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Cammy R. Abernathy Patents
Inventor:
Abernathy; Cammy R.
Address:
Scotch Plains, NJ
No. of patents:
3
Patents:




Patent Number Title Of Patent Date Issued
5459097 Method for selectively growing aluminum-containing layers October 17, 1995
In accordance with the invention, aluminum-containing layers are grown by molecular beam processes using as an arsenic precursor phenylarsine (PhAs). Because PhAs is more reactive than arsine and less reactive than arsenic, it decomposes selectively on III-V surfaces but not on mask
5227006 Method for selectively growing gallium-containing layers July 13, 1993
In accordance with the invention, gallium-containing layers are grown by molecular beam processes using as an arsenic precursor a compound of the dialkylaminoarsenic family (DAAAs) such as tris-dimethylamino arsenic (DMAAs). In contrast to conventional arsenic sources, DAAAs act as carbo
5171704 GaAs device fabrication utilizing metalorganic molecular beam epitaxy (MOMBE) December 15, 1992
High carrier concentration, as well as abrupt change in such concentration in GaAs-based devices, is the consequence of selection of tin dopant-containing precursor compounds as used during layer growth. Alkyl tin compounds, as used during MetalOrganic Molecular Beam Epitaxy, are of


 
 
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