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Inventor: Xalter; Stefan
Address: Oberkochen, DE
No. of patents: 9
Patents:
| Patent Number |
Title Of Patent |
Date Issued |
| 7589921 |
Actuator device |
September 15, 2009 |
| Actuator devices, as well as related systems and methods, are disclosed. In some embodiments, the devices, systems and methods are within the field of microlithography. In some embodiments, a system can include an optical element unit having an optical element, a support structure su |
| 6897599 |
System for damping oscillations |
May 24, 2005 |
| In a system for overcoming or at least damping oscillations in or through channels (9) which carry fluid in a component, in particular coolant in cooling channels in an optical element (1), in particular a projection objective lens (1a) for semiconductor lithography, oscillations which |
| 6844994 |
Optical element deformation system |
January 18, 2005 |
| In a system for specific deformation of optical elements in an imaging device, in particular in a projection exposure machine having a projection lens for micro-lithography, for the purpose of eliminating image errors or for active adjustment, piezoelectric elements are applied as actuat |
| 6781668 |
Optical arrangement |
August 24, 2004 |
| An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. An optical element (5) is therefore acted upon in a rotationally non-symmetrical manner by the radiati |
| 6700715 |
Oscillation damping system |
March 2, 2004 |
| In an oscillation damping system, the oscillations which act on an optical element in an imaging device, in particular on deformation-decoupled mounts and manipulators in a projection illumination arrangement, in particular in a projection objective for microlithographic projection e |
| 6522392 |
Optical systems and methods of compensating rotationally non-symmetrical image defects in an opt |
February 18, 2003 |
| An optical system, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. The system comprises a light source (30) as well as at least one optical element, in particular a lens or a mir |
| 6521877 |
Optical arrangement having improved temperature distribution within an optical element |
February 18, 2003 |
| An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. A refractive optical element, e.g. a lens (2), is heated by the rotationally non-symmetrical radiated |
| 6504597 |
Optical arrangement |
January 7, 2003 |
| An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. An optical element (1) is therefore acted upon in a rotationally non-symmetrical manner by the radiati |
| 6466382 |
Optical arrangement |
October 15, 2002 |
| An optical arrangement, in particular a projection exposure system for microlithography, has, in particular, a slit-shaped image field or a non-rotational-symmetric illumination. As a result, an optical element (101) is exposed in a non-rotational-symmetric manner to the radiation of |
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