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Inventor: Yoo; Won Jong
Address: Seoul, KR
No. of patents: 2
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 6387774 |
Methods for forming patterned layers including notched etching masks |
May 14, 2002 |
| A method for patterning a layer of a microelectronic device includes the step of forming an etching mask on the layer to be etched opposite the microelectronic substrate. The etching mask defines exposed portions of the material layer and the etching mask has a notch in the sidewall |
| 6004882 |
Method for etching Pt film of semiconductor device |
December 21, 1999 |
| A method for etching a platinum (Pt) layer of a semiconductor device is provided which improves the etching slope of a sidewall of the platinum layer used as a storage node of the semiconductor device. The semiconductor device consists of a semiconductor substrate including a bottom |
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