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Inventor:
Watanabe; Kenji
Address:
Fujisawa, JP
No. of patents:
10
Patents:












Patent Number Title Of Patent Date Issued
7479634 Electron beam apparatus and device manufacturing method using the same January 20, 2009
An electron beam apparatus is provided for reliably measuring a potential contrast and the like at a high throughput in a simple structure. The electron beam apparatus for irradiating a sample, such as a wafer, formed with a pattern with an electron beam to evaluate the sample comprises
7411191 Inspection system by charged particle beam and method of manufacturing devices using the system August 12, 2008
An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the elec
7408175 Apparatus for inspection with electron beam, method for operating same, and method for manufactu August 5, 2008
A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate "S" to be inspected into an inspection chamber 23-1; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving
7365324 Testing apparatus using charged particles and device manufacturing method using the testing appa April 29, 2008
A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25.cndot.1, then forms an image und
7361895 Electron beam apparatus and a device manufacturing method by using said electron beam apparatus April 22, 2008
An electron beam apparatus, in which an electron beam emitted from an electron gun having a cathode and an anode is focused and irradiated onto a sample, and secondary electrons emanated from the sample are directed into a detector, the apparatus further comprising means for optimizing
7351969 Electron beam inspection system and inspection method and method of manufacturing devices using April 1, 2008
An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary ele
6627095 Magnetic recording disk and method of manufacturing same September 30, 2003
A magnetic recording disk having on its surface a texture structure of fine surface irregularities with reduced variations, which is suitable for high-density magnetic recording, and a method of manufacturing such a magnetic recording disk are provided. A magnetic recording disk has a
6468598 Magnetic disk and method of making thereof October 22, 2002
It is an object of the present invention to provide a method of making a magnetic disk having a uniform textured structure with micro-waviness of fabrication depth of less than 20 nm, preferably less than 10 nm, and a local depth deviation of less than 5%, in which texture patterns are
6194048 Magnetic recording disk February 27, 2001
A magnetic recording disk having on its surface a texture structure of fine surface irregularities with reduced variations, which is suitable for high-density magnetic recording, and a method of manufacturing such a magnetic recording disk are provided. The magnetic recording disk has a
6099698 Magnetic disc and method of manufacturing same August 8, 2000
It is an object of the present invention to provide a method of making a magnetic disk having a uniform textured structure with micro-waviness of fabrication depth of less than 20 nm, preferably less than 10 nm, and a local depth deviation of less than 5%, in which texture patterns are










 
 
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