| Patent Number |
Title Of Patent |
Date Issued |
| 5389699 |
(Meth)acrylate copolymer based UV-crosslinkable materials |
February 14, 1995 |
| UV-crosslinkable materials based on (meth)acrylate copolymers and containing from 0.01 to 10% by weight, based on the copolymer, of copolymerized monomers of the formula I ##STR1## where x is alkyl of 1 to 3 carbon atoms or is phenyl which is unsubstituted or substituted by n Y g |
| 5314936 |
Aqueous polymer dispersions containing organic compounds having carbonate groups and carbonyl gr |
May 24, 1994 |
| The invention relates to an aqueous polymer dispersion which may optionally contain mineral additives and/or pigments and which essentially consists of a mixture ofA) a 20% to 65% w/w aqueous dispersion of a copolymer of(a) an olefinically unsaturated compound containing one or more carboxyl |
| 5294688 |
UV-crosslinkable copolymers |
March 15, 1994 |
| The invention relates to UV-crosslinkable copolymers built up fromA) from 99.5 to 75% by weight of olefinically unsaturated monomers,B) from 0.5 to 25% by weight of unsaturated compounds of the formula I ##STR1## and C) from 0.01 to 10% by weight of copolymerizable, olefinically unsatur |
| 5292915 |
Compounds containing carbonate groups and carbonyl groups and the preparation and use thereof |
March 8, 1994 |
| The invention relates to compounds containing carbonate groups and carbonyl groups and having the general formula ##STR1## in which R stands for a C.sub.1 -C.sub.4 -alkyl radical, an aryl radical, or a radical R.sup.1, whereR.sup.1 has the following formula ##STR2## in which |
| 5264533 |
Benzophenone derivatives and their preparation |
November 23, 1993 |
| UV-crosslinkable materials based on (meth)acrylate copolymers and containing special modified unsaturated benzophenone derivatives as copolymerized units are used as hotmelt adhesives, for coating sheet-like mineral substrates and as surface coatings. |
| 5248805 |
Radiation-senstive, ethylenically unsaturated, copolymerizable compounds and their preparation |
September 28, 1993 |
| Radiation-sensitive, ethylenically unsaturated compounds and a process for their preparation. The ethylenically unsaturated organic compounds are of the general formula ##STR1## where R is alkyl, aryl or a radical R.sup.1 andR.sup.1 is a radical ##STR2## where R.sup.2 to R.s |
| 5220037 |
Sulfonium salts and use thereof |
June 15, 1993 |
| Novel sulfonium salts useful as photoinitiators for cationic polymerization and for producing relief patterns and relief images have the general formula (I) ##STR1## where A.sup..crclbar. is a non-nucleophilic counterion,x is 1, 2 or 3,R is a hydrocarbon radicalR' is arylene or subst |
| 5206417 |
Radiation-sensitive, ethylenically unsaturated copolymerizable compounds and their preparation |
April 27, 1993 |
| The ethylenically unsaturated organic compounds are of the general formula ##STR1## where R is alkyl, aryl or a radical R.sup.1, and R.sup.1 is a radical ##STR2## where R.sup.2 to R.sup.6 are each H, alkyl, OH, Oalkyl, SH, Salkyl, halogen, N(alkyl).sub.2 or N(alkyl)(aryl), and no |
| 5191124 |
Sulfonium salts having acid-labile groups |
March 2, 1993 |
| Sulfonium salts of the general formula ##STR1## where R.sup.1, R.sup.2 and R.sup.3 are identical or different and are aliphatic and/or aromatic radicals which may contain heteroatoms, or two of the radicals R.sup.1 and R.sup.3 are bonded to one another to form a ring, with the pr |
| 5180756 |
Agents curable by ultraviolet radiation |
January 19, 1993 |
| Agents which are curable by ultraviolet radiation are based on a binder formulation of (1) from 99.0 to 20% by weight of a copolymer, (2) from 1.0 to 80% by weight of monoolefinically unsaturated compounds and (3) from 0.0 to 20% by weight of polyolefinically unsaturated compounds. The a |
| 5130392 |
Radiation-sensitive polymers |
July 14, 1992 |
| Radiation-sensitive polymers suitable for use in positive- and negative-working recording elements contain not only acid-labile groups but also onium salt groups having nonnucleophilic counterions in one and the same molecule. |
| 5101053 |
Radiation-sensitive, ethylenically unsaturated, copolymerizable sulfonium salts and their prepar |
March 31, 1992 |
| Radiation sensitive sulfonium salts which contain (1) a sulfonium initiator portion, (2) a spacer portion, and (3) a reactive group portion. The spacer portion has the formula "-o-w- x-z-" wherein "w" is a single bond or one of --C(O)--, --C(O)O--, --C(O)S--, --C(O)NH-- --C(O)N(alkyl)--, |
| 5073611 |
Copolymers crosslinkable by ultraviolet radiation in the atmosphere |
December 17, 1991 |
| Copolymers which are curable by ultraviolet radiation in the air are prepared by a process in which a mixture of (A) from 80 to 99.9% by weight of olefinically unsaturated monomers, (B) from 0 to 10% by weight of a copolymerizable olefinically unsaturated, photoreactive compound which, i |
| 5073474 |
Radiation-sensitive mixture containing acid labile groups and production of relief patterns |
December 17, 1991 |
| A radiation sensitive mixture suitable for producing relief patterns contains(a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and(b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and wh |
| 5069998 |
Radiation sensitive mixture and production of relief patterns |
December 3, 1991 |
| A radiation sensitive mixture useful for producing relief patterns contains(a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and(b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which co |
| 5026806 |
UV-crosslinkable materials based on isoamyl (meth)acrylate copolymers |
June 25, 1991 |
| Materials which are cross-linkable by ultraviolet radiation under atmospheric oxygen and are based on (meth)acrylate copolymers having a K value of from 10 to 100 are obtained by free radical polymerization, in the presence or absence of a solvent, ofa) from 5% to 97.4% by weight of isoa |
| 4967010 |
Preparation of symmetric and asymmetric monoacetals of aromatic 1,2-diketones |
October 30, 1990 |
| Symmetric and asymmetric monoacetals of aromatic 1,2-diketones are prepared by a novel process, in a nonpolar solvent in the presence of a urea derivative as the catalyst. |
| 4962011 |
Photopolymerizable recording materials containing a triazole sensitizer and photoresist layers a |
October 9, 1990 |
| Novel photopolymerizable recording materials suitable in particular for producing photoresist layers and lithographic printing plates are composed of one or more photopolymerizable, olefinically unsaturated organic compounds, optionally a polymeric binder, a photopolymerization initiator |
| 4940649 |
Photopolymerizable recording materials and photoresist layers and lithographic printing plates b |
July 10, 1990 |
| Novel photopolymerizable recording materials suitable in particular for producing photoresist layers and lithographic printing plates are composed of one or more photopolymerizable, olefinically unsaturated organic compounds, optionally a polymeric binder, a photopolymerization initiator |
| 4908448 |
4-Quinazolone compounds |
March 13, 1990 |
| Novel photopolymerizable recording materials suitable in particular for producing photoresist layers and lithographic printing plates are composed of one or more photopolymerizable, olefinically unsaturated organic compounds, optionally a polymeric binder, a photopolymerization initiator |
| 4891301 |
Photopolymerizable recording materials, photoresist layers and lithographic printing plates base |
January 2, 1990 |
| Abstract of the disclosure: Novel photopolymerizable recording materials suitable in particular for producing photoresist layers and lithographic printing plates are composed of one or more photopolymerizable, olefinically unsaturated organic compounds, a photopolymerization initiato |
| 4886735 |
Photopolymerizable recording materials and photoresist layers and lithographic printing plates b |
December 12, 1989 |
| Photopolymerizable recording materials suitable for producing photoresist layers and lithographic printing plates are composed of one or more photopolymerizable olefinically unsaturated organic compounds, optionally a polymeric binder, one or more photopolymerization initiators, a co |
| 4883740 |
Radiation-sensitive mixture for photosensitive coating materials |
November 28, 1989 |
| A radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains both one or more a |
| 4868091 |
Photopolymerizable recording material, in particular for the production of printing plates and r |
September 19, 1989 |
| Novel photopolymerizable recording materials, in particular for the production of printing plates and relief plates, can be developed with water or an aqueous alkaline solution and predominantly consist of a photoinitiator-containing mixture of (a) one or more low molecular weight co |
