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Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Wegmann; Ulrich
Address:
Koenigsbronn, DE
No. of patents:
27
Patents:












Patent Number Title Of Patent Date Issued
8199333 Optical scattering disk, use thereof, and wavefront measuring apparatus June 12, 2012
Optical scattering disk, use and wavefront measuring apparatus. The optical scattering disk includes a transparent substrate (1) and a light scattering layer (2) adjoining a surface of the substrate and having light-scattering-active particles (3). The light scattering layer has an e
8169595 Optical apparatus and method for modifying the imaging behavior of such apparatus May 1, 2012
The disclosure relates to an optical apparatus including a light source that emits light in the form of light pulses having a pulse frequency, and including at least one optical element. The disclosure also relates to a projection exposure machine including a pulsed light source and a
8134716 Methods and apparatus for measuring wavefronts and for determining scattered light, and related March 13, 2012
A method and apparatus for spatially resolved wavefront measurement on a test specimen, a method and apparatus for spatially resolved scattered light determination, a diffraction structure support and a coherent structure support therefor, and also an objective or other radiation exp
8120763 Device and method for the optical measurement of an optical system by using an immersion fluid February 21, 2012
A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the
8004690 Device and method for the optical measurement of an optical system, measurement structure suppor August 23, 2011
A device for the optical measurement of an optical system which, in a useful operating mode, receives useful radiation on a useful radiation entrance side and emits it on a useful radiation exit side. The device includes a measurement radiation source, by which at least one exit-side
7911624 Device and method for the interferometric measurement of phase masks March 22, 2011
A device and method for the interferometric measurement of phase masks, particularly from lithography. Radiation passing through a coherence mask is brought to interference by a diffraction grating. A phase mask is arranged in or near the pupil plane of the first imaging optics which can
7796274 System for measuring the image quality of an optical imaging system September 14, 2010
A measuring system (100) for the optical measurement of an optical imaging system (150), which is provided to image a pattern arranged in an object surface (155) of the imaging system in an image surface (156) of the imaging system, comprises an object-side structure carrier (110) having
7760366 System for measuring the image quality of an optical imaging system July 20, 2010
A measuring system for the optical measurement of an optical imaging system, which is provided to image a pattern arranged in an object surface of the imaging system in an image surface of the imaging system, comprises an object-side structure carrier having an object-side measuring
7623218 Method of manufacturing a miniaturized device November 24, 2009
A method of manufacturing a miniaturized device comprises disposing a patterning structure to be imaged in a region of an object plane of an imaging optics of the projection exposure system; disposing a substrate carrying a resist in a region of an image plane of the imaging optics and
7570345 Method of optimizing imaging performance August 4, 2009
A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated pa
7456933 Method for improving the imaging properties of a projection objective for a microlithographic pr November 25, 2008
In a method for improving the imaging properties of a projection objective of a microlithographic projection exposure apparatus, an appropriate illumination angle distribution adapted to a mask (24; 224) to be projected is selected. Then locations (40a, 40b; 60a, 60b; 80a, 80b, 80c)
7436521 Optical measuring apparatus and operating method for imaging error correction in an optical imag October 14, 2008
A measuring apparatus for optical, for example interferometric, measurement of an optical imaging system, imaging of a useful pattern in an imaging operation, including a device for production of radiation information, for example interference information, which is indicative of imag
7417745 Device and method for wavefront measurement of an optical imaging system by means of phase-shift August 26, 2008
Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry, having a mask structure (6a) to be arranged on the object side, and/or a grating structure (7a) to be arranged on the image side. The object-side mask structure includes on
7408652 Device and method for the optical measurement of an optical system by using an immersion fluid August 5, 2008
A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the
7365861 Method and apparatus for determining telecentricity and microlithography projection exposure app April 29, 2008
An apparatus having a wavefront measuring device (1, 2, 7), which is designed to determine a wavefront tilt in one or more non-parallel transverse directions perpendicular to an optical axis of the optical imaging system, at a plurality of measurement points which are mutually offset
7352452 Method and apparatus for setting optical imaging properties by means of radiation treatment April 1, 2008
Method and apparatus for setting optical imaging properties using radiation treatment, specifically a method and an apparatus for setting the imaging properties of an optical system with radiation treatment of at least one optical element of the optical system in the installed state,
7336371 Apparatus and method for measuring the wavefront of an optical system February 26, 2008
A device and a method for wavefront measurement of an optical system (7), in particular by an interferometric measurement technique. A dynamic range correction element (12, 12a) is arranged in the beam path upstream of the detector arrangement (11) and is designed such that the variation
7307707 Method and system for measuring the imaging quality of an optical imaging system December 11, 2007
An object pattern is imaged by an imaging system onto the image plane of the imaging system at a location where a reference pattern suited to the object pattern is situated in order to measure the imaging fidelity of an optical imaging system, for example, an eyeglass lens, a photographi
7301646 Device and method for the determination of imaging errors and microlithography projection exposu November 27, 2007
A device, a microlithography projection exposure system, and a method for the determination of imaging errors of an optical imaging system using a radiation-superposition measuring technique which operates with lateral phase offset, having an optical element arranged on the object side o
7286245 Method and apparatus for determining the influencing of the state of polarization by an optical October 23, 2007
A method and an apparatus for determining the influencing of the state of polarization of optical radiation by an optical system under test, wherein radiation with a defined entrance state of polarization is directed onto the optical system, the exit-side state of polarization is mea
7283204 Method of producing an optical imaging system October 16, 2007
A method of producing an optical imaging system having a plurality of optical elements after the imaging system is initially assembled and adjusted. During a subsequent measurement of the imaging system, the wavefront errors in the exit pupil, or an area conjugate therewith, belongin
7277182 Apparatus for polarization-specific examination, optical imaging system, and calibration method October 2, 2007
A device for polarization-specific examination of an optical system having a detector part that has polarization detector means for recording the exit state of polarization of radiation emerging from the optical system. Also, an associated optical imaging system, and a calibration method
7233386 Method of optimizing imaging performance June 19, 2007
A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated pa
7158237 Interferometric measuring device and projection exposure installation comprising such measuring January 2, 2007
A measuring device for interferometric measurement of an optical imaging system that is provided for projecting a useful pattern, provided on a mask, into the image plane of the imaging system, includes a wavefront source for generating at least one wavefront traversing the imaging s
7088458 Apparatus and method for measuring an optical imaging system, and detector unit August 8, 2006
Apparatus and method for measuring an optical imaging system, and detector unit. The measuring apparatus contains an arrangement for combining wavefront and distortion measurements. For this purpose, respectively associated interferometry and Moire structures can be introduced on the
7075633 Method and system for measuring the imaging quality of an optical imaging system July 11, 2006
An object pattern is imaged by an imaging system onto the image plane of the imaging system at a location where a reference pattern suited to the object pattern is situated in order to measure the imaging fidelity of an optical imaging system, for example, an eyeglass lens, a photographi
7019824 Moire method and measuring system for measuring the distortion of an optical imaging system March 28, 2006
In the case of a method and a measuring system for measuring the distortion of an optical imaging system with the aid of moire patterns, an object grating with an object pattern is arranged in the object plane of the imaging system, and an image grating with an image pattern is arran










 
 
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