| Patent Number |
Title Of Patent |
Date Issued |
| 7346882 |
Pattern forming method, mask manufacturing method, and LSI manufacturing method |
March 18, 2008 |
| A pattern forming method includes the steps of checking a wide range size change characteristic for each device in a case of using a device group used for forming a pattern; dividing a design pattern size into a smaller area than a standard distance to which a predetermined size change i |
| 7293674 |
Discharge container having a squeezable and deformable |
November 13, 2007 |
| The technical problem of this invention is to create check valve mechanisms of a simple configuration. Thus, the object of this invention is to provide a discharge container maintaining high productivity, showing good squeeze operation, and having improved outer appearance. The above |
| 7167740 |
Measuring method in magnetic resonance imaging device and magnetic resonance imaging device |
January 23, 2007 |
| In a measuring space of the object (1), an essential measurement region (41, 61, 71, 81, 111, 131) having a center region of the measuring space and a plurality of peripheral measurement regions (42, 62, 63, 72, 82, 112, 132) which do not have any region overlapped with the essential |
| 7081634 |
Variably shaped beam EB writing system |
July 25, 2006 |
| A variably shaped beam EB writing system which draws a pattern, comprises a recognition module, an adjustment module, and a drawing module. The recognition module recognizes at least one of a first length unit to specify a pattern length and a first position unit to specify a position |
| 7041991 |
Variably shaped beam EB writing system |
May 9, 2006 |
| A variably shaped beam EB writing system which draws a pattern, comprises a recognition module, an adjustment module, and a drawing module. The recognition module recognizes at least one of a first length unit to specify a pattern length and a first position unit to specify a position |
| 6938803 |
Non-leaking non-dripping liquid jet pump |
September 6, 2005 |
| A liquid jetting pump of the present invention is constructed such that an intra container liquid is sucked into a cylinder 3 through a suction valve 9 by moving a vertically movable member 4 up and down, and the intra cylinder liquid is jetted out of a nozzle 29 through a discharge valv |
| 6774380 |
Variably shaped beam EB writing system |
August 10, 2004 |
| A variably shaped beam EB writing system which draws a pattern, comprises a recognition module, an adjustment module, and a drawing module. The recognition module recognizes at least one of a first length unit to specify a pattern length and a first position unit to specify a position |
| 6773506 |
Method for producing thin film |
August 10, 2004 |
| A thin film producing method in which the wafer film forming processing for a wafer to be a product may be carried out efficiently to shorten the processing time and to raise the operating ratio of the device. In a thin film deposition method using a single wafer processing for forming a |
| 6702156 |
Non-leaking non-dripping liquid jet pump |
March 9, 2004 |
| A liquid jetting pump of the present invention is constructed such that an intra container liquid is sucked into a cylinder 3 through a suction valve 9 by moving a vertically movable member 4 up and down, and the intra cylinder liquid is jetted out of a nozzle 29 through a discharge valv |
| 6617260 |
Method of manufacturing semiconductor device prevented from peeling of wirings from insulating f |
September 9, 2003 |
| The present invention provides a manufacturing method of a semiconductor device which does not give rise to peeling of a metal film caused by oxygen held in a interlayer insulating film even when the wafer is subjected to a heat treatment after the metal film is formed on the interla |
| 6611144 |
Magnetic resonance imaging device |
August 26, 2003 |
| In a contrast MRA measurement, sampling order of k-space is controlled considering the distance from the origin such that sampling the low-frequency data is performed a time when the contrast concentration reaches it peak. First, the sampling points of k-space are divided into two gr |
| 6546808 |
Method of evaluating high fatigue strength material in high tensile strength steel and creation |
April 15, 2003 |
| The present invention provides a method of designing a high fatigue strength in high tensile strength steel, comprising: obtaining values of tensile strength .sigma..sub.B (unit thereof is MPa) and Vickers hardness Hv of the steel; measuring a flaw area of an inclusion, when a fracture |
| 6346354 |
Pattern writing method |
February 12, 2002 |
| A pattern writing method acquires the area of a pattern segment located in each of a plurality of small regions obtained by dividing a region on which a pattern is to be written, small region by small region, and writes a pattern based on an optimum dose calculated based on this area. Th |
| 6333138 |
Exposure method utilizing partial exposure stitch area |
December 25, 2001 |
| An exposure method of sequential beam, contributing to the improvement of alignment accuracy at connecting portion at the end part of an exposure region, as well as pattern dimension accuracy is provided. The method comprises the steps of dividing an area to be exposed into a plurality o |
| 6313476 |
Charged beam lithography system |
November 6, 2001 |
| A charged beam lithography system includes a charged particle gun for generating charged beams, a main deflecting system and a sub-deflecting system for deflecting the charged beams generated by the charged particle gun, and a control computer. The charged beam lithography system is |
| 6172364 |
Charged particle beam irradiation apparatus |
January 9, 2001 |
| A reflection prevention board of a charged particle beam irradiation apparatus of the present invention comprises a laminate sheet having a plurality of thin films and a plurality of microholes through the laminate sheet. According to the present invention the reflection prevention board |
| 6119902 |
Liquid jet pump |
September 19, 2000 |
| A liquid jet pump constructed to suck a liquid within a container on which the pump is mounted and jet the liquid out of a nozzle by pushing down the head of the pump. The nozzle is so formed so as to ascend forward obliquely, and is provided with a discharge valve housing a ball-like |
| 6114582 |
Processes for producing optically active 2-amino-1-phenylethanol derivatives |
September 5, 2000 |
| An (R)-2-amino-1-phenylethanol derivative shown by the general formula (IIa) ##STR1## wherein R.sup.1 and R.sup.5 represent a hydrogen atom, etc.; R.sup.2, R.sup.3 and R.sup.4 independently represent a halogen atom, etc., or a salt thereof, can readily be produced (1) by permitti |
| 6047116 |
Method for generating exposure data for lithographic apparatus |
April 4, 2000 |
| In a method of generating from design data the exposure data necessary for a multistage-deflection charged beam exposure device that has a main deflector and a sub-deflector and forms a pattern, before a shape larger than the size of a minimum subfield area is divided during the generati |
| 5924604 |
Liquid jetting pump with passageways for dispensing liquids |
July 20, 1999 |
| A liquid jetting pump sucks a container liquid into a cylinder (3) through a suction valve (9) by moving a vertically movable member (4) up an down. The liquid is jetted out of a nozzle (29) through a discharge valve (31) of stem (28). A plurality of ribs (10) are provided at a lower edg |
| 5863682 |
Charged particle beam writing method for determining optimal exposure dose prior to pattern draw |
January 26, 1999 |
| A charged particle beam writing method for determining an optimal exposure dose for each position in a pattern to be drawn on a target before actually drawing the pattern by irradiating the target with charged particles and drawing the pattern with the obtained optimal exposure doses |
| 5811293 |
Processes for producing optically active 2-amino-1-phenylethanol derivatives by reduction of the |
September 22, 1998 |
| An (R)-2-amino-1-phenylethanol derivative shown by the general formula (IIa) ##STR1## wherein R.sup.1 and R.sup.5 represent a hydrogen atom, etc.; R.sup.2, R.sup.3 and R.sup.4 independently represent a halogen atom, etc., or a salt thereof, can readily be produced (1) by permitti |
| 5629200 |
Production of optically active 2-amino-1-phenylethanol derivatives by asymetrical assimilation |
May 13, 1997 |
| An (R)-2-amino-1-phenylethanol derivative shown by the general formula (IIa) ##STR1## wherein R.sup.1 and R.sup.5 represent a hydrogen atom, etc.; R.sup.2, R.sup.3 and R.sup.4 independently represent a halogen atom, etc., or a salt thereof, can readily be produced (1) by permitti |
| 5451487 |
Electron beam lithographic method and apparatus |
September 19, 1995 |
| In an electron beam lithographic method including a correction radiation step based on the ghost method, the entire correction region is divided into small regions, each having a size smaller than a spread of backscattering of an electron beam and larger than a minimum figure which c |
| 5305225 |
Charged particle litography method and apparatus |
April 19, 1994 |
| In an electron beam lithography method which irradiates a sample with an electron beam to draw a desired pattern on the sample, figure data representing the shape of an elemental figure, placement data representing placement information of the figure data, and dose data representing dose |
| 5091635 |
Optical record medium including a data region, an identification region and a control data regio |
February 25, 1992 |
| An optical record medium in the form of a wallet-size optical card including a data region in which a number of data tracks are provided in parallel with each other, an identification region provided on one side of the data region, and a mark region provided on a side of the identifi |
| 5008553 |
Electron beam lithography method and apparatus |
April 16, 1991 |
| A charged beam lithography writes a pattern with charged beams on a sample. The pattern involves various shapes. For every position in the shapes in the pattern, degree of exposure due to a proximity effect caused by backward scattering charged from the shapes surrounding the position is |
| 4977912 |
Finely pulverized component added in vehicle spray washing water and apparatus for recovering th |
December 18, 1990 |
| A finely pulverized component added in vehicle spray washing water and acting to remove dirt which ordinarily tend to be left on a car surface when washing the car by applying dynamic water spray, and a vehicle spray washing system using the spray washing water containing detergent and t |
| 4936997 |
Method of flushing desalination apparatus equipped with reverse osmotic membrane module and appa |
June 26, 1990 |
| A desalination method and apparatus for separating permeate water (WP) from raw water (WF) pressure-fed by a pump (PM) through a reverse osmotic membrane module (U) to discharge concentrated water (WB) from an outlet valve (V2). When the membrane performance of the reverse osmotic membra |
| 4657505 |
Different fuels combustion burner |
April 14, 1987 |
| A different fuels combustion burner for simultaneously burning a liquid fuel and a solid fuel in which the solid- and liquid-fuel injections are separated in the circumferential direction so that the interference between the injected solid and liquid fuels can be avoided. |
