| Patent Number |
Title Of Patent |
Date Issued |
| 7266137 |
Laser gas replenishment method |
September 4, 2007 |
| Output beam parameters of a gas discharge laser are stabilized by maintaining a molecular fluorine component at a predetermined partial pressure using a gas supply unit and a processor. The molecular fluorine is subject to depletion within the discharge chamber. Gas injections includ |
| 7079565 |
Systems and methods utilizing laser discharge electrodes with ceramic spoilers |
July 18, 2006 |
| Arcing can be minimized in a discharge chamber of an excimer or molecular fluorine laser system by utilizing an improved electrode structure. An electrode structure can include at least one ceramic spoiler positioned near the discharge region of the electrode. An insulating ceramic spoil |
| 6965624 |
Laser gas replenishment method |
November 15, 2005 |
| A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a molecular fluorine component of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The molecular fluorine is provided at an |
| 6834066 |
Stabilization technique for high repetition rate gas discharge lasers |
December 21, 2004 |
| Method and system for providing stabilization techniques for high repetition rate gas discharge lasers with active loads provided in the discharge circuitry design which may include a resistance provided in the discharge circuitry. |
| 6785316 |
Excimer or molecular laser with optimized spectral purity |
August 31, 2004 |
| A final stage capacitance of a pulse compression circuit for an excimer or molecular fluorine lithography laser system is provided by a set of peaking capacitors connected through a first inductance to the electrodes and a set of sustaining capacitors connected to the electrodes through |
| 6757315 |
Corona preionization assembly for a gas laser |
June 29, 2004 |
| A preionization device for a gas laser includes an internal preionization electrode having a dielectric housing around it such that the preionization device is of corona type. The internal electrode connects to advantageous electrical circuitry, preferably external to the discharge c |
| 6556609 |
Discharge unit for a high repetition rate excimer or molecular fluorine laser |
April 29, 2003 |
| A laser for an excimer or molecular fluorine laser includes an electrode chamber connected with a gas flow vessel and having a pair of main electrodes and a preionization unit each connected to a discharge circuit. A spoiler is provided within the electrode chamber and is shaped to p |
| 6546036 |
Roof configuration for laser discharge electrodes |
April 8, 2003 |
| A method and devices for preionizing the main discharge gas volume of a gas discharge laser are described. The method and devices provide a preionizing discharge to the main gas discharge volume from above or below the main gas discharge volume. In combination with a shielding arrangemen |
| 6466599 |
Discharge unit for a high repetition rate excimer or molecular fluorine laser |
October 15, 2002 |
| A laser for an excimer or molecular fluorine laser includes an electrode chamber connected with a gas flow vessel and having a pair of main electrodes and a preionization unit each connected to a discharge circuit. A spoiler is provided within the electrode chamber and is shaped to p |
| 6430205 |
Discharge unit for a high repetition rate excimer or molecular fluorine laser |
August 6, 2002 |
| A laser for an excimer or molecular fluorine laser includes an electrode chamber connected with a gas flow vessel and having a pair of main electrodes and a preionization unit each connected to a discharge circuit. A spoiler is provided within the electrode chamber and is shaped to p |
| 6414978 |
Discharge unit for a high repetition rate excimer or molecular fluorine laser |
July 2, 2002 |
| A laser for an excimer or molecular fluorine laser includes an electrode chamber connected with a gas flow vessel and having a pair of main electrodes and a preionization unit each connected to a discharge circuit. A spoiler is provided within the electrode chamber and is shaped to p |
| 5896220 |
Production of narrow-band coherent radiation by using at least one optical parametric oscillator |
April 20, 1999 |
| A source of narrow-band coherent radiation has a first optical parametric oscillator (OPO 1) for producing seed radiation, and a second optical parametric oscillator (OPO 2), into which the seed radiation is input after passing through a wavelength-selective element (G). In order to |
| 5663973 |
Tunable narrowband source of a coherent radiation |
September 2, 1997 |
| A tunable narrowband source of a coherent radiation, comprisinga first optical parametric oscillator (OPO1) which includes at least one first optical parametric amplifier medium (K.sub.1) in a resonator (18, 20; 20, 34) or an optical parametric generator;at least one second optical parametri |
| 5661595 |
Tunable, optical parametric oscillator |
August 26, 1997 |
| A tunable, optical, parametric oscillator including at least one non-linear optical crystal (10) comprises a first deflector mirror (18) arranged inside the resonator between the resonator mirror (12) and the crystal (10) to couple in the pump radiation (16) as well as a second deflector |
| 5559815 |
Pulsed laser |
September 24, 1996 |
| A pulsed laser comprises an oscillator (10), a laser medium (14), a wavelength selective member (12) for tuning the wavelength of a beam pulse (18) emitted by the oscillator, and means for pulsed excitation of the laser medium (14). The laser medium (14) is excited at least twice at |
