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Yokoyama; Jiro
Shizuoka, JP
No. of patents:

Patent Number Title Of Patent Date Issued
7989137 Resist composition and pattern-forming method using the same August 2, 2011
A resist composition includes (A) a resin including: a repeating unit capable of decomposing by the action of an acid to increase solubility in an alkali developing solution and represented by formula (I), and a repeating unit represented by formula (II); and (B) a compound capable of
7923196 Positive resist composition and pattern forming method using the same April 12, 2011
A positive resist composition comprising (A) a resin which contains all of the repeating units represented by formulae (I) to (III), and becomes soluble in an alkali developer by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic

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