An apparatus for removing particles from a surface of an article, such as a semiconductor wafer in a clean room. The particles are supplied with an electric charge. Subsequently, an ultrasonic wave or a gas stream is applied onto the surface of the article while an electric field is appl |
| 6159421 |
Method of cleaning gases |
December 12, 2000 |
| Method and apparatus for cleaning a gas for preventing the contamination of a surface of a substrate in a localized space are disclosed. A photocatalyst is provided in a selected area of the localized space and the photocatalyst, as it is illuminated with light, is contacted by the g |
| 6146797 |
Focused ion beam lithography method with sample inspection through oblique angle tilt |
November 14, 2000 |
| A method for performing a cross-sectional analysis of a sample includes steps of observing a sample surface to locate a region of a sample at which a cross-sectional analysis is to be performed, tilting a sample by a predetermined angle, directing a focused ion beam to the surface of the |
| 5969355 |
Focused ion beam optical axis adjustment method and focused ion beam apparatus |
October 19, 1999 |
| To provide a focused ion beam optical axis alignment method and a focused ion beam apparatus which make axis alignment work of for example when replacing an ion source of a focused ion beam apparatus easy. A method for adjusting the optical axis of a focused ion beam apparatus having an |
| 5922105 |
Method and apparatus for the preparation of clean gases |
July 13, 1999 |
| A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as in the production |
| 5917186 |
Focused ion beam optical axis adjustment method and focused ion beam apparatus |
June 29, 1999 |
| To provide a focused ion beam optical axis alignment method and a focused ion beam apparatus which make axis alignment work of for example when replacing an ion source of a focused ion beam apparatus easy. A method for adjusting the optical axis of a focused ion beam apparatus having an |
| 5743940 |
Process for producing gas adsorbent |
April 28, 1998 |
| A process for producing a fabric absorbent that is capable of efficient removal of odorous substances, in particular malodorous substances. The absorbent is obtained by exposing an organic high-molecular weight compound, such as polyolefinic polymers or halogenated polyolefinic polym |
| 5574280 |
Focused ion beam apparatus and method |
November 12, 1996 |
| A sample semiconductor device which is processed and/or observed with the focused liquid metal ion beam can be returned again to the manufacturing process in this invention. The metal ions used in this apparatus are generally Ga ions. Ga ions contaminate a semiconductor device and a |
| 5467462 |
Event driven logic simulator for partial simulation |
November 14, 1995 |
| Event driven logic simulator for partial simulation is provided. An event storage has an event attribute storage section for indicating whether an event is preset before the execution of simulation by the operator. The node information storage has an event propagation flag storage indica |
| 5438197 |
Focused ion beam apparatus |
August 1, 1995 |
| A focussed ion-beam apparatus, to realize the simultaneous observation of both the brighter area and the darker area on the sample, which are generated because of the difference in the generation efficiency of the secondary charged particle due to the ion-beam irradiation. According to |
| 5380503 |
Stocker |
January 10, 1995 |
| A stocker for accommodating, storing or transporting articles in clean, contamination-free conditions for either a long time or temporarily. The stocker has a particle collector provided in a part thereof. The particle collector includes an irradiation source such as ultraviolet light so |
| 5376497 |
Positive quinone diazide sulfonic acid ester resist composition containing select hydroxy compou |
December 27, 1994 |
| Disclosed herein is a positive resist composition comprising in admixture:(a) 100 parts by weight of an alkali-soluble phenolic resin;(b) 1-100 parts by weight of a photosensitive agent formed of a quinonediazide sulfonic acid ester;(c) 1-100 parts by weight of a hydroxy compound having a struct |
| 5225000 |
Method for cleaning closed spaces with ultraviolet rays |
July 6, 1993 |
| Cleaning a closed space such as safety cabinets, clean boxes, safes and wafer storage spaces are performed by irradiating a photoelectron emitting member with ultraviolet rays and/or other forms of radiation to emit photoelectrons into the closed space, electrically charging the fine |
| 5154733 |
Photoelectron emitting member and method of electrically charging fine particles with photoelect |
October 13, 1992 |
| A photoelectron emitting member and method of electrically charging fine particles with photoelectrons, wherein the member includes a matrix that is at least composed of a material capable of transmitting ultraviolet rays and a material that is provided on the surface of the matrix or in |
| 5060805 |
Photoelectron emitting member |
October 29, 1991 |
| A photoelectron emitting member having a multiplex structure comprises a matrix and a protective film. The matrix being selected from the group consisting of elements, inorganic compounds, alloys, mixtures thereof and composites thereof which emit photoelectrons upon exposure to uv rays |
| 4980335 |
Acidic gas adsorber having a metal phthalocyanine on an ion exchanger |
December 25, 1990 |
| An absorber is capable of selective adsorption and removal of acidic gases of sulfur oxides, nitrogen oxides, chlorine compounds and sulfur-containing compounds such as hydrogen sulfide, as well as organic acid gases. The absorber is characterized by having a metal phthalocyanine sup |
| 4750917 |
Method of and apparatus for cleaning air by irradiation of ultraviolet rays |
June 14, 1988 |
| A method of and an apparatus for cleaning the air by irradiating the air with ultraviolet rays to electrically charge the fine particles therein, and thereafter removing the charged fine particles from the air are disclosed. The cleaning method of the air (50) has the following steps: |
