The present invention provides a method and apparatus for high precision image metrology. A feature dimension from the image is determined by measuring corresponding features in the Fourier power spectrum of the image with substantially improved precision due to immunity from noise and
A measuring device for measuring the intensity and/or polarization of electromagnetic radiation, more in particular of light. The measuring device is provided with a tunnel tip arranged facing a body at some distance, which tunnel tip at least partly consists of a semiconductor mater
