| Patent Number |
Title Of Patent |
Date Issued |
| 7308013 |
Excimer or molecular fluorine laser system with precision timing |
December 11, 2007 |
| A Master Oscillator (MO)--Power Amplifier (PA) configuration (MOPA) can be used advantageously in an excimer laser system for micro-lithography applications, where semiconductor manufacturers demand powers of 40 W or more in order to support the throughput requirements of advanced li |
| 7266137 |
Laser gas replenishment method |
September 4, 2007 |
| Output beam parameters of a gas discharge laser are stabilized by maintaining a molecular fluorine component at a predetermined partial pressure using a gas supply unit and a processor. The molecular fluorine is subject to depletion within the discharge chamber. Gas injections includ |
| 7158553 |
Master oscillator/power amplifier excimer laser system with pulse energy and pointing control |
January 2, 2007 |
| Pulse parameters of a gas discharge laser system can be optimized and controlled for precision applications such as microlithography. Important laser pulse parameters typically vary in the beginning of a pulse burst, and the directionality of the output beam typically varies throughout t |
| 7079565 |
Systems and methods utilizing laser discharge electrodes with ceramic spoilers |
July 18, 2006 |
| Arcing can be minimized in a discharge chamber of an excimer or molecular fluorine laser system by utilizing an improved electrode structure. An electrode structure can include at least one ceramic spoiler positioned near the discharge region of the electrode. An insulating ceramic spoil |
| 6987790 |
Excimer or molecular fluorine laser with several discharge chambers |
January 17, 2006 |
| Precise timing control can be obtained for a gas discharge laser, such as an excimer or molecular fluorine laser, using a timed trigger ionization. Instead of using a standard approach to control the timing of the emission or amplification of an optical pulse using the discharge of the |
| 6965624 |
Laser gas replenishment method |
November 15, 2005 |
| A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a molecular fluorine component of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The molecular fluorine is provided at an |
| 6834066 |
Stabilization technique for high repetition rate gas discharge lasers |
December 21, 2004 |
| Method and system for providing stabilization techniques for high repetition rate gas discharge lasers with active loads provided in the discharge circuitry design which may include a resistance provided in the discharge circuitry. |
| 6785316 |
Excimer or molecular laser with optimized spectral purity |
August 31, 2004 |
| A final stage capacitance of a pulse compression circuit for an excimer or molecular fluorine lithography laser system is provided by a set of peaking capacitors connected through a first inductance to the electrodes and a set of sustaining capacitors connected to the electrodes through |
| 6757315 |
Corona preionization assembly for a gas laser |
June 29, 2004 |
| A preionization device for a gas laser includes an internal preionization electrode having a dielectric housing around it such that the preionization device is of corona type. The internal electrode connects to advantageous electrical circuitry, preferably external to the discharge c |
| 6721345 |
Electrostatic precipitator corona discharge ignition voltage probe for gas status detection and |
April 13, 2004 |
| An excimer or molecular fluorine laser system is provided which emits a laser beam during operation and has a gas mixture with a gas composition initially provided within a discharge chamber. The laser system includes a discharge chamber containing a laser gas mixture at least including |
| 6714577 |
Energy stabilized gas discharge laser |
March 30, 2004 |
| An excimer or molecular fluorine laser, such as a KrF- or ArF-laser, or a molecular fluorine (F.sub.2) laser, particularly for photolithography applications, has a gas mixture including a trace amount of a gas additive. The concentration of the gas additive in the gas mixture is opti |
| 6650679 |
Preionization arrangement for gas laser |
November 18, 2003 |
| A preionization device for a gas laser comprises an internal preionization electrode having a dielectric housing around it and an external preionization electrode displaced from the dielectric housing by a small gap. The dielectric housing includes two cylindrical regions of differing |
| 6618422 |
Preionization arrangement for a gas laser |
September 9, 2003 |
| A preionization device for a gas laser comprises an internal preionization electrode having a dielectric housing around it and an external preionization electrode displaced from the dielectric housing by a small gap. The dielectric housing includes two cylindrical regions of differing |
| 6570901 |
Excimer or molecular fluorine laser having lengthened electrodes |
May 27, 2003 |
| An excimer or molecular fluorine laser system includes a laser tube filled with a gas mixture including fluorine and a buffer gas, and multiple electrodes within the laser tube connected with a pulsed discharge circuit for energizing the gas mixture. At least one of the electrodes is lon |
| 6556609 |
Discharge unit for a high repetition rate excimer or molecular fluorine laser |
April 29, 2003 |
| A laser for an excimer or molecular fluorine laser includes an electrode chamber connected with a gas flow vessel and having a pair of main electrodes and a preionization unit each connected to a discharge circuit. A spoiler is provided within the electrode chamber and is shaped to p |
| 6546036 |
Roof configuration for laser discharge electrodes |
April 8, 2003 |
| A method and devices for preionizing the main discharge gas volume of a gas discharge laser are described. The method and devices provide a preionizing discharge to the main gas discharge volume from above or below the main gas discharge volume. In combination with a shielding arrangemen |
| 6466599 |
Discharge unit for a high repetition rate excimer or molecular fluorine laser |
October 15, 2002 |
| A laser for an excimer or molecular fluorine laser includes an electrode chamber connected with a gas flow vessel and having a pair of main electrodes and a preionization unit each connected to a discharge circuit. A spoiler is provided within the electrode chamber and is shaped to p |
| 6430205 |
Discharge unit for a high repetition rate excimer or molecular fluorine laser |
August 6, 2002 |
| A laser for an excimer or molecular fluorine laser includes an electrode chamber connected with a gas flow vessel and having a pair of main electrodes and a preionization unit each connected to a discharge circuit. A spoiler is provided within the electrode chamber and is shaped to p |
| 6414978 |
Discharge unit for a high repetition rate excimer or molecular fluorine laser |
July 2, 2002 |
| A laser for an excimer or molecular fluorine laser includes an electrode chamber connected with a gas flow vessel and having a pair of main electrodes and a preionization unit each connected to a discharge circuit. A spoiler is provided within the electrode chamber and is shaped to p |
