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Wu; Wen-Bin
Tao-Yuan Hsien, TW
No. of patents:

Patent Number Title Of Patent Date Issued
7723181 Overlay alignment mark and alignment method for the fabrication of trench-capacitor dram devices May 25, 2010
A small-size (w<0.5 micrometers) alignment mark in combination with a "k1 process" is proposed, which is particularly suited for the fabrication of trench-capacitor DRAM devices which requires highly accurate AA-DT and GC-DT overlay alignment. The "k1 process" is utilized to etch
6987053 Method of evaluating reticle pattern overlay registration January 17, 2006
A method for evaluating reticle registration between two reticle patterns. A wafer is defined and etched to form a first exposure pattern, by photolithography with a first reticle having a first reticle pattern thereon. A photoresist layer is formed over the wafer and defined as a se
6929902 Method of preventing repeated collapse in a reworked photoresist layer August 16, 2005
A method of preventing repeated collapse in a reworked photoresist layer. First, oxygen-containing plasma is applied to remove a collapsed photoresist. Because the plasma containing oxygen reacts with a bottom anti-reflect layer comprising SiO.sub.x N.sub.y, some acids are produced o

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