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Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Yamazaki; Shunpei
Address:
Tokyo, JP
No. of patents:
1852
Patents:




Patent Number Title Of Patent Date Issued
RE38727 Photoelectric conversion device and method of making the same April 19, 2005
A photoelectric conversion device has a non-single-crystal semiconductor laminate member formed on a substrate having a conductive surface, and a conductive layer formed on the non-single-crystal semiconductor laminate member. The non-single-crystal semiconductor laminate member has such
RE38266 Method for fabricating semiconductor thin film October 7, 2003
An object of the present invention is to provide a technology of reducing a nickel element in the silicon film which is crystallized by using nickel. An extremely small amount of nickel is introduced into an amorphous silicon film which is formed on the glass substrate. Then this amorpho
RE37441 Photoelectric conversion device November 13, 2001
A photoelectric conversion device has a non-single-crystal semiconductor laminate member formed on a substrate having a conductive surface, and a conductive layer formed on the non-single-crystal semiconductor laminate member. The non-single-crystal semiconductor laminate member has such
RE36314 Insulated gate field effect semiconductor devices having a LDD region and an anodic oxide film o September 28, 1999
An IGFET has differential crystallinity in offset regions near the source-channel and drain-channel boundaries. In one embodiment, an offset region with crystallinity different from that of an adjacent region is provided between the channel and at least one of the source and drain re
RE34658 Semiconductor device of non-single crystal-structure July 12, 1994
A semiconductor device which has a non-single crystal semiconductor layer formed on a substrate and in which the non-single crystal semiconductor layer is composed of a first semiconductor region formed primarily of non-single crystal semiconductor and a second semi-conductor region form
RE33208 Photoelectric conversion panel and assembly thereof May 1, 1990
A photoelectric conversion panel which includes a PIN type non-single-crystal semiconductor laminated photoelectric conversion member formed on a substrate, the substrate is formed by a thin, flexible, chemically reinforced glass sheet.A plurality of such photoelectric conversion panels
H1683 Superconducting material October 7, 1997
A superconducting composition is provided to essentially consist of a superconducting material and Li(lithium), Na(sodium), and K(potassium) mixed in an amount up to 0.2% by weight of of the composition into the superconducting material.
7619282 Hybrid circuit and electronic device using same November 17, 2009
There is disclosed a hybrid circuit in which a circuit formed of TFTs in integrated with an RF filter. The TFTs are fabricated on a quartz substrate. A ceramic filter forming the RF filter is fabricated on another substrate. Terminals extend through the quartz substrate. The TFTs are
7616282 Liquid crystal display and method of driving same November 10, 2009
There is disclosed a lightweight and small liquid crystal display which achieves low power consumption and in which the optical anisotropy of the liquid crystal material is compensated for in order to enhance the viewing angle characteristics and the response speed of the liquid crys
7612376 Semiconductor device November 3, 2009
A systemized active matrix display in which a pixel matrix circuit, a driver circuit and a logic circuit are mounted on the same substrate, is formed. A TFT of the present invention has such characteristics as to be able to operate in a wide driving frequency range of 0.05 to 2 GHz, and
7611930 Method of manufacturing display device November 3, 2009
In a case of forming a bottom-gate thin film transistor, a step of forming a microcrystalline semiconductor film over a gate insulating film by a plasma CVD method, and a step of forming an amorphous semiconductor film over the microcrystalline semiconductor film are performed. In the st
7609358 Liquid crystal display device and manufacturing method thereof October 27, 2009
As the screen size becomes larger, it is required to make the device achieve higher definition, higher open area ratio, and higher reliability. Further, requirements for improvements in productivity and cost minimization are also increased. In the present invention, a substrate is pa
7605902 Semiconductor device and method of fabricating the same October 20, 2009
There is provided a high quality liquid crystal panel having a thickness with high accuracy, which is designed, without using a particulate spacer, within a free range in accordance with characteristics of a used liquid crystal and a driving method, and is also provided a method of f
7605786 Liquid crystal display device October 20, 2009
A small-sized active matrix type liquid crystal display device that may achieve large-sized display, high precision, high resolution and multi-gray scales is provided. Gray scale display is performed by combining time ratio gray scale and voltage gray scale in a liquid crystal displa
7605534 Light-emitting element having metal oxide and light-emitting device using the same October 20, 2009
It is an object of the invention is to provide a light-emitting element in which failure of the light-emitting element due to separation can be controlled and stable luminescence can be obtained with high-efficiency and for a long stretch of time by controlling separation of layers c
7605401 Semiconductor device and fabrication method thereof October 20, 2009
A hydrogenation method that utilizes plasma directly exposes a crystalline semiconductor film to the plasma, and therefore involves the problem that the crystalline semiconductor film is damaged by the ions generated simultaneously in the plasma. If a substrate is heated to 400.degree. C
7605023 Manufacturing method for a semiconductor device and heat treatment method therefor October 20, 2009
To apply a technique of forming a dense insulating film with a high quality in a thin film element such as a TFT formed on a glass substrate by eliminating an influence of contraction of the substrate caused by heat treatment in a manufacturing process for the element, and a semicond
7601572 Semiconductor device and manufacturing method thereof October 13, 2009
In order to increase an aperture ratio, a part of or all of a gate electrode that overlaps with channel formation regions (213, 214) of a pixel TFT is caused to overlap with second wirings (source line or drain line) (154, 157). Additionally, a first interlayer insulating film (149)
7598927 Light-emitting device, driving support system, and helmet October 6, 2009
It is an object to provide a driving support system and a display device suitable for the driving support system. According to the driving support system, change in driver's mental and physical conditions can be caught instantaneously and a warning light emission display is given within
7596024 Nonvolatile memory September 29, 2009
A highly-integrated nonvolatile memory. A memory cell array where plural memory cells are arranged in matrix in row and column directions, plural first and second word lines, and plural bit lines are included. Each of the plural memory cells includes a first memory transistor and a secon
7592991 Light emitting device and drive method thereof September 22, 2009
The reliability of an EL element is enhanced while the increase of the electric power consumption is suppressed. It becomes possible that in a SES drive, the reverse bias is applied to the EL element driven at a constant electric current. Moreover, the application of the reverse bias
7592984 Display device and electronic device September 22, 2009
A display device capable of displaying on both screens and switching between vertical and horizontal display, and a driving method thereof. Each pixel comprises a first region including a first light emitting element, and a second region including a second light emitting element. The
7592980 Semiconductor device September 22, 2009
Semiconductor elements deteriorate or are destroyed due to electrostatic discharge damage. The present invention provides a semiconductor device in which a protecting means is formed in each pixel. The protecting means is provided with one or a plurality of elements selected from the gro
7592975 Display device and driving method thereof September 22, 2009
A display device where a reverse driving voltage can be applied to a light-emitting element at regular intervals in order to insulate a short-circuit portion, thereby prolonging the life of the light-emitting element. A short-circuit portion is burnt out by providing a period for sup
7589032 Laser apparatus, laser irradiation method, semiconductor manufacturing method, semiconductor dev September 15, 2009
Continuous wave laser apparatus with enhanced processing efficiency is provided as well as a method of manufacturing a semiconductor device using the laser apparatus. The laser apparatus has: a laser oscillator; a unit for rotating a process object; a unit for moving the center of the
7588970 Semiconductor device and manufacturing method thereof September 15, 2009
The present invention provides a TFT including at least one LDD region in a self-alignment manner without forming a sidewall spacer and increasing the number of manufacturing steps. A photomask or a reticle provided with an assist pattern that is formed of a diffraction grating pattern o
7586505 Light emitting device and electronic apparatus using the same September 8, 2009
Providing a light emitting device capable of suppressing the variations of luminance of OLEDs associated with the deterioration of an organic light emitting material, and achieving a consistent luminance. An input video signal is constantly or periodically sampled to sense a light emissi
7585783 Drop discharge apparatus, method for forming pattern and method for manufacturing semiconductor September 8, 2009
In this invention, it provides a method for forming a pattern, which is capable of improving position control after a drop, which was discharged from a drop discharge apparatus, was landed on a substrate. In addition, it provides a drop discharge apparatus which is capable of improving d
7585714 Method for manufacturing semiconductor device, semiconductor device, and laser irradiation appar September 8, 2009
It is an object of the present invention to provide a laser irradiation apparatus being able to crystallize the semiconductor film homogeneously while suppressing the variation of the crystallinity in the semiconductor film and the unevenness of the state of the surface thereof. It is
7583020 Light-emitting device, film-forming method and manufacturing apparatus thereof, and cleaning met September 1, 2009
This invention provides a new film forming method in which, on the occasion that pressure is decreased by pressure decreasing means which was connected to a film forming chamber, and a film is formed by evaporating an organic compound material from a deposition source in the film for
7579774 Light emitting device and method for fabricating light emitting device August 25, 2009
It is an object of the present invention to provide a method for fabricating a light emitting device, in which brightness gradient due to potential drop of a counter electrode can be prevented from being observed and an auxiliary electrode can be formed without increasing the number
7579771 Light emitting device and method of manufacturing the same August 25, 2009
All lights generated in an organic compound layer are not taken out towards a TFT from a cathode as a transparent electrode. For instance, the light is emitted in a lateral direction (direction parallel to the substrate surface) but the light emitted in the lateral direction is not t
7579220 Semiconductor device manufacturing method August 25, 2009
It is an object of the present invention to form a plurality of elements in a limited area to reduce the area occupied by the elements for integration so that further higher resolution (increase in number of pixels), reduction of each display pixel pitch with miniaturization, and int
7579203 Light emitting device August 25, 2009
An inexpensive light emitting device and inexpensive electric equipment are provided. A substrate on which a semiconductor element or a light emitting element is formed and a color filter are manufactured by separate manufacturing processes, and they are bonded to each other to compl
7579089 Luminescent device August 25, 2009
Interfaces between layers in a light emitting element are eliminated by using a light emitting element with a mixed region comprising a hole transporting material and an electron transporting material. The light emitting element may further comprise a region with a dopant. By using t
7575993 Method of manufacturing semiconductor device and display device August 18, 2009
To provide a method of forming a wiring for the purpose of providing a semiconductor device, which is superior in reliability and cost performance. Further, to provide methods of manufacturing a semiconductor device and a display device by using the method of forming the wiring accor
7575985 Method of fabricating semiconductor device August 18, 2009
In a manufacturing process of a semiconductor device using a substrate having low heat resistance, such as a glass substrate, there is provided a method of efficiently carrying out crystallization of a semiconductor film and gettering treatment of a catalytic element used for the cry
7575965 Method for forming large area display wiring by droplet discharge, and method for manufacturing August 18, 2009
It is conceivable that the problem that a signal is delayed by resistor of a wiring in producing a display which displays large area becomes remarkable. The present invention provides a manufacturing process using a droplet discharge method suitable for a large-sized substrate.In the
7575961 Electrooptical device and a method of manufacturing the same August 18, 2009
To provide a semiconductor device of high reliability by arranging TFTs that have appropriate structures in accordance with circuit functions. In a semiconductor device having a driver circuit portion and a pixel portion on the same insulator, gate insulating films of a driver TFT are
7573469 Display device August 11, 2009
In a display device having driving circuits formed on the same substrate where pixels are formed, the lateral frame area of the display device is reduced. A gate signal line driving circuit is placed in parallel with a source signal line driving circuit, so that no driving circuits are
7572522 Luminescent device August 11, 2009
Interfaces between layers in a light emitting element are eliminated by using a light emitting element with a mixed region including a hole transporting material and an electron transporting material The light emitting element may further comprise a region with a dopant. By using thi
7569854 Semiconductor device and fabrication method thereof August 4, 2009
A p channel TFT of a driving circuit has a single drain structure and its n channel TFT, an LDD structure. A pixel TFT has the LDD structure. A pixel electrode disposed in a pixel unit is connected to the pixel TFT through a hole bored in at least a protective insulation film formed of
7569440 Method of manufacturing a semiconductor device and manufacturing system thereof August 4, 2009
A method of manufacturing a semiconductor device, comprises the steps of: forming an amorphous silicon film on a substrate having an insulating surface; processing said amorphous silicon film by plasma of a gas that mainly contains hydrogen or helium; and giving an energy to said amo
7569408 Semiconductor device and method for forming the same August 4, 2009
An insulated gate field effect semiconductor device comprising a substrate having provided thereon a thin-film structured insulated gate field effect semiconductor device, said device being characterized by that it comprises a metal gate electrode and at least the side thereof is coated
7569405 Method of manufacturing light emitting device August 4, 2009
A method of manufacturing a light emitting device is provided which requires low cost, is easy, and has high throughput. The method of manufacturing a light emitting device is characterized in that: a solution containing a light emitting material is ejected to an anode or cathode und
7567328 Liquid-crystal display device and method of fabricating the same July 28, 2009
An active matrix type liquid-crystal display device of IPS mode has its aperture ratio enhanced, thereby to realize an image display which has a wide angle of vision and which is clear and bright. A pixel portion (in FIG. 2) in the liquid-crystal display device comprises a TFT (115) whic
7567031 Organic light emitting element and light emitting device using the element July 28, 2009
An organic light emitting element which can employ non-sublimable (non-volatile) or insoluble materials while keeping the same level of light emission as prior art is provided. Dispersive particles (202a) of an insoluble organic material that is dispersed in a solvent (201) in which
7566903 Semiconductor device and method of manufacturing the same July 28, 2009
The present invention improves the aperture ratio of a pixel of a reflection-type display device or a reflection type display device without increasing the number of masks and without using a blackmask. A pixel electrode (167) is arranged so as to partially overlap a source wiring (1
7564139 Semiconductor device and method for manufacturing the same July 21, 2009
It is an object of the present invention to provide a technique for making a semiconductor device thinner without using a back-grinding method for a silicon wafer. According to the present invention, an integrated circuit film is mounted, thereby making a semiconductor device mounting th
7564059 Semiconductor device with tapered gates July 21, 2009
In order to realize a higher reliability TFT and a high reliability semiconductor device, an NTFT of the present invention has a channel forming region, n-type first, second, and third impurity regions in a semiconductor layer. The second impurity region is a low concentration impuri


 
 
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