| Patent Number |
Title Of Patent |
Date Issued |
| RE33326 |
Semiconductor vapor phase growing apparatus |
September 11, 1990 |
| In apparatus for vapor phase growing N or P type semiconductor layers on semiconductor substrates supported by a rotary support disposed in a reaction furnace, and various types of gases are admitted into the furnace through a pipe line network and valves, there is provided a control dev |
| 5244500 |
Process control system of semiconductor vapor phase growth apparatus |
September 14, 1993 |
| In a semiconductor vapor phase growing apparatus of the type disclosed in U.S. Pat. No. 4,430,959 dated Feb. 14, 1984, the thickness and resistivity of the semiconductor grown on a substrate by vapor phase growing technique are controlled by a sequence program. The content of the sequenc |
| 4982693 |
Semiconductor vapor phase growing apparatus |
January 8, 1991 |
| In a semiconductor vapor phase growing apparatus wherein a semiconductor wafer is heated in a reaction furnace, and an output of a source for heating, the temperature of the wafer, and flow quantities of gases supplied to the reaction furnace for vapor phase growing a semiconductor o |
| 4807561 |
Semiconductor vapor phase growth apparatus |
February 28, 1989 |
| A vapor phase growth substrate is conveyed into a heated atomosphere, and vapor phase growth gas is supplied from a nozzle connected to a gas supply means to the substrate in the middle portion of conveyance. Process program information relating to the conveying speed of the substrate, t |
| 4772485 |
Process control system of semiconductor vapor phase growing apparatus |
September 20, 1988 |
| In a semiconductor vapor phase growing apparatus of the type disclosed in U.S. Pat. No. 4,430,959 dated Feb. 14, 1984, the thickness and resistivity of the semiconductor grown on a substrate by vapor phase growing technique are controlled by a sequence program. The content of the sequenc |
| 4770121 |
Semiconductor vapor phase growing apparatus |
September 13, 1988 |
| An apparatus for positioning a plurality of semiconductor substrates on a movable, support in a desired pattern, in a semiconductor vapor phase growing apparatus. A memory is provided for storing two dimensional data corresponding to the desired pattern. The desired pattern is predetermi |
| 4430959 |
Semiconductor vapor phase growing apparatus |
February 14, 1984 |
| In apparatus for vapor phase growing N or P type semiconductor layers on semiconductor substrates supported by a rotary support disposed in a reaction furnace, and various types of gases are admitted into the furnace through a pipe line network and valves, there is provided a control dev |
| 4305128 |
Method and apparatus for controlling orientation of tools |
December 8, 1981 |
| When cutting a groove of a predetermined contour through a plate shaped workpiece with a fret saw blade, various program data regarding the direction of movements of the fret saw blade and the contour of the groove to be cut are stored in a memory device. The fret saw blade is moved in a |
| 4288851 |
Method of determining position of openings adapted to receive fret saw blade of numerically cont |
September 8, 1981 |
| In a machine for cutting grooves of a given pattern through a blank with a fret saw blade, openings for receiving the fret saw blade at the cutting starting points of the grooves are determined such that the center of each opening is positioned at a point spaced from a cutting start poin |
| 4116101 |
Automatic fret sawing machines |
September 26, 1978 |
| In an automatic sawing machine wherein a workpiece is moved in two orthogonal directions by a profile control or a numerical control so as to cut a groove of a predetermined profile, the opposite ends of the fret saw blade are synchronously driven by independent pulse motors so as to dir |
