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Inventor: Zhou; Jie
Address: Sunnyvale, CA
No. of patents: 1
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 8133819 |
Plasma etching carbonaceous layers with sulfur-based etchants |
March 13, 2012 |
| Etching of carbonaceous layers with an etchant gas mixture including molecular oxygen (O.sub.2) and a gas including a carbon sulfur terminal ligand. A high RF frequency source is employed in certain embodiments to achieve a high etch rate with high selectivity to inorganic dielectric |
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