Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Watts; David
Address:
Austin, TX
No. of patents:
2
Patents:












Patent Number Title Of Patent Date Issued
5935871 Process for forming a semiconductor device August 10, 1999
A process has been developed for a post-chemical mechanical polishing cleaning/passivting step to remove slurry particles (52) and form a passivating film (64) from a portion of an interconnect material within a conductive layer (42) without attacking the interconnecting material. In
5897375 Chemical mechanical polishing (CMP) slurry for copper and method of use in integrated circuit ma April 27, 1999
A method for chemical mechanical polishing (CMP) a copper layer (22) begins by forming the copper layer (22). The copper layer (22) is then exposed to a slurry (24). The slurry (24) contains an oxidizing agent such as H.sub.2 O.sub.2, a carboxylate salt such as ammonium citrate, an abras










 
 
  Recently Added Patents
Semiconductor unit having a power semiconductor and semiconductor apparatus using the same
Electrode structure and its manufacturing method, and semiconductor module
Semiconductor device and method of manufacturing the same
Method for producing a flexible composite elastomeric polyurethane skin
Image display device and display unit for image display device
Polymer bonded fibrous coating on dipped rubber articles skin contacting external surface
Defensin polynucleotides and methods of use
  Randomly Featured Patents
In-plane switching mode liquid crystal display device and manufacturing method thereof
Electronic assembly with an electromagnetic radiation shielding cap
Quick-connect structure for bicycle saddle
Oval jewelry box
Temperature calibration for fluid ejection head
Saw guide apparatus
Mechanical flotation machine
Method for tracking motion phase of an object for correcting organ motion artifacts in X-ray CT systems
Mounting apparatus for protective covers
Dynamic email directory harvest attack detection and mitigation