| Patent Number |
Title Of Patent |
Date Issued |
| 7438869 |
Emission control system |
October 21, 2008 |
| The invention relates to an emission control system for removing environmentally harmful and/or toxic gases or vapors, comprising a reaction chamber which is connected to a plasma source, whereby plasma is formed in said reaction chamber by injecting excitation energy, and the reacti |
| 7014824 |
Method for purifying process waste gases |
March 21, 2006 |
| The present invention relates to a method for purifying process waste gases by introducing them into a waste gas purification system that includes a reaction chamber and by post-treating the reaction products that leave the reaction chamber in a washing or sorbtion chamber with an as |
| 5900217 |
Apparatus for purifying waste gases |
May 4, 1999 |
| An apparatus for purifying waste gases, particularly waste gases from CVD (chemical vapor deposition), plasma etching or similar processes, with at least one combustion space, which is in a vertical arrangement within an outer pipe and is limited at the top by an umbrella-like cover, and |
| 5164017 |
Method for cleaning reactors used for gas-phase processing of workpieces |
November 17, 1992 |
| A method for cleaning reactors for the gas-phase processing of workpieces, particularly in the field of semiconductor technology and more particularly in the field of coating semiconductor substrates by means of chemical deposition processes, with less effort entails providing the re |
| 4981722 |
Apparatus for the gas-phase processing of disk-shaped workpieces |
January 1, 1991 |
| An apparatus for the gas-phase processing of disk-shaped workpieces serves for maintaining cleanliness of the processing space and the workpiece or for avoiding deposits on parts of the workpiece which are not inteded to be coated. In particular a second inner wall system, which is perme |
