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Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Watanabe; Satoshi
Address:
Joetsu, JP
No. of patents:
8
Patents:












Patent Number Title Of Patent Date Issued
8288076 Chemically amplified resist composition and pattern forming process October 16, 2012
A chemically amplified resist composition comprises a polymer comprising units having polarity to impart adhesion and acid labile units adapted to turn alkali soluble under the action of acid. The polymer comprises recurring units having formula (1) wherein R.sup.1 is H, F, CH.sub.3 or
8273830 Deprotection method of protected polymer September 25, 2012
Provided is a method of deprotecting a protected polymer, the method being capable of, in the deprotection reaction of a polymer comprising a unit structure having a phenolic hydroxyl group protected with an acyl group, deacylating the polymer in a short period of time while maintain
7977027 Resist composition and patterning process July 12, 2011
A chemically amplified positive resist composition comprises a compound having an amine oxide structure as a basic component, a base resin, a photoacid generator, and an organic solvent. The resist composition exhibits a high resolution, significantly prevents a line pattern from col
7678530 Lactone-containing compound, polymer, resist composition, and patterning process March 16, 2010
Lactone-containing compounds having formula (1) are novel wherein A.sup.1 is a polymerizable functional group having a double bond, R.sup.1 is a monovalent C.sub.1-C.sub.10 hydrocarbon group in which some or all hydrogen atoms are substituted by fluorine atoms, and W is CH.sub.2, O or
7498126 Photoacid generators, chemically amplified resist compositions, and patterning process March 3, 2009
A photoacid generator has formula (1). A chemically amplified resist composition comprising the photoacid generator has advantages including a high resolution, focus latitude, long-term PED dimensional stability, and a satisfactory pattern profile shape. When the photoacid generator is
7335458 Chemically amplified positive resist composition and patterning process February 26, 2008
A chemically amplified positive resist composition is provided comprising (A) a resin containing acid labile groups other than acetal type which changes its solubility in an alkaline developer as a result of the acid labile groups being eliminated under the action of acid and (B) specifi
7312016 Chemically amplified positive resist composition and patterning process December 25, 2007
A chemically amplified positive resist composition comprising a specific 2,4,6-triisopropylbenzenesulfonate compound as a photoacid generator, a polymer which changes its solubility in an alkaline developer under the action of acid, and a basic compound has a high sensitivity, a high
7288363 Chemically amplified positive resist composition and patterning process October 30, 2007
A chemically amplified positive resist composition comprising a specific 2,4,6-triisopropylbenzenesulfonate compound as a photoacid generator, a polymer which changes its solubility in an alkaline developer under the action of acid, and a basic compound has a high sensitivity, a high










 
 
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