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You-Neng Cheng Patents
Inventor:
Cheng; You-Neng
Address:
Taipei, TW
No. of patents:
1
Patents:




Patent Number Title Of Patent Date Issued
6379574 Integrated post-etch treatment for a dielectric etch process April 30, 2002
The present disclosure pertains to an integrated post-etch treatment method which is performed after a dielectric etch process. Using the method of the invention, byproducts formed on the sidewalls of contact vias during the dielectric etch process can be removed efficiently. The method


 
 
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