Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Watts; David
Address:
Austin, TX
No. of patents:
2
Patents:












Patent Number Title Of Patent Date Issued
5935871 Process for forming a semiconductor device August 10, 1999
A process has been developed for a post-chemical mechanical polishing cleaning/passivting step to remove slurry particles (52) and form a passivating film (64) from a portion of an interconnect material within a conductive layer (42) without attacking the interconnecting material. In
5897375 Chemical mechanical polishing (CMP) slurry for copper and method of use in integrated circuit ma April 27, 1999
A method for chemical mechanical polishing (CMP) a copper layer (22) begins by forming the copper layer (22). The copper layer (22) is then exposed to a slurry (24). The slurry (24) contains an oxidizing agent such as H.sub.2 O.sub.2, a carboxylate salt such as ammonium citrate, an abras










 
 
  Recently Added Patents
Method for evaluating performance characteristics of dental curing lights
Device for maneuvering a vehicle using maneuvering moves using at least one trajectory
Non-phosphorus-based gellant for hydrocarbon fluids
Blueberry plant named `DrisBlueFour`
Method of manufacturing a plurality of electronic assemblies
Produce container and lid assembly
Ion beam system and method of operating ion beam system
  Randomly Featured Patents
System and method for monitoring health of electrical machines
Electron microscope
Dual-compression gas-blast puffer-type interrupting device
Skin treatment article
Motorcycle auxiliary gearshift
Method for the cooling of targets as well as cooling device for targets
Method for fabricating a memory device having reverse LDD
Pressure controlled ink jet printhead assembly
Integrated circuit design apparatus with multiple connection modes
Methods for delivering DNA to muscle cells using recombinant adeno-associated virus virions