| Patent Number |
Title Of Patent |
Date Issued |
| 6488774 |
Trap apparatus |
December 3, 2002 |
| A trap apparatus is optimum for trapping a material gas discharged from a vapor deposition apparatus for depositing in a vapor phase thin films of high-dielectric or ferroelectric such as barium/strontium titanates on substrates. The trap apparatus is disposed downstream of a vacuum proc |
| 6387182 |
Apparatus and method for processing substrate |
May 14, 2002 |
| A substrate processing apparatus forms a thin film of high-dielectric or ferroelectric such as barium/strontium titanates, or a copper film for wiring on a substrate, and has a gas ejection head for individually introducing at least two gases including a material gas and ejecting the |
| 6312569 |
Chemical vapor deposition apparatus and cleaning method thereof |
November 6, 2001 |
| A chemical vapor deposition apparatus for depositing a thin film of highly dielectric materials for giga-capacity memory devices can reliably clean reaction products formed within the deposition chamber without sacrificing the production efficiency. The apparatus comprises a hermetic dep |
| 6282368 |
Liquid feed vaporization system and gas injection device |
August 28, 2001 |
| A compact vaporizer system is presented to produce a high quality vapor feed from a liquid feed to be delivered to a chemical vapor deposition processing chamber to produce thin film devices based on highly dielectric or ferroelectric materials such as BaTiO.sub.3, SrTiO.sub.3 and other |
| 6269221 |
Liquid feed vaporization system and gas injection device |
July 31, 2001 |
| A compact vaporizer system is presented to produce a high quality vapor feed from a liquid feed to be delivered to a chemical vapor deposition processing chamber to produce thin film devices based on highly dielectric or ferroelectric materials such as BaTiO.sub.3, SrTiO.sub.3 and other |
| 6195504 |
Liquid feed vaporization system and gas injection device |
February 27, 2001 |
| A compact vaporizer system is presented to produce a high quality vapor feed from a liquid feed to be delivered to a chemical vapor deposition processing chamber to produce thin film devices based on highly dielectric or ferroelectric materials such as BaTiO.sub.3, SrTiO.sub.3 and others |
| 6132512 |
Vapor-phase film growth apparatus and gas ejection head |
October 17, 2000 |
| A vapor-phase film growth apparatus includes a substrate holder for holding a substrate, a gas ejection head, and a radiant heat shield device. The substrate holder has a substrate heater therein, and the gas ejection head has a gas injection surface for ejecting a material gas toward a |
| 5951923 |
Vaporizer apparatus and film deposition apparatus therewith |
September 14, 1999 |
| A vaporizer apparatus efficiently vaporizes difficult-to-vaporize materials such as complex feed materials for producing a high dielectric or ferroelectric material. The vaporizer apparatus includes a vaporizing passage formed by a pair of opposed walls separated by a minute spacing to |
| 5950646 |
Vapor feed supply system |
September 14, 1999 |
| A vapor feed supply system including a vaporizer device and a method of cleaning a vapor flow region employing such a vaporizer device enables thorough cleaning of the system, without having to degrade the overall system vacuum in the process of cleaning the vaporizer device. The method |
