Resources Contact Us Home
Zhou; Jie
Sunnyvale, CA
No. of patents:

Patent Number Title Of Patent Date Issued
8133819 Plasma etching carbonaceous layers with sulfur-based etchants March 13, 2012
Etching of carbonaceous layers with an etchant gas mixture including molecular oxygen (O.sub.2) and a gas including a carbon sulfur terminal ligand. A high RF frequency source is employed in certain embodiments to achieve a high etch rate with high selectivity to inorganic dielectric

  Recently Added Patents
Roll of continuous web of optical film laminate and production method therefor
Non-volatile semiconductor memory and data processing method in non-volatile semiconductor memory
Analysis device and an analysis apparatus using the analysis device
Cordless hand blender
Method and system for migrating object update messages through synchronous data propagation
Image capture and identification system and process
Method and apparatus for wireless communication in a mesh network with central control of communication relationships
  Randomly Featured Patents
Data storage system including respective buffers for non-volatile memory and disc recording medium, and data access method thereof
Preparation of neutralized ethylene-acrylic acid polymer dispersions and use in printing media for improvement of digital toner adhesion
Method and system for managing delayed user authentication
Polymers with high internal free volume
Metallized film capacitor
Polishing plate
User customizable workflow preferences for remote patient management
Alignment key and method of making the same
Process for production of perfluoroalkadienes
Security device for hinged products