| |
|
Inventor: Yaakobi; Barukh
Address: Rochester, NY
No. of patents: 1
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 4665541 |
X-ray lithography |
May 12, 1987 |
| Submicron x-ray lithography using a single shot of ultraviolet laser energy of one nanosecond (ns) duration and of relatively low energy to produce an x-ray pulse for exposing a resist to obtain a submicron pattern thereon. The incident x-ray flux used is about an order of magnitude smal |
|
|
|
