| Patent Number |
Title Of Patent |
Date Issued |
| 7528935 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby |
May 5, 2009 |
| A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an arti |
| 7492440 |
Lithographic apparatus and device manufacturing method |
February 17, 2009 |
| A substrate or a patterning device used in a lithographic apparatus and a lithographic device manufacturing method are presented. The substrate and patterning device are aligned with respect to a patterning beam and are movably supported by a support. Resonances in said support, however, |
| 7486381 |
Lithographic apparatus and device manufacturing method |
February 3, 2009 |
| An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the |
| 7426011 |
Method of calibrating a lithographic apparatus and device manufacturing method |
September 16, 2008 |
| In calibration of overlay performance of an immersion lithographic apparatus, two sets of overlay data are obtained from exposures carried out using normal and reversed meanders. The two data sets can then be used to eliminate effects due to wafer cooling. |
| 7423725 |
Lithographic method |
September 9, 2008 |
| In calibration of overlay performance of an immersion lithographic apparatus, two sets of overlay data are obtained from exposures carried out using, for example, normal and reversed meanders. The two data sets can then be used to eliminate effects due to substrate cooling. |
| 7327439 |
Lithographic apparatus and device manufacturing method |
February 5, 2008 |
| A lithographic apparatus is disclosed. The apparatus includes an illumination system arranged to condition a radiation beam, and an article support configured to support an article to be placed in a beam path of the radiation beam. The article support includes a plurality of bonded l |
| 7327438 |
Lithographic apparatus and method of a manufacturing device |
February 5, 2008 |
| A lithographic projection apparatus having a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern; a substrate holder for hold |
| 7327437 |
Lithographic apparatus and device manufacturing method |
February 5, 2008 |
| A lithographic apparatus includes an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, |
| 7239368 |
Using unflatness information of the substrate table or mask table for decreasing overlay |
July 3, 2007 |
| A lithographic system includes an illumination system for providing a projection beam of radiation, a mask table for supporting a mask, the mask serving to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection syst |
| 7230254 |
Movable carriage for a lithographic apparatus and device manufacturing method |
June 12, 2007 |
| A movable carriage for moving an article support member in a lithographic apparatus is provided. The article support member is constructed and arranged to move and support an article to be placed in a beam path of the lithographic apparatus. The carriage includes a compartmented comp |
| 7227619 |
Lithographic apparatus and device manufacturing method |
June 5, 2007 |
| A burl plate for use in immersion lithography has a higher burl density in a peripheral portion than in a medial portion so that when a higher pressure differential is applied in the peripheral portion the compression of the burls in the peripheral portion is substantially the same a |
| 7187433 |
Electrostatic clamp assembly for a lithographic apparatus |
March 6, 2007 |
| An electrostatic clamp assembly for a lithographic apparatus is provided. The clamp assembly includes an electrostatic clamp structured to clamp an article against an article support structure during projection of a beam of radiation, and a controller structured to control at least one o |
| 7161662 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby |
January 9, 2007 |
| A lithographic projection apparatus includes a radiation system for providing a beam of radiation, and a substrate holder. The substrate holder includes a plurality of protrusions for providing a substantially flat plane of support for supporting a substrate in a beam path of the bea |
| 7133120 |
Lithographic apparatus, article support member, and method |
November 7, 2006 |
| A lithographic apparatus having an illumination system for providing a projection beam of radiation; an article support member for supporting an article to be placed in a beam path of the projection beam of radiation on the article support; and a clamp for providing a clamping pressure f |
| 7119885 |
Lithographic apparatus and device manufacturing method |
October 10, 2006 |
| A lithographic apparatus is disclosed. The apparatus includes an illumination system for conditioning a beam of radiation, and an article support for supporting a substantially flat article to be placed in the beam of radiation. The article support includes a plurality of supporting |
| 7113262 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby |
September 26, 2006 |
| A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation and a substrate holder for supporting a substrate to be placed in a beam path of the beam of radiation. The substrate holder includes a plurality of first pro |
| 7110091 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby |
September 19, 2006 |
| A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an arti |
| 7110085 |
Lithographic apparatus, substrate holder and method of manufacturing |
September 19, 2006 |
| A lithographic projection apparatus including a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern; a substrate holder havin |
| 7027132 |
Lithographic apparatus and device manufacturing method |
April 11, 2006 |
| A lithographic apparatus includes an article support for supporting a substantially flat article to be placed in a beam path of a beam of radiation. The article support includes a plurality of supporting protrusions that define a support zone for providing a plane of support. A backf |
| 7019820 |
Lithographic apparatus and device manufacturing method |
March 28, 2006 |
| A lithographic apparatus includes an illumination system for providing a beam of radiation and an article support for supporting an article to be placed in a beam path of the beam of radiation on the article support. The article support has a plurality of supporting protrusions. The |
| 7019816 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby |
March 28, 2006 |
| A lithographic apparatus is disclosed. The apparatus includes an illumination system to provide a beam of radiation, an article support to support an article to be placed in a beam path of the beam of radiation, and a clamp to clamp the article to the article support. The clamp is pr |
| 6897945 |
Lithographic apparatus and device manufacturing method |
May 24, 2005 |
| A lithographic apparatus includes an illumination system for providing a beam of radiation, an article support for supporting a flat article to be placed in a beam path of the beam of radiation on the article support, a backfill gas feed arranged in the article support for feeding backfi |
