Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Inventor:
Watanabe; Satoshi
Address:
Joetsu, JP
No. of patents:
8
Patents:












Patent Number Title Of Patent Date Issued
8288076 Chemically amplified resist composition and pattern forming process October 16, 2012
A chemically amplified resist composition comprises a polymer comprising units having polarity to impart adhesion and acid labile units adapted to turn alkali soluble under the action of acid. The polymer comprises recurring units having formula (1) wherein R.sup.1 is H, F, CH.sub.3 or
8273830 Deprotection method of protected polymer September 25, 2012
Provided is a method of deprotecting a protected polymer, the method being capable of, in the deprotection reaction of a polymer comprising a unit structure having a phenolic hydroxyl group protected with an acyl group, deacylating the polymer in a short period of time while maintain
7977027 Resist composition and patterning process July 12, 2011
A chemically amplified positive resist composition comprises a compound having an amine oxide structure as a basic component, a base resin, a photoacid generator, and an organic solvent. The resist composition exhibits a high resolution, significantly prevents a line pattern from col
7678530 Lactone-containing compound, polymer, resist composition, and patterning process March 16, 2010
Lactone-containing compounds having formula (1) are novel wherein A.sup.1 is a polymerizable functional group having a double bond, R.sup.1 is a monovalent C.sub.1-C.sub.10 hydrocarbon group in which some or all hydrogen atoms are substituted by fluorine atoms, and W is CH.sub.2, O or
7498126 Photoacid generators, chemically amplified resist compositions, and patterning process March 3, 2009
A photoacid generator has formula (1). A chemically amplified resist composition comprising the photoacid generator has advantages including a high resolution, focus latitude, long-term PED dimensional stability, and a satisfactory pattern profile shape. When the photoacid generator is
7335458 Chemically amplified positive resist composition and patterning process February 26, 2008
A chemically amplified positive resist composition is provided comprising (A) a resin containing acid labile groups other than acetal type which changes its solubility in an alkaline developer as a result of the acid labile groups being eliminated under the action of acid and (B) specifi
7312016 Chemically amplified positive resist composition and patterning process December 25, 2007
A chemically amplified positive resist composition comprising a specific 2,4,6-triisopropylbenzenesulfonate compound as a photoacid generator, a polymer which changes its solubility in an alkaline developer under the action of acid, and a basic compound has a high sensitivity, a high
7288363 Chemically amplified positive resist composition and patterning process October 30, 2007
A chemically amplified positive resist composition comprising a specific 2,4,6-triisopropylbenzenesulfonate compound as a photoacid generator, a polymer which changes its solubility in an alkaline developer under the action of acid, and a basic compound has a high sensitivity, a high










 
 
  Recently Added Patents
Metal melting apparatus and method for melting metal
Disk-based storage device having read channel memory that is selectively accessible to disk controller
Methods and systems for delivering customized advertisements
Sacrificial spacer approach for differential source/drain implantation spacers in transistors comprising a high-k metal gate electrode structure
Blow moulding machine with compressed air recycling
Accessory system for vehicle
Display panel and gate driving circuit and driving method for gate driving circuit
  Randomly Featured Patents
Conjugately matched acoustic wave transducers and method
Memory online update system and method
Method and apparatus for optimizing starting point for run-in clock recovery
Universal resin shield
Methine dyes, manufacturing methods thereof, and silver halide photographic materials containing same dyes
Magnetic drive device for a releasable connection
11C-labeled benzophenone/benzoxazole analogues as an inflammation imaging agent
Mechanical trap for throwing clay targets
Semiconductor device
Turret indexing assembly for machine tools